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浅论凸凹模的尖角干涉与对策
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作者 刘蓉 《电加工与模具》 2001年第6期45-48,共4页
对凸凹模的尖角干涉进行分析 ,通过对干涉范围的计算与分析 ,改变对工件的编程方法 。
关键词 尖角干涉 干涉要素 编程方法
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凸凹模的尖角干涉及对策
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作者 徐安祥 《机械工人(冷加工)》 1997年第7期28-29,共2页
在线切割机床上加工冲模经常遇到对尖角部位的切割,尖角部位的程序如何处理,是编程人员应予重视的问题。
关键词 冲模 尖角干涉 凸凹模 线切割机床
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An Improved Angle Polishing Method for Measuring Subsurface Damage in Silicon Wafers 被引量:2
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作者 霍凤伟 康仁科 +2 位作者 郭东明 赵福令 金洙吉 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2006年第3期506-510,共5页
We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of... We present an improved angle polishing method in which the end of the cover slice near the glue layer is beveled into a thin,defect-free wedge,the straight edge of which is used as the datum for measuring the depth of subsurface damage. The bevel angle can be calculated from the interference fringes formed in the wedge. The minimum depth of the subsurface damage that can be measured by this method is a few hundred nanometers. Our results show that the method is straightforward, accurate, and convenient. 展开更多
关键词 silicon wafer subsurface damage angle polishing defect etching wedge fringes
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