The elastic indentation modulus and hardness of standard bulk materials and advanced thin films were deter-mined by using the nanoindentation technique followed by the Oliver-Pharr post-treatment. After measure-ments ...The elastic indentation modulus and hardness of standard bulk materials and advanced thin films were deter-mined by using the nanoindentation technique followed by the Oliver-Pharr post-treatment. After measure-ments with different loading/unloading schemes on chemically polished bulk titanium a substantial decrease of both modulus and hardness vs an increasing loading time was found. Then, hard nanostructured TiBN and TiCrBN thin films deposited by magnetron sputtering (using multiphase targets) on substrates of high roughness (sintered hard metal) and low roughness (silicon) were studied. Experimental modulus and hardness characterized by using two different nanoindenter tools were within the limits of standard deviation. However, a strong effect of roughness on the spread of the experimental values was observed and it was found that hard-ness and elastic indentation modulus obeyed a Gaussian distribution. The experimental data were discussed together with scanning probe microscopy (SPM) images of typical imprints taken after the nanoindentation tests and the local topography s strong correlation with the results of nanoindentation was described.展开更多
基金supported by the "Communauté Franaise de Belgique-ARC 04/09-310"was done in the context of the EC VI FW international EXCELL Project
文摘The elastic indentation modulus and hardness of standard bulk materials and advanced thin films were deter-mined by using the nanoindentation technique followed by the Oliver-Pharr post-treatment. After measure-ments with different loading/unloading schemes on chemically polished bulk titanium a substantial decrease of both modulus and hardness vs an increasing loading time was found. Then, hard nanostructured TiBN and TiCrBN thin films deposited by magnetron sputtering (using multiphase targets) on substrates of high roughness (sintered hard metal) and low roughness (silicon) were studied. Experimental modulus and hardness characterized by using two different nanoindenter tools were within the limits of standard deviation. However, a strong effect of roughness on the spread of the experimental values was observed and it was found that hard-ness and elastic indentation modulus obeyed a Gaussian distribution. The experimental data were discussed together with scanning probe microscopy (SPM) images of typical imprints taken after the nanoindentation tests and the local topography s strong correlation with the results of nanoindentation was described.
