用金属氧化物半导体场效应晶体管器件实现的高重复率电光调Q模块设计

随着激光器的发展，需要高重复率的电光调Q器件。提出了一种新型超快、高重复率的电光调Q技术，这种技术采用V型槽的金属氧化物半导体场效应晶体管（VMOSFET）器件作为调Q模块的主功率开关，运用宽范围可调的高压稳压电源和调Q触发信号整形电路，以及加压调Q和退压调Q的兼容电路。实验中得出：当调Q工作频率为10kHz时，调Q电压幅度3～5kV任意可调，电压脉冲宽度小于5ns，触发抖动时间小于1μs，且可以长期稳定工作。该调Q模块已经用于激光二极管（LD）抽运的无水冷固体Nd：YAG激光器和连续Nd=YAG激光器中。

垂直双扩散金属-氧化物半导体场效应晶体管电学法热阻测试中测试电流的研究

本文针对垂直双扩散金属-氧化物半导体场效应晶体管器件电学法热阻测试的关键参数——测试电流的影响因素进行研究,测试电流选择恰当与否是热阻测试的先决条件。通过理论分析和三款典型垂直双扩散金属-氧化物半导体场效应晶体管器件的试验验证,得出一种通过测试电流自升温、测试延迟时间及校温曲线这3个方面有效确定垂直双扩散金属-氧化物半导体场效应晶体管器件电学法热阻测试时测试电流的方法。

不同手性单壁碳纳米管分离及其场效应晶体管性能研究

高纯度的单手性单壁碳纳米管对于下一代碳基电子器件的发展具有重要意义。利用聚[(9,9-二辛基芴-2,7-二基)-共-联吡啶](PFO-BPy)、聚(9,9-二辛基芴-2,7-二基)(PFO)和聚(9,9-二辛基芴-共苯并噻二唑)(PFO-BT)三种聚合物在有机相中分别分选出(6,5),(7,5)和(10,5)三种手性单壁碳纳米管,具有较高纯度以及浓度,并去除了超过99%的残留分散剂。使用上述溶液沉积获得高均匀性和高密度的碳纳米管薄膜,以此作为器件沟道材料,制备了手性单壁碳纳米管场效应晶体管阵列。结果显示,大直径的(10,5)手性碳纳米管晶体管器件具有较好的电学性能,其迁移率最高达16cm2·V-1·s-1,开关比达107。

界面电荷位置对短沟道pMOS器件阈值电压的影响

通过二维数值模拟的方法,研究了短沟道器件中不同位置的界面电荷对pMOS器件阈值电压的影响。把pMOS器件栅氧化层等分成不同的区域,随即可以在不同的区域设置不同的界面电荷,从而很好地模拟了器件界面电荷处于不同位置时阈值电压漂移的变化情况,并同时考虑了不同漏极偏置的影响;为了探究其变化机制,还提取和比较了一些特殊情况下器件的表面势。这些研究有助于明确器件哪些位置的界面电荷对阈值电压漂移影响更大,这对深刻理解带漏极偏置的负偏压温度不稳定性效应有一定的帮助和促进。

一种基于LDMOS器件的小型化P波段功率放大模块

设计了一种基于LDMOS器件的功率放大模块。该模块采用高增益的SiGe HBT单片、高压LDMOS单片和大功率LDMOS器件的多级级联形式,实现长脉宽(15ms)、高占空比(33%)、高增益(48dB)以及大功率(200W)的设计要求;同时,该模块采用独特的两腔体一体化结构设计,使整个模块的体积和重量缩小为相同性能水平产品的五分之一到十分之一。

Development of Novel Thin-Film SOI High Voltage MOSFET

Two kinds of thin-film SOI high voltage MOSFETs are developed.One is general structure,the other is novel two-drift-region structure.The gate width is 760μm,and the active area is 8.58×10 -2 mm 2.The experiments show that the breakdown voltages of the two-drift-region and general structures are 26V and 17V,respectively,and the on resistances are 65Ω and 80Ω,respectively.

Optimization Design and Fabrication of Si/SiGe PMOSFETs

Through the theoretical analysis and computer simulation,the optimized design principles for Si/SiGe PMOSFETs are given,including the choice of gate materials,the determination of Ge percentage and the profile in SiGe channel,the thickness optimization of dioxide and silicon cap layer,and the adjustment of threshold voltage.In light of them,a SiGe PMOSFET is designed and fabricated successfully.The measurements indicate that the transconductance is 45mS/mm (300K) and 92mS/mm (77K) for SiGe PMOSFET's (L=2μm),while it is 33mS/mm (300K) and 39mS/mm (77K) for Si PMOSFET.

Quantum-Mechanical Study on Surrounding-Gate Metal-Oxide-Semiconductor Field-Effect Transistors

As the channel length of metal-oxide-semiconductor field-effect transistors （MOSFETs） scales into the nanometer regime, quantum mechanical effects are becoming more and more significant. In this work, a model for the surrounding-gate （SG） nMOSFET is developed. The SchrSdinger equation is solved analytically. Some of the solutions are verified via results obtained from simulations. It is found that the percentage of the electrons with lighter conductivity mass increases as the silicon body radius decreases, or as the gate voltage reduces, or as the temperature decreases. The eentroid of inversion-layer is driven away from the silicon-oxide interface towards the silicon body, therefore the carriers will suffer less scattering from the interface and the electrons effective mobility of the SG nMOSFETs will be enhanced.

RESEARCH OF BJMOSFET FREQUENCY CHARACTERISTICS

The parasitic capacitance effect and its influence to the performance have been investigated in Bi-polar Junction Metal-Oxide-Semiconductor Field-Effect Transistor (BJMOSFET). The frequency characteristic equivalent circuit and high frequency response model of BJMOSFET have been presented. The frequency characteristic of BJMOSFET is simulated using the multi-transient analytical method and PSPICE9 simulator. The conclusions that BJMOSFET owns less total capacitance, wider frequency band, better transient charac-teristic and better frequency responses are reached by comparing with the traditional MOSFET at the same structure parameters and bias conditions. BJMOSFET, as a novel promising high frequency device, would be desired to find application in future integrated circuit.

Integration of Power MOSFETs for Synchronous Buck Converters

Efficiency and power loss in the microelectronic devices is a major issue in power electronics applications. The engineers are challenged every year to increase power density and at the same time reduce the amount of power dissipated in the applications to keep the maximum temperatures under specifications. This situation drives a constant demand for better efficiencies in smaller packages. Traditional approaches to improve efficiency in DC/DC synchronous buck converters include reducing conduction losses in the MOSFETs （metal oxide semiconductor field effect transistors） through lower RDS （ON） （resistance drain to source in the ON state） devices and lowering switching losses through low-frequency operation. However, the incremental improvements in RDS （ON） are at a point of diminishing returns and low RDS （ON） devices have large parasitic capacitances that do not facilitate the high-frequency operation required to improve power density. The drive for higher efficiency and increased power in smaller packages is being addressed by advancements in both silicon and packaging technologies. The NexFET power block combines these two technologies to achieve higher levels of performance, and in half the space versus discrete MOSFETs. This article explains these new technologies and highlights their performance advantage.

High-resolution flexible electronic devices by electrohydrodynamic jet printing:From materials toward applications

High-resolution flexible electronic devices are widely used in the fields of soft robotics,smart human-machine interaction,and intelligent e-healthcare monitoring due to their mechanical flexibility,ductility,and compactness.The electrohydrodynamic jet printing(e-jet printing)technique is used for constructing high-resolution and cross-scale flexible electronic devices such as field-effect transistors(FETs),flexible sensors,and flexible displays.As a result,researchers are paying close attention to e-jet printing flexible electronic devices.In this review,we focused on the latest advancements in high-resolution flexible electronics made by e-jet printing technology,including various materials used in e-jet printing inks,the process control of e-jet printing,and their applications.First,we summarized various functional ink materials available for e-jet printing,including organic,inorganic,and hybrid materials.Then,the interface controlling the progress of e-jet printing was discussed in detail,including the physical and chemical properties of the functional ink,the interfacial wettability between the ink and substrate,and the microdroplet injection behavior in a high-voltage field.Additionally,various applications of e-jet printing in the fields of flexible electrodes,FETs,flexible sensors,and flexible displays were demonstrated.Finally,the future problems and potential associated with the development of next generation e-jet printing technology for flexible electronic devices were also presented.

Controlled one step thinning and doping of twodimensional transition metal dichalcogenides

Two-dimensional(2 D) transition metal dichalcogenides(TMDCs) have drawn intensive attention due to their ultrathin feature with excellent electrostatic gating capability, and unique thickness-dependent electronic and optical properties. Controlling the thickness and doping of 2 D TMDCs are crucial toward their future applications. Here, we report an effective HAu Cl4 treatment method and achieve simultaneous thinning and doping of various TMDCs in one step. We find that the HAu Cl4 treatment not only thins thick Mo S2 flakes into few layers or even monolayers, but also simultaneously tunes Mo S2 into p-type. The effects of various parameters in the process have been studied systematically,and an Au intercalation assisted thinning and doping mechanism is proposed. Importantly, this method also works for other typical TMDCs, including WS2, Mo Se2 and WSe2,showing good universality. Electrical transport measurements of field-effect transistors(FETs) based on Mo S2 flakes show a big increase of On/Off current ratios(from 102 to 107) after the HAu Cl4 treatment. Meanwhile, the subthreshold voltages of the Mo S2 FETs shift from-60 to +27 V after the HAu Cl4 treatment, with a p-type doping behavior. This study provides an effective and simple method to control the thickness and doping properties of 2 D TMDCs, paving a way for their applications in high performance electronics and optoelectronics.

Organic transistor for bioelectronic applications

Organic field-effect transistors(OFETs) are recently considered to be attractive candidate for bioelectronic applications owing to their prominent biocompatibility,intrinsical flexibility,and potentially low cost associated with their solution processibility.Over the last few years,bioelectronic-application-motivated OFETs have attracted increasing attention towards next generation of biosensors,healthcare elements and artificial neural interfaces.This mini review highlights the basic principles and recent progress in OFET based bioelectronics devices.The key strategies and the forecast perspectives of this research field are also briefly summarized.

Low-power high-mobility organic single-crystal field-effect transistor

Evolving flexible electronics requires the development of high-mobility and low-power organic field-effect transistors(OFETs)that are crucial for emerging displays,sensors,and label technologies.Among diverse materials,polymer gate dielectrics and two-dimensional(2D)organic crystals have intrinsic flexibility and natural compatibility with each other for OFETs with high performance;however,their combination lacks non-impurity and non-damage construction strategies.In this study,we developed a desirable OFET system using damage-free transfer of 2D organic single crystal,dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene on a unique polymer dielectric layer,poly(amic acid)(PAA).Benefiting from the unique PAA surface nanostructure and the long-range ordered characteristics of the 2D organic single crystal,the resulting OFETs show remarkable performance with high mobility and low operating voltage of 18.7 cm^(2) V^(−1) s^(−1) and−3 V,respectively.The result indicates that combining polymer gate dielectric with 2D organic single crystal using a high-quality method can produce flexible electronic devices with high performance.

Low voltage organic devices and circuits with aluminum oxide thin film dielectric layer

Low voltage operating organic devices and circuits have been realized using atomic layer deposition deposited aluminum oxide thin film as dielectric layer. The dielectric film has per unit area capacitance of 165 nF/cm2 and leakage current of 1 nA/cm2 at 1 MV/cm. The devices and circuits use the small-molecule hydrocarbon pentacene as the active semiconductor material. Transistors,inverters,and ring oscillators with operating voltage lower than 5 V were obtained. The mobility of organic field-effect transistors was extracted to be 0.16 cm2/Vs in saturation range,the threshold voltage is 0.3 V,and the on/off current ratio is larger than 105. The gain of inverters is estimated to be 12 at -5 V supply voltage,and the propagation delay is 0.25 ms per stage in 5-stage ring oscillators.

Effects of gate dielectric thickness and semiconductor thickness on device performance of organic field-effect transistors based on pentacene

In this paper,the pentacene-based organic field-effect transistors(OFETs)with poly(methyl methacrylate)(PMMA)as gate dielectrics were fabricated,and the effects of gate dielectric thickness and semiconductor thickness on the device performance were investigated.The optimal PMMA thickness is in the range of 350–400 nm to sustain a considerable current density and stable performance.The device performance depends on the thicknesses of the active layer non-monotonically,which can be explained by the morphology of the pentacene film and the position of the conducting channel in the active layer.The device with a pentacene thickness of 50 nm shows the best performance,which has a maximum hole mobility of 1.12 cm2/V·s.In addition,the introduction of a thin layer of tris-(8-hydroxyquinolinato)aluminum(Alq3)to the OFETs as a light-emitting material greatly decreases the device performance.

Van der Waals contact between 2D magnetic VSe_(2)and transition metals and demonstration of high-performance spin-field-effect transistors

This study used density functional theory and the quantum transport method to investigate the interfacial coupling and spin transport of transition metals(TMs)with a Fe,Co,and Ni/2H-VSe_(2)hybrid nanostructure.Because the indirect coupling of TM-Se-V led to an obvious reduction of the magnetic moment and the disappearance of the half-metal characteristics of 2H-VSe_(2),the expected spin-filtering effect of individual TMs and 2H-VSe_(2)deteriorated at the contact region.Nevertheless,all the TM/2H-VSe_(2)-based dual-probe devices exhibited an interesting bias-dependent spin-injection efficiency with a maximum output spin-polarized current of 666 mA mm-1 in Co/2H-VSe_(2).The proposed TM/2H-VSe_(2)-based spin-field-effect transistor demonstrated outstanding performance.The Ni/2H-VSe_(2)-based transistor achieved a maximum output spin-polarized current of 3117 m A mm-1 and demonstrated a good switching characteristic of 106 mV dec-1.Importantly,all transistors achieved a widely tunable scale of spin-extraction efficiency ranging consistently between 96%and-92%with gate bias.These results indicate a promising candidate for use in high-performance spintronic devices.