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三元层状结构MAX相陶瓷材料的制备技术及其研究发展现状和发展趋势 被引量:1
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作者 江涛 《现代技术陶瓷》 CAS 2023年第1期1-23,共23页
三元层状结构陶瓷材料主要是指Mn+1AXn相,三元层状结构MAX相陶瓷材料具有金属的特性还具有陶瓷的特性,三元层状结构MAX相陶瓷材料具有较高的力学性能,良好的耐磨损性能和良好的耐腐蚀性能,并具有良好的抗高温氧化性能等,还具有良好的可... 三元层状结构陶瓷材料主要是指Mn+1AXn相,三元层状结构MAX相陶瓷材料具有金属的特性还具有陶瓷的特性,三元层状结构MAX相陶瓷材料具有较高的力学性能,良好的耐磨损性能和良好的耐腐蚀性能,并具有良好的抗高温氧化性能等,还具有良好的可加工性能。三元层状结构MAX相陶瓷材料主要有Ti_(3)SiC_(2),Ti_(4)SiC_(3),Ti_(3)AlC_(2),Ti_(2)AlC,Ti_(4)AlN_(3)和Ti_(2)AlN等。本文主要叙述三元层状结构MAX相陶瓷材料的制备技术,物相组成,显微结构,力学性能和耐磨损性能,耐腐蚀性能和抗高温氧化性能以及其他性能等。并叙述三元层状结构MAX相陶瓷材料的研究发展现状和发展趋势。并对三元层状结构MAX相陶瓷材料的未来研究发展趋势和发展方向进行分析和预测。 展开更多
关键词 三元层状结构MAX陶瓷材料 可加工性能 制备技术
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Structure characteristic and its evolution of Cu-W films prepared by dual-target magnetron sputtering deposition
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作者 周灵平 汪明朴 +3 位作者 彭坤 朱家俊 傅臻 李周 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2012年第11期2700-2706,共7页
Immiscible Cu-W alloy thin films were prepared using dual-target magnetron sputtering deposition process. The structure evolution of Cu-W thin films during preparation was investigated by X-ray diffraction, transmissi... Immiscible Cu-W alloy thin films were prepared using dual-target magnetron sputtering deposition process. The structure evolution of Cu-W thin films during preparation was investigated by X-ray diffraction, transmission electron microscopy and high resolution transmission electron microscopy. In the initial stage of dual-target magnetron sputtering deposition process, an amorphous phase formed; then it crystallized and the analogy spinodal structure formed due to the bombardment of the sputtered particles during sputtering deposition process, the surface structure of the film without the bombardment of the sputtered particles was the amorphous one, the distribution of the crystalline and amorphous phase showed layer structure. The solid solubility with the analogy spinodal structure was calculated using the Vegard law. For Cu-13.7%W (mole fraction) film, its structure was composed of Cu-ll%W solution, Cu-37%W solution and pure Cu; for Cu 14.3%W film, it was composed of Cu-15%W solution, Cu-38%W solution, and pure Cu; for Cu-18.1%W film, it was composed of Cu-19%W solution, Cu-36% W solution and pure Cu. 展开更多
关键词 Cu-W thin film sputtering deposition amorphous phase layer structure solid solubiiity Vegard law
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环氧树脂聚砜共混物层状结构的性能研究
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作者 陈志诚 田杰 +2 位作者 郭金海 谢钟清 褚凤洋 《热固性树脂》 CAS CSCD 北大核心 2018年第3期15-18,共4页
采用熔融机械搅拌法制备了聚砜(PSF)改性AG-80树脂浇注体,通过力学性能和扫描电镜分析研究了PSF含量对树脂弯曲性能、动态力学性能(DMA)、冲击强度和物相分布影响。结果表明:加入PSF后树脂发生相分离现象,PSF质量分数5%的改性树脂... 采用熔融机械搅拌法制备了聚砜(PSF)改性AG-80树脂浇注体,通过力学性能和扫描电镜分析研究了PSF含量对树脂弯曲性能、动态力学性能(DMA)、冲击强度和物相分布影响。结果表明:加入PSF后树脂发生相分离现象,PSF质量分数5%的改性树脂形成海岛状结构,其弯曲强度和弯曲模量几乎不变,冲击强度显著增大,而PSF质量分数10%的改性树脂形成层状结构,其弯曲强度、弯曲模量、冲击强度大幅下降。 展开更多
关键词 聚砜 环氧树脂 层状结构相 冲击强度
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Phase-field simulation of lamellar growth for a binary eutectic alloy 被引量:1
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作者 李新中 刘冬梅 +3 位作者 孙涛 苏彦庆 郭景杰 傅恒志 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2010年第2期302-307,共6页
Using general multi-phase-field model,detailed microstructures corresponding to different initial lamellar sets were simulated in a binary eutectic alloy with an asymmetric phase diagram.The simulation results show th... Using general multi-phase-field model,detailed microstructures corresponding to different initial lamellar sets were simulated in a binary eutectic alloy with an asymmetric phase diagram.The simulation results show that regular or unstable oscillating lamellar structures depend on the initial lamellar widths of two solid phases.A lamellar morphology map associating with the initial widths has been derived,which is capable of showing the condition of forming various lamella structures.For instance,a regular lamella was formed with fast solidification while large lamella resulted from disorder growth with low interfacial velocity. The investigated interface velocities indicate that with fast solidification to form regular lamella,a disorder growth manner or a large lamellar spacing causes a low interface velocity.These results are in good agreement with those proposed by Jackson-Hunt model. 展开更多
关键词 phase-field simulation microstructure eutectic lamella
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Te-seeded growth of few-quintuple layer Bi2Te3 nanoplates 被引量:2
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作者 Yanyuan Zhao Maria de la Mata +6 位作者 Richard L. J. Qiu Jun Zhang Xinglin wen Cesar Magen Xuan P. A. Gao Jordi Arbiol Qihua Xiong 《Nano Research》 SCIE EI CAS CSCD 2014年第9期1243-1253,共11页
We report on a Te-seeded epitaxial growth of ultrathin Bi2Te3 nanoplates (down to three quintuple layers (QL)) with large planar sizes (up to tens of micrometers) through vapor transport. Optical contrast has be... We report on a Te-seeded epitaxial growth of ultrathin Bi2Te3 nanoplates (down to three quintuple layers (QL)) with large planar sizes (up to tens of micrometers) through vapor transport. Optical contrast has been systematically investigated for the as-grown Bi2Te3 nanoplates on the SiO2/Si substrates, experimentally and computationally. The high and distinct optical contrast provides a fast and convenient method for the thickness determination of few-QL Bi2Te3 nanoplates. By aberration-corrected scanning transmission electron microscopy, a hexagonal crystalline structure has been identified for the Te seeds, which form naturally during the growth process and initiate an epitaxial growth of the rhombohedral- structured Bi2Te3 nanoplates. The epitaxial relationship between Te and Bi2T% is identified to be perfect along both in-plane and out-of-plane directions of the layered nanoplate. Similar growth mechanism might be expected for other bismuth chalcogenide layered materials. 展开更多
关键词 Te nucleation seed epitaxial growth BI2TE3 few-quintuple layer TEM cross-section optical contrast
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