Improving cell efficiency and increasing throughput in solar cell industry efforts were put on uniform texturization and optimum diffusion process. To reduce reflectivity, NaOH/KOH （sodium hydroxide/potassium hydrox...Improving cell efficiency and increasing throughput in solar cell industry efforts were put on uniform texturization and optimum diffusion process. To reduce reflectivity, NaOH/KOH （sodium hydroxide/potassium hydroxide） and IPA （isopropyl alcohol） are widely used in standard alkaline texturization of mono c-Si （crystalline silicon） （〈100〉 crystal orientation） wafers, where IPA promotes formation of uniform pyramidal structure but leads to unstable process. In this work, carbohydrates have been investigated as an additive in etchant solution. Moreover uniform phosphorus diffusion process for B2B （back to back） diffusion （loading two wafers in one single slot of quartz boat） has been investigated with single and multiple temperature plateaus. Impact of pre-oxygen step on phosphorus diffusion is investigated in which number of inactive phosphorus at the PSG （phosphosilicate glass）-Si interface is reduced. A batch of 156 PSQ （pseudo square） mono c-Si solar cells with 18%-18.20% efficiency was fabricated which is -0.3% higher than the standard process. The EL （electroluminescence image）, reff （carrier effective life time）, Voc （open circuit voltage）, Isc （short circuit current）, Pvk （peak power） and r/ （efficiency） have been examined and compared with standard.展开更多
Catalyst-free and scalable synthesis of graphene on various glass substrates at low temperatures is of paramount significance to numerous applications such as low-cost transparent electronics and state-of-the-art disp...Catalyst-free and scalable synthesis of graphene on various glass substrates at low temperatures is of paramount significance to numerous applications such as low-cost transparent electronics and state-of-the-art displays. However, systematic study within this promising research field has remained scarce thus far. Herein, we report the direct growth of graphene on various glasses using a low-temperature plasma-enhanced chemical vapor deposition method. Such a facile and scalable approach guarantees the growth of uniform, transfer-free graphene films on various glass substrates at a growth temperature range of 400-600 ℃. The morphological, surface wetting, optical, and electrical properties of the obtained graphene can be tailored by controlling the growth parameters. Our uniform and high-quality graphene films directly integrated with low-cost, commonly used glasses show great potential in the fabrication of multi-functional electrodes for versatile applications in solar cells, transparent electronics, and smart windows.展开更多
文摘Improving cell efficiency and increasing throughput in solar cell industry efforts were put on uniform texturization and optimum diffusion process. To reduce reflectivity, NaOH/KOH （sodium hydroxide/potassium hydroxide） and IPA （isopropyl alcohol） are widely used in standard alkaline texturization of mono c-Si （crystalline silicon） （〈100〉 crystal orientation） wafers, where IPA promotes formation of uniform pyramidal structure but leads to unstable process. In this work, carbohydrates have been investigated as an additive in etchant solution. Moreover uniform phosphorus diffusion process for B2B （back to back） diffusion （loading two wafers in one single slot of quartz boat） has been investigated with single and multiple temperature plateaus. Impact of pre-oxygen step on phosphorus diffusion is investigated in which number of inactive phosphorus at the PSG （phosphosilicate glass）-Si interface is reduced. A batch of 156 PSQ （pseudo square） mono c-Si solar cells with 18%-18.20% efficiency was fabricated which is -0.3% higher than the standard process. The EL （electroluminescence image）, reff （carrier effective life time）, Voc （open circuit voltage）, Isc （short circuit current）, Pvk （peak power） and r/ （efficiency） have been examined and compared with standard.
基金Acknowledgements This work was financially supported by the National Basic Research Program of China （Nos. 2013CB932603, 2012CB933404, 2011CB921903, and 2013CB934600）, the National Natural Science Foundation of China （Nos. 51432002, 51290272, 51121091, 51~201, and 11222434）, the Ministry of Education （No. 20120001130010） and the Beijing Municipal Sdence and Technology Planning Project （No. Z151100003315013）.
文摘Catalyst-free and scalable synthesis of graphene on various glass substrates at low temperatures is of paramount significance to numerous applications such as low-cost transparent electronics and state-of-the-art displays. However, systematic study within this promising research field has remained scarce thus far. Herein, we report the direct growth of graphene on various glasses using a low-temperature plasma-enhanced chemical vapor deposition method. Such a facile and scalable approach guarantees the growth of uniform, transfer-free graphene films on various glass substrates at a growth temperature range of 400-600 ℃. The morphological, surface wetting, optical, and electrical properties of the obtained graphene can be tailored by controlling the growth parameters. Our uniform and high-quality graphene films directly integrated with low-cost, commonly used glasses show great potential in the fabrication of multi-functional electrodes for versatile applications in solar cells, transparent electronics, and smart windows.
