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基片衍射时原子速率对激光汇聚铬原子沉积的影响 被引量:3
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作者 张宝武 支理想 +1 位作者 张文涛 贾梦翔 《激光技术》 CAS CSCD 北大核心 2013年第4期421-424,共4页
为了研究基片衍射对激光汇聚原子沉积的影响,基于标量光学衍射理论,采用数值计算对比分析了基片衍射与否两种情况下,铬原子波包几率密度分布(表征了沉积条纹)特征值随原子波包速率的变化。结果表明,当原子波包横向速率保持不变、而纵向... 为了研究基片衍射对激光汇聚原子沉积的影响,基于标量光学衍射理论,采用数值计算对比分析了基片衍射与否两种情况下,铬原子波包几率密度分布(表征了沉积条纹)特征值随原子波包速率的变化。结果表明,当原子波包横向速率保持不变、而纵向最可几速率在考察范围内变化时,基片衍射会使波包几率分布的最大值平均约有14.9%的增加量,而半峰全宽平均约有14.3%的减小量;当原子波包纵向最可几速率保持不变、而横向速率在考察范围内变化时,基片衍射会使波包几率密度分布的最大值平均约有14.5%的增加量,而半峰全宽平均约有16.9%的减小量。该研究成果为实验提供了有益的理论指导。 展开更多
关键词 激光技术 基片衍射 原子波包 光学势阱
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Preparation and Characterization of Electron-Beam Evaporated Cu-lnSe Thin Films Using Two Stage Processes
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作者 Md. Ariful Islam Md. Nuruzzaman +3 位作者 Ratan Chandra Roy Jaker Hossain Md. Julkamain K. A. Khan 《Journal of Physical Science and Application》 2016年第3期37-43,共7页
CIS (Cu-InSe) thin films were prepared onto glass substrate by the two stage process--generally called bilayer process. At first, Cu layer was deposited onto glass substrate by electron beam evaporation technique an... CIS (Cu-InSe) thin films were prepared onto glass substrate by the two stage process--generally called bilayer process. At first, Cu layer was deposited onto glass substrate by electron beam evaporation technique and then InSe single layer was deposited on the resulting Cu layer to produce CIS thin film. XRD (X-ray diffraction) analysis revealed that deposited film has an amorphous nature. Electrical resistivity measurements were carried out as a function of temperature during heating and cooling cycles in air. The heating and cooling cycles of the sample are almost reversible after successive heat-treatment in air. In order to consider the influence of the InSe upper layer on the optical properties, the thickness of the InSe upper layer in the CIS films was varied from 50 to 150 nm. Analysis of the transmittance and reflectance spectra, recorded in the wavelength range of 400-1,100 nm, revealed that the CIS films have high absorption coefficient of-104 cm1. The direct band gap varies from 1.40 to 1.22 eV. The refractive index, the extinction coefficient and the dielectric constant of the CIS films depend on the film thickness. 展开更多
关键词 CIS thin film electron beam activation energy absorption coefficient optical band gap.
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