Pattern design and technology play a very important role in the garment industry. In order to improve the level of pattern making and design of the garment industry, a survey was conducted to investigate the industria...Pattern design and technology play a very important role in the garment industry. In order to improve the level of pattern making and design of the garment industry, a survey was conducted to investigate the industrial needs in pattern design and technology in China's Mainland. The data were collected from the employers and employees from the garment industry and students in the major of fashion and clothing studies. It indicated that there was a gap between the employer and employee, especially the requirements of the industrial needs and the course contents covered by the tertiary schools. The employers expected to recruit more experienced pattern designers, at the same time, they were not reluctant to hire fresh graduates and spent more resources on the training of employees. The students knew little about their employment situation of the garment industry, spent too little time on the course study and learned too little practical skills in pattern design. They could not make use of the knowledge which prevented them from being employed by the garment industry. Efforts should be taken by both the tertiary schools and the garment industry. The students should be aspirated towards the profession of pattern cutters and the syllabuses of pattern making should be more practical and industrial orientated. The solution might benefit the garment industry a lot in a long run.展开更多
This paper presents a 10-bit 20 MS/s pipelined Analog-to- Digital Converter（ADC） using op amp sharing approach and removing Sample and Hold Amplifier（SHA） or SHA-less technique to reach the goal of low-power const...This paper presents a 10-bit 20 MS/s pipelined Analog-to- Digital Converter（ADC） using op amp sharing approach and removing Sample and Hold Amplifier（SHA） or SHA-less technique to reach the goal of low-power constanpfion. This design was fabricated in TSMC 0.18 wn 1P6M technology. Measurement results show at supply voltage of 1.8 V, a SFDR of 42.46 dB, a SNDR of 39.45 dB, an ENOB of 6.26, and a THDof41.82 dB are at 1 MHz sinusoidal sig- nal input. In addition, the DNL and INL are 1.4 LSB and 3.23 LSB respectively. The power onstmaption is 28.8 mW. The core area is 0.595 mm2 and the chip area including pads is 1.468 mm2.展开更多
文摘Pattern design and technology play a very important role in the garment industry. In order to improve the level of pattern making and design of the garment industry, a survey was conducted to investigate the industrial needs in pattern design and technology in China's Mainland. The data were collected from the employers and employees from the garment industry and students in the major of fashion and clothing studies. It indicated that there was a gap between the employer and employee, especially the requirements of the industrial needs and the course contents covered by the tertiary schools. The employers expected to recruit more experienced pattern designers, at the same time, they were not reluctant to hire fresh graduates and spent more resources on the training of employees. The students knew little about their employment situation of the garment industry, spent too little time on the course study and learned too little practical skills in pattern design. They could not make use of the knowledge which prevented them from being employed by the garment industry. Efforts should be taken by both the tertiary schools and the garment industry. The students should be aspirated towards the profession of pattern cutters and the syllabuses of pattern making should be more practical and industrial orientated. The solution might benefit the garment industry a lot in a long run.
基金provided by National Chip Implementation Center(CIC)
文摘This paper presents a 10-bit 20 MS/s pipelined Analog-to- Digital Converter（ADC） using op amp sharing approach and removing Sample and Hold Amplifier（SHA） or SHA-less technique to reach the goal of low-power constanpfion. This design was fabricated in TSMC 0.18 wn 1P6M technology. Measurement results show at supply voltage of 1.8 V, a SFDR of 42.46 dB, a SNDR of 39.45 dB, an ENOB of 6.26, and a THDof41.82 dB are at 1 MHz sinusoidal sig- nal input. In addition, the DNL and INL are 1.4 LSB and 3.23 LSB respectively. The power onstmaption is 28.8 mW. The core area is 0.595 mm2 and the chip area including pads is 1.468 mm2.
