期刊文献+
共找到5篇文章
< 1 >
每页显示 20 50 100
用热壁外延法在CaAs(100)上生长ZnSe薄膜
1
作者 王杰 劳浦东 +2 位作者 王迅 沈孝良 姚文华 《真空科学与技术学报》 EI CAS CSCD 1990年第4期240-244,共5页
用封闭和开口两种热壁外延法在GaAs(100)衬底上生长ZnSe薄膜。着重讨论了这两种方法对所生长薄膜质量的影响。α台阶仪的测量、X-射线衍射结果和Raman光谱的分析等一致表明,当实验偏离严格热壁外延技术时,所长薄膜的质量明显下降。在源... 用封闭和开口两种热壁外延法在GaAs(100)衬底上生长ZnSe薄膜。着重讨论了这两种方法对所生长薄膜质量的影响。α台阶仪的测量、X-射线衍射结果和Raman光谱的分析等一致表明,当实验偏离严格热壁外延技术时,所长薄膜的质量明显下降。在源温Tso=700℃、壁温Tw=550℃、衬底温度Tsu=320℃时,用封闭(严格)的热壁外延法成功地长出质量较佳的ZnSe(100)单晶薄膜。XPS测量分析表明此单晶薄膜中Zn和Se的成分比为1:1。 展开更多
关键词 热壁外延 ZnSe薄膜 CaAs 薄膜晶体 衬底温度 薄膜质量 台阶仪 热蒸发 成分比 外延生长过程
下载PDF
光助OMVPE法生长ZnSe的发光和电学特性
2
作者 师庆华 《液晶与显示》 CAS CSCD 1991年第1期41-43,共3页
用光致发光和 Hall 效应测量确定了用光助(氙灯)OMVPE 法在 GaAs 上生长 ZnSe外延层的特性,在照射条件下生长的非故意掺杂外延层具有 n 型导电性,电子浓度为10^(16)-10^(17)cm^(-3)。造成这种现象的原因是波长为400<λ<800nm 的... 用光致发光和 Hall 效应测量确定了用光助(氙灯)OMVPE 法在 GaAs 上生长 ZnSe外延层的特性,在照射条件下生长的非故意掺杂外延层具有 n 型导电性,电子浓度为10^(16)-10^(17)cm^(-3)。造成这种现象的原因是波长为400<λ<800nm 的辐照使外延层与残留的或故意掺入的施主杂质的结合得到了很大的增强,尽管这种辐照对生长速率的增快并无很大影响。为了获得纯度更高的外延层,λ<400nm 的辐射是最理想的.然而,如果在外延生长过程中采用更纯的源材料,就可以利用400<λ<800nm 辐射来避免残余杂质的引入,而且可将这种现象应用于更理想的掺杂技术。 展开更多
关键词 ZNSE OMVPE 外延 外延生长过程 光致发光 源材料 掺杂技术 施主杂质 照射条件 激子发射
下载PDF
Development Research of Zhejiang Small and Medium Enterprises' Management mode
3
作者 Weidong Zhang 《International Journal of Technology Management》 2013年第7期78-80,共3页
Zhejiang Small and medium enterprises have had major achievements adapting to the trend of economic development and it encountered bottlenecks. During the development process, there are malpractices, such as the paren... Zhejiang Small and medium enterprises have had major achievements adapting to the trend of economic development and it encountered bottlenecks. During the development process, there are malpractices, such as the parent wind, system's lacking of science, epitaxial growth, excessive dependence on the international market, and ineffective management mode. Based on the central economic work conference, changing management and enterprise strategy adjustment are inevitable choices of Zhejiang small and medium-sized enterprises" management mode development. 展开更多
关键词 Zhejiang Small and medium enterprises management mode DEVELOPMENT
下载PDF
Epitaxial n- and p-type Emitters for High Efficiency Solar Cell Concepts
4
作者 Thomas Rachow Friedemann Heinz Bemd Steinhauser Stefan Janz Stefan Reber 《Journal of Energy and Power Engineering》 2014年第8期1371-1377,共7页
Reducing the module prices by increasing the efficiency of solar cells is one of the major challenges in today's photovoltaic research. The emitter formation by epitaxial growth offers a cost-efficient and faster alt... Reducing the module prices by increasing the efficiency of solar cells is one of the major challenges in today's photovoltaic research. The emitter formation by epitaxial growth offers a cost-efficient and faster alternative to the standard furnace diffusion process. The efficiency potential of epitaxial emitters 〉 22% has already been proven using a single wafer, low pressure, chemical vapour deposition tool. The purpose of this work is to show the potential of epitaxially grown emitters by APCVD (atmospheric pressure chemical vapour deposition) compared to diffused emitters. The APCVD formation of epitaxial emitters at 1,050 ~C can be realised as high throughput inline process and only takes 1-2 min, whereas the diffusion process using POCI3 takes up to 60 min. Simulations show an increase in voltage of AVoc = +10 mV and a reduction in saturation current ,1o of 30% for the epitaxial emitter. The lifetime experiments of solar cells with epitaxial emitter exhibit a diffusion length Leff〉 750μm and an emitter saturation current of Joe 〈 50 fA/cm2 on a planar 10 Ω2cm p-type FZ wafer. Another important aim of this work is to evaluate the limitations of epitaxial emitters due to high thermal budget, interface recombination and the change of reflective properties on textured wafers due to the deposition process. Solar cell efficiencies up to 18.4% on p-type and 20.0% on n-type wafers presented in this paper underline that the emitter epitaxy by APCVD is a competitive process for the emitter formation. 展开更多
关键词 Solar cells pn-junction emitter formation silicon deposition EPITAXY APCVD
下载PDF
IQE推出新款4英寸GaSb产品
5
作者 韩潇 《半导体信息》 2010年第2期23-23,共1页
据《化合物半导体》2010年2月4日报导,IQE推出新款4英寸GaSb产品。GaSb材料广泛应用于热能转化电能产品中,包括红外激光二极管、探测器和热光伏电池。
关键词 化合物半导体 激光二极管 光伏电池 探测器阵列 热能转化 GASB IQE 外延生长过程 米尔顿凯恩斯 产品性能
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部