A spinel-type oxides ZnFe2O4 photocatalysts were prepared by citric acid complex method,and characterized with XRD,TG-DTA,FT-IR,TEM techniques.The photocatalytic activities were investigated by the degradation of C3H2...A spinel-type oxides ZnFe2O4 photocatalysts were prepared by citric acid complex method,and characterized with XRD,TG-DTA,FT-IR,TEM techniques.The photocatalytic activities were investigated by the degradation of C3H22N6O6S2Na2 by artificial visible Light.The results show that the photocatalytic activity of ZnFe2O4 is stable,under experimental conditions,the degradation rate of C3H22N6O6S2 is over 90% in 60min.展开更多
Solid state reaction is a conventional method to synthesize structurally stable inorganic solids by mixing powdered reactants together at high pressure （over 1 x 105 mbar （1 mbar = 100 Pa）） and high temperature （...Solid state reaction is a conventional method to synthesize structurally stable inorganic solids by mixing powdered reactants together at high pressure （over 1 x 105 mbar （1 mbar = 100 Pa）） and high temperature （over 1300 K） [1-4]. This method is effective and sophisticated to prepare solid mate- rials, especially the functional complex oxides such as high temperature superconductors, piezoelectrics, dielectrics, etc. However, the chemical reactions cannot be intrinsically con- trolled and integrated at an atomic level in order to achieve the applications of future thin film devices with reduced dimensions [5]. With the desire of designing high-quality products with the micro/nanoscale integration, many pow- erful physical techniques, such as, pulsed-laser deposition （PLD）, molecular beam epitaxy （MBE）, sputtering deposi- tion, etc., have experienced enormous development due to their ability of lattice and/or interfacial controls. Using these growth techniques, layer-by-layer deposition （multilayer and/or superlattice） can be achieved, providing us a platform to tune the crystal structures at an atomic level by controlling the interfacial terminations and epitaxial strain, which are absent in their bulk counterparts [6-8]. From this point of view, well-controlled interfacial structures may also provide the solid state reaction at an atomic level during the physical depositions, which provides us an effective way to design the desired products from the chemical bonding reconstruction.展开更多
文摘A spinel-type oxides ZnFe2O4 photocatalysts were prepared by citric acid complex method,and characterized with XRD,TG-DTA,FT-IR,TEM techniques.The photocatalytic activities were investigated by the degradation of C3H22N6O6S2Na2 by artificial visible Light.The results show that the photocatalytic activity of ZnFe2O4 is stable,under experimental conditions,the degradation rate of C3H22N6O6S2 is over 90% in 60min.
基金financially supported by the Department of Science and Technology of Shandong Province(No.2012GSF11708)Graduate Innovation Foundation of Yantai University(GIFYTU)
基金supported by the National Natural Science Foundation of China(Grant Nos.51332001,11604011,and 11404016)the National Basic Research Program of China(Grant No.2014CB920902)Open Fund of State Key Laboratory of Information Photonics and Optical Communications(Beijing University of Posts and Telecommunications)(Grand No.2016B002)
文摘Solid state reaction is a conventional method to synthesize structurally stable inorganic solids by mixing powdered reactants together at high pressure （over 1 x 105 mbar （1 mbar = 100 Pa）） and high temperature （over 1300 K） [1-4]. This method is effective and sophisticated to prepare solid mate- rials, especially the functional complex oxides such as high temperature superconductors, piezoelectrics, dielectrics, etc. However, the chemical reactions cannot be intrinsically con- trolled and integrated at an atomic level in order to achieve the applications of future thin film devices with reduced dimensions [5]. With the desire of designing high-quality products with the micro/nanoscale integration, many pow- erful physical techniques, such as, pulsed-laser deposition （PLD）, molecular beam epitaxy （MBE）, sputtering deposi- tion, etc., have experienced enormous development due to their ability of lattice and/or interfacial controls. Using these growth techniques, layer-by-layer deposition （multilayer and/or superlattice） can be achieved, providing us a platform to tune the crystal structures at an atomic level by controlling the interfacial terminations and epitaxial strain, which are absent in their bulk counterparts [6-8]. From this point of view, well-controlled interfacial structures may also provide the solid state reaction at an atomic level during the physical depositions, which provides us an effective way to design the desired products from the chemical bonding reconstruction.
