基于对控制数与双控制数强相等的图

给出基于对控制数与双控制数强相等的图的一个性质,并依据该性质,刻画了基于对控制数与双控制数强相等的树及单圈图.

Doped-Chamber Deposition of Intrinsic Microcrystalline Silicon Thin Films and Its Application in Solar Cells

A series of microcrystalline silicon thin films were fabricated by very high frequency plasma enhanced chemical vapor deposition （VHF-PECVD） at different silane concentrations in a P chamber. Through analysis of the structural and electrical properties of these materials,we conclude that the photosensitivity slightly decreased then increased as the silane concentration increased,while the crystalline volume fraction indicates the opposite change. Results of XRD indicate that thin films have a （220） preferable orientation under certain conditions. Microcrystalline silicon solar cells with conversion efficiency 4. 7% and micromorph tandem solar cells 8.5% were fabricated by VHF-PECVD （p layer and i layer of microcrystalline silicon solar cells were deposited in P chamber）, respectively.

Fabrication of Hydrogenated Microcrystalline Silicon Thin Films at Low Temperature by VHF-PECVD

Using H 2 diluted silane,series of μc Si∶H films are fabricated at low temperature with VHF PECVD.The thickness measurements reveal that the deposition rates are obviously enhanced with higher plasma excitation frequency or working pressure,but increase firstly and then decrease with the increase of plasma power density.Raman spectra show that the crystallinity and the average grain sizes of the films strongly depend on the temperature of substrate and the concentration of silane.However,the plasma excitation frequency only has effect on the crystallinity,and a maximum occurs during the further increase of plasma excitation frequency.From XRD and TEM experiments,three preferential crystalline orientations (111),(220) and (311) are observed,and the average grain sizes are different for every crystalline orientation.

Stress Controlled Silicon Nitride Thin Film Deposited by Plasma Enhanced Chemical Vapour Deposition

SiN, films are deposited on silicon wafers through plasma enhanced chemical vapor deposition （PECVD）. The relationship between the film stress and deposition factors is investigated. It is found that low stress films would be obtained by adjusting the ratio of low frequency（LF） power to high frequency（HF） power pulse time or the chamber pressure. The best of the two methods to control stress in the film is changing the percentage of LF power pulse time. The low stress condition is achieved when the percentage of low frequency power pulse time in total time（LF and HF pulse time） is close to 40%, The low stress cantilever of tunable vertical cavity surface emitting laser is obtained by using this deposition condition,

Electromagnetic Environmental Impact of 500-kV Double -Circuit Transmission Lines

The strength of the power frequency electric intensity and magnetic field of the 500-kV double circuit transmission lines was calculated by using the equivalent charge method and the Ampere's Law, and the environmental impact factors of the fields were evaluated. By optimizing the phase sequence, the frequency electric intensity and magnetic field strength can be reduced. Within a distance of 25 m from the center of the transmission line, the power frequency electric intensity and magnetic field strength fall off sharply with the distance increase. Finally, the best phase sequence and the minimum ground clearance of the transmission lines were obtained to meet the requirements of the least impact on envionment.

Predicting coal mining faults using combined rock relationships

By studying different compressive strengths and changes in the characteristics of rocks,five variables were selected to predict faults in coal mines. Drillholes in the mined area were divided into two populations, i.e., drillholes containing faults and drillholes without faults. Discriminant functions were established from the values of the five variables using Fisher's approach. Drillholes in the non-mined areas were allocated to one of the two populations by using discriminant functions. The terrenes of each drillhole were divided into 10 sections, above and below a minable coal seam. Each section has 10 layers of rocks. The population to which each drillhole in a section belongs is sorted out and the probability of each drillhole with faults obtained,i.e., a contour map of predicting the probability of faults in coal mining is shown. A comparison with the real distribution of faults shows that the precision of accurately predicting faults is greater than 70 per cent.

Mechanical properties of AISI 1045 ceramic coated materials by nano indentation and crack opening displacement method

Abstract： An effective approach was conducted for estimating fracture toughness using the crack opening displacement （COD） method for plasma enhanced chemical vapor deposition （PECVD） coating materials. For this evaluation, an elastoplastic analysis was used to estimate critical COD values for single edge notched bending （SENB） specimens. The relationship between fracture toughness （Kic） and critical COD for SENB specimens was obtained. Microstructure of the interface between AleO3-TiO2 composite ceramic coatings and AISI 1045 steel substrates was studied by using scanning electron microscope （SEM）. Chemical compositions were clarified by energy-dispersive X-ray spectroscopy （EDS）. The results show that the interface between of Al203-TiO2 and substrate has mechanical combining. The nanohardness of the coatings can reach 1 200 GPa examined by nanoindentation. The Klc was calculated according to this relationship from critical COD. The bending process produces a significant relationship of COD independent of the axial force applied. Fractographic analysis was conducted to determine the crack length. From the physical analysis of nanoindentation curves, the elastic modulus of 1045/AI2O3-TiO2 is 180 GPa for the 50 μm film. The highest value of fracture toughness for 1045/A1203-TiO2-250 μm is 348 MPa·mv2.

Effect of ammonia gas etching on growth of vertically aligned carbon nanotubes/nanofibers

The etching effect of ammonia （NH3） on the growth of vertically aligned nanotubes/nanofibers （CNTs） was investigated by direct-current plasma enhanced chemical vapor deposition （DC-PECVD）. NH3 gas etches Ni catalyst layer to form nanoscale islands while NH3 plasma etches the deposited amorphous carbon. Based on the etching effect of NH3 gas on Ni catalyst, the differences of growing bundles of CNTs and single strand CNTs were discussed; specifically, the amount of optimal NH3 gas etching is different between bundles of CNTs and single strand CNTs. In contrast to the CNT carpet growth, the single strand CNT growth requires shorter etching time （5 min） than large catalytic patterns （10 rain） since nano dots already form catalyst islands for CNT growth. Through removing the plasma pretreatment process, the damage from being exposed at high temperature substrate occurring during the plasma generation time is minimized. High resolution transmission electron microscopy （HTEM） shows fishbone structure of CNTs grown by PECVD.

Characteristics of Amorphous Silicon Nitride Films Deposited by LF-PECVD from SiH_4/N_2

Amorphous silicon nitride films were deposited by low-frequency plasma-enhanced chemical vapor deposition（LF-PECVD） using silane and nitrogen as precursors. Characteristics such as deposition rate, surface morphology, and chemical composition were measured by spectroscopic ellipsometry（SE）, atomic force mieroscope（AFM） and x-ray photoelectron spectroscopy（XPS）. It was shown that amorphous silicon nitride film could be prepared by LF-PECVD with good uniformity and even surface. The XPS result indicated that a small quantity of oxygen was involved in the sample, which was discussed in this paper.

Dependence of Optical Absorption in Silicon Nanostructures on Size of Silicon Nanoparticles

The amorphous silicon nanoparticles （Si NPs） embedded in silicon nitride （SiNx） films prepared by helicon wave plasma-enhanced chemical vapor deposition （HWP-CVD） technique are studied. From Raman scattering investigation, we determine that the deposited film has the structure of silicon nanocrystals embedded in silicon nitride （nc-Si/SiNx） thin film at a certain hydrogen dilution amount. The analysis of optical absorption spectra implies that the Si NPs is affected by quantum size effects and has the nature of an indirect-band-gap semiconductor. Further, considering the effects of the mean Si NP size and their dispersion on oscillator strength, and quantum-confinement, we obtain an analytical expression for the spectral absorbance of ensemble samples. Gaussian as well as lognormal size-distributions of the Si NPs are considered for optical absorption coefficient calculations. The influence of the particle size-distribution on the optical absorption spectra was systematically studied. We present the fitting of the optical absorption experimental data with our model and discuss the results.

Hydrophobic Ti_xO_y-C_mH_n Nanoparticle Film Prepared by Plasma Enhanced Chemical Vapor Deposition

The hydrophobic films of TixOy-CmHn. deposited from mixture gases of titanium isopropoxide （TTIP） and oxygen by plasma enhanced chemical vapor deposition （PECVD） were investigated. The films were investigated by scanning electron microscope （ SEM ）, transmission electron microscope （ TEM ）, Fourier transform infrared spectrometer （ FTIR）, X-Ray diffraction （ XRD ）, element analysis （ EA ）, ultraviolet visible spectrometer （ UV-Vis）, and water contact angle （WCA）. The results reveal that the surface of the films is formed by mierosized papillaes aggregated by inorganic and organic phases of complex nanoparticles with size from 50 nm to 200 nm when the discharge power is increased from 40 W to 150 W. All fdms demonstrate the strong broad of Ti-O-Ti stretching vibration at 400 -800cm-1, -CH bending vibration at 1 388 cm -1, and broadening -OH stretching vibration at 3 000-3500 cm-1 With the increase of the discharge power, the asdeposited film changes from amorphous to crystallization. The WCA of the film can be as high as 160°, indicating the hydrophobicity. The films show a similar ultraviolet absorption property as the bulk TiO2 film. The composition of the composition of film deposited at 150 W can be formulated as Tio.302-C1.5H3. Therefore, the composition formula of this hydrophobic film could be expressed as TiO2-C5H10O4.7. It is believed that the complex micro/nano structures of TiO2 and C5H10O4.7 residues are responsible for the observed hydrophobicity and the ultraviolet absorption property of the film.

Near-infrared absorbing 2D/3D ZnIn2S4/N-doped graphene photocatalyst for highly efficient CO2 capture and photocatalytic reduction

Hierarchical heterostructure photocatalysts with broad spectrum solar light utilization,particularly in the nearinfrared(NIR)region,are emerging classes of advanced photocatalytic materials for solar-driven CO2 conversion into value-added chemical feedstocks.Herein,a novel two-demensional/three-demensional(2 D/3 D)hierarchical composite is hydrothermally synthesized by assembling vertically-aligned ZnIn2 S4(ZIS)nanowall arrays on nitrogen-doped graphene foams(NGF).The prepared ZIS/NGF composite shows enhancement in photothermal conversion ability and selective CO2 capture as well as solar-driven CO2 photoreduction.At273 K and 1 atm,the ZIS/NGF composite with 1.0 wt%NGF achieves a comparably high CO2-to-N2 selectivity of 30.1,with an isosteric heat of CO2 adsorption of 48.2 kJ mol^-1.And in the absence of cocatalysts and sacrificial agents,the ZIS/NGF composite with cyclability converts CO2 into CH4,CO and CH3 OH under simulated solar light illumination,with the respective evolution rates about 9.1,3.5,and 5.9 times higher than that of the pristine ZIS.In-depth analysis using in-situ irradiated X-ray photoelectron spectroscopy(ISI-XPS)in conjunction with Kelvin probe measurements reveals the underlying charge transfer pathway and process from ZIS to NGF.

Modified Potential Around a Moving Test Charge in Strongly Coupled Dusty Plasma

The theory of dynamical （wa＆e） potential behind a moving test charge in a weakly coupled dusty plasma is extended to that including of strong interaction between dust grains. Such strong interaction is included in the dielectric response function by a generalized hydrodynamic （GH） fluid model. It is shown that the strong interaction between dusts including the lattice spacing correction has a significant effect on the wake potential in dusty plasma. This may be used to investigate basic features of phase transition and possibility of lattice formation of dusty plasma.

Direct low-temperature synthesis of graphene on various glasses by plasma-enhanced chemical vapor deposition for versatile, cost-effective electrodes

Catalyst-free and scalable synthesis of graphene on various glass substrates at low temperatures is of paramount significance to numerous applications such as low-cost transparent electronics and state-of-the-art displays. However, systematic study within this promising research field has remained scarce thus far. Herein, we report the direct growth of graphene on various glasses using a low-temperature plasma-enhanced chemical vapor deposition method. Such a facile and scalable approach guarantees the growth of uniform, transfer-free graphene films on various glass substrates at a growth temperature range of 400-600 ℃. The morphological, surface wetting, optical, and electrical properties of the obtained graphene can be tailored by controlling the growth parameters. Our uniform and high-quality graphene films directly integrated with low-cost, commonly used glasses show great potential in the fabrication of multi-functional electrodes for versatile applications in solar cells, transparent electronics, and smart windows.

Field-tuned quantum effects in a triangular-lattice Ising magnet

We report thermodynamic and neutron scattering measurements of the triangular-lattice quantum Ising magnet TmMgGaO_(4)in longitudinal magnetic fields.Our experiments reveal a quasi-plateau state induced by quantum fluctuations.This state exhibits an unconventional non-monotonic field and temperature dependence of the magnetic order and excitation gap.In the high field regime where the quantum fluctuations are largely suppressed,we observed a disordered state with coherent magnon-like excitations despite the suppression of the spin excitation intensity.Through detailed semi-classical calculations,we are able to understand these behaviors quantitatively from the subtle competition between quantum fluctuations and frustrated Ising interactions.

The Glauber model correction towards equilibrium

We introduce a pre-hydrodynamic correction to the commonly used Glauber model to bring the random scattering information to the initial condition of the hydrodynamic description for the heavy ion collisions.The results of this correction obviously shrink the value of the elliptic flow in the medium momentum region and move the corresponding momentum of the maximum v 2 forwards to smaller p T value.These fit the experimental data quite well.This correction implies that the quark-gluon plasma(QGP) has reached the thermal equilibrium when the hydrodynamic expansion starts.Such a conclusion of quick-equilibrium confirms the conclusion that QGP is a strongly interacting system.

Effects of Higher-Order Relativistic Nonlinearity and Wakefield During a Moderately Intense Laser Pulse Propagation in a Plasma Channel

Using a variational approach,the propagation of a moderately intense laser pulse in a parabolic preformed plasma channel is investigated.The effects of higher-order relativistic nonlinearity (HRN) and wakefield are included.The effect of HRN serves as an additional defocusing mechanism and has the same order of magnitude in the spot size as that of the transverse wakefield (TWF).The effect of longitudinal wakefield is much larger than those of HRN and TWF for an intense laser pulse with the pulse length equaling the plasma wavelength.The catastrophic focusing of the laser spot size would be prevented in the present of HRN and then it varies with periodic focusing oscillations.

Tests of gravitational symmetries with radio pulsars

Symmetries play important roles in modern theories of physical laws. In this paper, we review several experimental tests of important symmetries associated with the gravitational interaction, including the universality of free fall for self-gravitating bodies,time-shift symmetry in the gravitational constant, local position invariance and local Lorentz invariance of gravity, and spacetime translational symmetries. Recent experimental explorations for post-Newtonian gravity are discussed, of which, those from pulsar astronomy are highlighted. All of these tests, of very different aspects of gravity theories, at very different length scales, favor to very high precision the predictions of the strong equivalence principle(SEP) and, in particular, general relativity which embodies SEP completely. As the founding principles of gravity, these symmetries are motivated to be promoted to even stricter tests in future.

Simulation of gas phase reactions for microcrystalline silicon films fabricated by PECVD

We present a numerical gas phase reaction model for hydrogenated microcrystalline silicon(μc-Si:H) films from SiH4 and H2 gas mixtures with plasma enhanced chemical vapor deposition(PECVD).Under the typical μc-Si:H deposition conditions,the concentrations of the species in the plasma are calculated and the effects of silane fraction(SF=[SiH4]/[H2+SiH4]) are investigated.The results show that SiH3 is the key precursor for μc-Si:H films growth,and other neutral radicals,such as Si2H5,Si2H4 and SiH2,may play some roles in the film deposition.With the silane fraction increasing,the precursor concentration increases,but H atom concentration decreases rapidly,which results in the lower H/SiH3 ratio.

Catalyst-Free Growth of Nanographene Films on Various Substrates

We have developed a new method to grow uniform graphene films directly on various substrates, such as insulators, semiconductors, and even metals, without using any catalyst. The growth was carried out using a remote plasma enhancement chemical vapor deposition （r-PECVD） system at relatively low temperatures, enabling the deposition of graphene films up to 4-inch wafer scale. Scanning tunneling microscopy （STM） confirmed that the films are made up of nanocrystalline graphene particles of tens of nanometers in lateral size. The growth mechanism for the nanographene is analogous to that for diamond grown by PECVD methods, in spite of sp2 carbon atoms being formed in the case of graphene rather than sp3 carbon atoms as in diamond. This growth approach is simple, low-cost, and scalable, and might have potential applications in fields such as thin film resistors, gas sensors, electrode materials, and transparent conductive films.