A spherical mask for the fabrication of microlens arrays was prepared by melting photoresist, and the spherical photoresist shape was transferred into a silicon substrate using ion beam milling. The ion beam milling p...A spherical mask for the fabrication of microlens arrays was prepared by melting photoresist, and the spherical photoresist shape was transferred into a silicon substrate using ion beam milling. The ion beam milling process was computer simulated using the Sigmund ion beam sputtering theory of collision cascades. The experiment results show that microlens arrays can be effectively formed at low substrate temperature of less than 200 ℃.Shapes and dimensions of photoresist masks and silicon microlens arrays were examined by the scanning electron microscope and tested by the surface stylus measurement.展开更多
文摘A spherical mask for the fabrication of microlens arrays was prepared by melting photoresist, and the spherical photoresist shape was transferred into a silicon substrate using ion beam milling. The ion beam milling process was computer simulated using the Sigmund ion beam sputtering theory of collision cascades. The experiment results show that microlens arrays can be effectively formed at low substrate temperature of less than 200 ℃.Shapes and dimensions of photoresist masks and silicon microlens arrays were examined by the scanning electron microscope and tested by the surface stylus measurement.
