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偶数阶超级幻方(英文)
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作者 欧阳录 《数学理论与应用》 2002年第3期19-25,共7页
一个n2阶的幻方,如果它的行和、列和、斜和及n×n子方块和都相同,称之为超级幻方,如果对全部n×n子方块要求不满足,但有一部分满足要求,便称为半超级幻方,本文证明了:若n=4k,则存在n2阶超级幻方,若n=4k+2,则存在n2阶半超级幻方.
关键词 偶数阶超级幻方 子方块 子方块 方块 半超级幻方
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Characteristics of N^+ Implanted Layer of 4H-SiC
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作者 王守国 张义门 +1 位作者 张玉明 杨林安 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第12期1249-1253,共5页
The nitrogen ions implanted layer of p type 4H SiC epilayer is investigated.The fabrication processes and measurements of the implanted layer are given in details.The profile of implantation depth is simulated using... The nitrogen ions implanted layer of p type 4H SiC epilayer is investigated.The fabrication processes and measurements of the implanted layer are given in details.The profile of implantation depth is simulated using the Monte Carlo simulator TRIM.Lateral Schottky barrier diodes and transfer length method (TLM) measurement structure are made on nitrogen implanted layers for the testing.The concentration of activated donors N d is about 3 0×10 16 cm -3 .The resulting value for the activation rate in this study is 2 percent.The sheet resistance R sh is 30kΩ/□ and the resistivity ρ(R sh × d ) of the implanted layer is 0 72Ω·cm.The electron mobility calculated is about 300cm 2/(V·s) in the N implanted layer. 展开更多
关键词 silicon carbide ion implantation ANNEALING sheet resistance
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Dilute H_2SO_4 solution for copper seed cleaning in electroplating 被引量:1
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作者 Youn-Seoung LEE Jae-Sik YOON +2 位作者 Yang-Rae JO Heesoo LEE Sa-Kyun RHA 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第2期562-566,共5页
The effects of surface cleaning to eliminate the surface oxides formed on Cu seed layer with dilute H2SO4 solution were investigated. Cu seed layer formed on Ti/Si(100) wafer by sputter deposition was exposed to air... The effects of surface cleaning to eliminate the surface oxides formed on Cu seed layer with dilute H2SO4 solution were investigated. Cu seed layer formed on Ti/Si(100) wafer by sputter deposition was exposed to air to grow native Cu oxide. Dilute H2SO4 solutions and/or TS-40A alkaline soak cleaner were used to remove the native Cu-oxide. After mainly carbon groups (such as C=O) on surface of Cu seed layer were removed by pretreatment of TS-40A alkaline solution, subsequently, dilute H2SO4 acid solution removed Cu-oxides (Cu20 and CuO) as well as a lot of O=C and Cu(OH)2. 展开更多
关键词 PRETREATMENT COPPER-OXIDE H2SO4 XPS sheet resistance
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Ab Initio Molecular Dynamics Simulation of Liquid Water with Fragmentbased Quantum Mechanical Approach under Periodic Boundary Conditions
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作者 Jinfeng Liu Xiao He 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 2021年第6期761-768,I0002,共9页
In this study,we investigated the structural and dynamical properties of liquid water by using ab initio molecular dynamics simulation under periodic boundary conditions based on the fragment-based quantum mechanical ... In this study,we investigated the structural and dynamical properties of liquid water by using ab initio molecular dynamics simulation under periodic boundary conditions based on the fragment-based quantum mechanical approach.This study was carried out using the second-order Møller-Plesset perturbation theory(MP2)with the aug-cc-pVDZ basis set,which has been validated to be sufficiently accurate for describing water interactions.Diverse properties of liquid water,including radial distribution functions,diffusion coefficient,dipole moment,triplet oxygen-oxygen-oxygen angles,and hydrogen-bond structures,were simulated.This ab initio description leads to these properties in good agreement with experimental observations.This computational approach is general and transferable,providing a comprehensive framework for ab initio predictions of properties of condensed-phase matters. 展开更多
关键词 Ab initio Simulations LIQUID Quantum fragmentation approach
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