Step channel direct injection(SCDI) flash memory device is successfully achieved by 1 2μm CMOS technology,moreover good performance is obtained.At the bias condition of V g=6V, V d=5V,the programming speed ...Step channel direct injection(SCDI) flash memory device is successfully achieved by 1 2μm CMOS technology,moreover good performance is obtained.At the bias condition of V g=6V, V d=5V,the programming speed of SCDI device is 42μs.Under the condition of V g=-8V, V s=8V,the erasing speed is 24ms.Compared with the same size of conventional flash memory device whose corresponding parameters are 500μs and 24ms,respectively,the performance of SCDI device is remarkably improved.During manufacturing of SCDI device,the key technologies are to make the shallow step with appropriate depth and angle,along with eliminating the etch damage during the process of Si 3N 4 spacer.展开更多
文摘Step channel direct injection(SCDI) flash memory device is successfully achieved by 1 2μm CMOS technology,moreover good performance is obtained.At the bias condition of V g=6V, V d=5V,the programming speed of SCDI device is 42μs.Under the condition of V g=-8V, V s=8V,the erasing speed is 24ms.Compared with the same size of conventional flash memory device whose corresponding parameters are 500μs and 24ms,respectively,the performance of SCDI device is remarkably improved.During manufacturing of SCDI device,the key technologies are to make the shallow step with appropriate depth and angle,along with eliminating the etch damage during the process of Si 3N 4 spacer.
