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碲镉汞外延晶膜的输运特性
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作者 聂林如 《半导体光电》 EI CAS CSCD 北大核心 1997年第5期339-342,共4页
反常霍尔效应是在检测碲镉汞(MCT)薄膜的电学性质时的一种常见现象,反常的根本原因是由于材料的不均匀。
关键词 半导体薄 碲镉汞 外延晶膜 电磁输运特性
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碲镉汞外延晶膜的不稳定性
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作者 聂林如 《云南师范大学学报(自然科学版)》 1996年第1期50-54,共5页
通过在不同日期、相同测试条件下霍尔测试同一Hg1-xCdxTe/CdZnTe外延晶膜的电学参数,发现其电学参数随时间的不同而不同。根据Petritzl[1]的双层模型用计算机进行曲线模拟可知,此晶膜正由半导体(原给组... 通过在不同日期、相同测试条件下霍尔测试同一Hg1-xCdxTe/CdZnTe外延晶膜的电学参数,发现其电学参数随时间的不同而不同。根据Petritzl[1]的双层模型用计算机进行曲线模拟可知,此晶膜正由半导体(原给组份X≈0.213)向半金属转变。这一点已被扫描电镜所证实。 展开更多
关键词 霍尔测试 HGCDTE 不稳定性 半导体 外延晶膜
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Epitaxial growth and in-plane dielectric properties of orthorhombic HoMnO_3 films
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作者 GAO Ping WANG WeiTian +1 位作者 ZHANG Wei SUN YuMing 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2014年第10期1875-1878,共4页
Orthorhombic HoMnO3(HMO) thin films were grown epitaxially on LaAlO3(001) substrates by using pulsed laser deposition technique. The films showed perfect orthorhombic crystallization and were well-aligned with the sub... Orthorhombic HoMnO3(HMO) thin films were grown epitaxially on LaAlO3(001) substrates by using pulsed laser deposition technique. The films showed perfect orthorhombic crystallization and were well-aligned with the substrates. The in-plane dielectric constant and loss of HMO films were measured as functions of temperature(80–300 K) and frequency(120 Hz–100 kHz) by using coplanar interdigital electrodes. Two thermally activated dielectric relaxations were found, and the respective peaks shifted to higher temperatures as the measuring frequency increased. The in-plane dielectric properties of epitaxial orthorhombic HMO films were considered as universal dielectric response behavior, and the dipolar effects and the hopping conductivity induced by the charge carriers were used to explain the results. 展开更多
关键词 dielectric properties interdigital electrodes HoMnO3 thin films ORTHORHOMBIC
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