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硅基微机械微波传输线的制备与特性分析 被引量:1
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作者 石艳玲 杨震 赖宗声 《半导体技术》 CAS CSCD 北大核心 2001年第4期50-52,56,共4页
介绍了三种硅基微机械微波传输线:矩形波导、V型槽及W型槽共平面波导,及其三种传输线的制备工艺流程。分析认为,制备方法不同,导致传输线结构、特性阻抗、插入损耗等特性亦不同。
关键词 微机械工艺技术 矩形波导 共平面波导 插入损耗 硅基 微波传输性
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Comparison and Analysis of Two Microwave Equivalent-Circuit Models for Resonant Tunneling Diode
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作者 钟鸣 张世林 +2 位作者 郭维廉 梁惠来 毛陆虹 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第11期1370-1375,共6页
The distinction between two microwave equivalent-circuit models,quasi Esaki tunneling model (QETM) and quantum well injection transit model (QWITM),for the resonant tunneling diode (RTD) is discussed in details,and tw... The distinction between two microwave equivalent-circuit models,quasi Esaki tunneling model (QETM) and quantum well injection transit model (QWITM),for the resonant tunneling diode (RTD) is discussed in details,and two groups of circuit parameters are extracted from experiment data by the least square fit method.Both theory analysis and the comparison of fit results demonstrate that QWITM is much more precise than QETM.In addition,the rationality of QWITM circuit's parameters confirms it too.On this basis,the resistive frequency is calculated,whose influence factors and improvement method are simply discussed as well. 展开更多
关键词 resonant tunneling diode microwave equivalent-circuit quantum well injection transit resistive frequency
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Carrier Transport Properties in the Doped Micro - crystalline Silicon Films
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作者 ZHONG Bo-qiang (Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050 ,CHN) 《Semiconductor Photonics and Technology》 CAS 1999年第3期186-189,共4页
Doped micro-crystalline silicon films are deposited at temperatures as low as 400 ℃ by the catalytic chemical vapor deposition method using a silane and hydrogen gas mixture. Electrical properties such as the carrier... Doped micro-crystalline silicon films are deposited at temperatures as low as 400 ℃ by the catalytic chemical vapor deposition method using a silane and hydrogen gas mixture. Electrical properties such as the carrier concentration and the Hall mobility are investigated for various measuring temperatures. It is found that the grains of micro-crystalline silicon are preferentially oriented along the (220) direction , and that the Hall mobility is larger than 8 cm 2·V -1 ·s -1 , the carrier concentration is about 1×10 17 cm -1 ~1×10 19 cm -3 at room temperature. 展开更多
关键词 Catalytic Chemical Vapor Deposition Hall Mobility Micro-crystalline Silicon CLC number:TN201 O431 Document code:A
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