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MOS晶体管中辐照引起的陷阱正电荷的强压退火 被引量:2
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作者 姚育娟 张正选 +2 位作者 姜景和 何宝平 罗尹虹 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2000年第4期378-382,共5页
电离辐射在 MOS结构的 Si O2 层中建立正陷阱电荷 ,这些正陷阱电荷在正强栅偏压( + 2 0 V)下迅速减少 ,这是由于正栅压引起硅衬底中的电子向 Si O2 层隧道注入 ,从而与陷阱正电荷复合 .正栅压退火不仅对 N沟 MOS结构非常有效 ,对 P沟 MO... 电离辐射在 MOS结构的 Si O2 层中建立正陷阱电荷 ,这些正陷阱电荷在正强栅偏压( + 2 0 V)下迅速减少 ,这是由于正栅压引起硅衬底中的电子向 Si O2 层隧道注入 ,从而与陷阱正电荷复合 .正栅压退火不仅对 N沟 MOS结构非常有效 ,对 P沟 MOS结构也有一定的影响 .给出了辐照后的 NMOS和 PMOS晶体管在强正栅压下退火的实验结果 ,阐明了正栅压下的“隧道退火”机理 . 展开更多
关键词 强压退火 辐照 陷阱正电荷 MOS晶体管
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Gate Annealing of an Enhancement-Mode InGaP/AlGaAs/InGaAs PHEMT
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作者 黎明 张海英 +3 位作者 徐静波 李潇 刘亮 付晓君 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2008年第8期1487-1490,共4页
For enhancement-mode InGaP/A1GaAs/InGaAs PHEMTs,gate annealing is conducted between gate structures of Ti/Pt/Au and Pt/Ti/Pt/Au. Comparison is made after thermal annealing and an optimum annealing process is ob- taine... For enhancement-mode InGaP/A1GaAs/InGaAs PHEMTs,gate annealing is conducted between gate structures of Ti/Pt/Au and Pt/Ti/Pt/Au. Comparison is made after thermal annealing and an optimum annealing process is ob- tained. Using the structure of Ti/Pt/Au, about a 200mV positive shift of threshold voltage is achieved by thermal annea- ling at 320℃ for 40min in N2 ambient. Finally, a stable and consistent enhancement-mode PHEMT is produced successfully with higher threshold voltage. 展开更多
关键词 ENHANCEMENT-MODE InGaP/A1GaAs/InGaAs PHEMT ANNEAL threshold voltage ring oscillator
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Annealing hardening and deformation behavior of layered gradient Zr–Ti composite 被引量:3
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作者 Yang ZHOU Wei-jun HE +2 位作者 Jia-teng MA Ze-jun CHEN Qing LIU 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2021年第8期2358-2371,共14页
To investigate potential strengthening approaches,multi-layered zirconium–titanium(Zr-Ti)composites were fabricated by hot-rolling bonding and annealing.The microstructures of these composites were characterized usin... To investigate potential strengthening approaches,multi-layered zirconium–titanium(Zr-Ti)composites were fabricated by hot-rolling bonding and annealing.The microstructures of these composites were characterized using scanning electron microscopy with energy dispersive spectroscopy(SEM-EDS)and electron backscatter diffractometry(EBSD).Their mechanical properties were evaluated by uniaxial tension and compression measurements.It was found that the fabricated Zr–Ti composites are composed of alternating Zr/diffusion/Ti layers,and chemical compositions of Zr and Ti showed a gradient distribution in the diffusion layer.Compared with as-rolled samples,annealing can strengthen the layered gradient Zr–Ti composite,and this is mainly caused by solid-solution strengthening and microstructure refinement-induced strengthening.Compared with the raw materials,a synergistic improvement of strength and ductility is achieved in the Zr–Ti composite as a result of the layered gradient microstructure.Tension–compression asymmetry is observed in the Zr–Ti composites,which may be attributed to twinning and microvoids induced by unbalanced diffusion. 展开更多
关键词 Zr–Ti layered structural material diffusion annealing strengthening tension–compression asymmetry yielding ductility
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