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NEKSIA全自动磨边机原理及日常维护保养
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作者 陶会荣 张丙寅 刘莹莹 《中国眼镜科技杂志》 2020年第1期151-153,共3页
1全自动磨边机简介全自动磨边机主要由磨边机主机、扫描仪以及定中心仪等3大部件组成,是集光路、精密机械以及电子技术于一体的仪器。扫描仪在工作时,有两种扫描方式:光学拍照或机械扫描。定中心仪由定位臂和投影系统组成,主要用来对未... 1全自动磨边机简介全自动磨边机主要由磨边机主机、扫描仪以及定中心仪等3大部件组成,是集光路、精密机械以及电子技术于一体的仪器。扫描仪在工作时,有两种扫描方式:光学拍照或机械扫描。定中心仪由定位臂和投影系统组成,主要用来对未加工的镜片进行中心定位的操作。 展开更多
关键词 扫描方式 机械扫描 扫描仪 定中心仪 中心定位 投影系统 电子技术 磨边机
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Mo/Si multilayers used for the EUV normal incidence solar telescope 被引量:4
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作者 LIU Zhen YANG Lin +2 位作者 CHEN Bo CHEN Bin CAO JianLin 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2011年第3期406-410,共5页
This paper first reviews an EUV normal incidence solar telescope that we have developed in our lab. The telescope is composed of four EUV telescopes and the operation wavelengths are 13.0 nm, 17.1 nm, 19.5 nm, and 30.... This paper first reviews an EUV normal incidence solar telescope that we have developed in our lab. The telescope is composed of four EUV telescopes and the operation wavelengths are 13.0 nm, 17.1 nm, 19.5 nm, and 30.4 nm. These four wavelengths, fundamental to the research of the solar activity and the atmosphere dynamics, are always chosen by the EUV normal incidence solar telescope. In the EUV region, almost all materials have strong absorption, so optics used in this region must be coated by the multilayer. The Mo/Si multilayers used for the EUV normal incidence solar telescope are designed and fabricated by the magnetron sputtering coating machine. The characteristics of these multilayers, such as reflectivity and thermal stability at wavelengths of 13.0 nm, 17.1 nm, 19.5 nm and 30.4 nm, are also described. All the multilayers were measured by a hard X-ray diffractometer (XRD) and an EUV/soft X-ray reflectometer (EXRR) before and after heating (in a vacuum chamber) at 100℃ for 24 hours and at 200℃ for 1 hour and 4 hours. The results show that Mo/Si multilayers have high reflectivity at 13.0 nm, 17.1 nm, and 19.5 nm but low at 30.4 nm. We found no change in the reflectivity and center wavelength of these multilayers by comparing the reflectivity curves before and after heating. This suggests the thermal stability of Mo/Si multilayers may meet our requirement in future solar observation missions. 展开更多
关键词 EUV solar telescope multilayer reflectivity thermal stability
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