Wurtzite aluminum nitride（AlN） films were deposited on Si（100） wafers under various sputtering pressures by radio-frequency（RF） reactive magnetron sputtering. The film properties were investigated by XRD, SEM, A...Wurtzite aluminum nitride（AlN） films were deposited on Si（100） wafers under various sputtering pressures by radio-frequency（RF） reactive magnetron sputtering. The film properties were investigated by XRD, SEM, AFM, XPS and nanoindenter techniques. It is suggested from the XRD patterns that highly c-axis oriented films grow preferentially at low pressures and the growth of（100） planes are preferred at higher pressures. The SEM and AFM images both reveal that the deposition rate and the surface roughness decrease while the average grain size increases with increasing the sputtering pressure. XPS results show that lowering the sputtering pressure is a useful way to minimize the incorporation of oxygen atoms into the AlN films and hence a film with closer stoichiometric composition is obtained. From the measurement of nanomechanical properties of AlN thin films, the largest hardness and elastic modulus are obtained at 0.30 Pa.展开更多
TB43 2004064364 离子束溅射沉积Ta<sub>2</sub>O<sub>5</sub>光学薄膜的实验研究=Experimental study of ion beam sputtering deposition of Ta<sub>2</sub>O<sub>5</sub> optical t...TB43 2004064364 离子束溅射沉积Ta<sub>2</sub>O<sub>5</sub>光学薄膜的实验研究=Experimental study of ion beam sputtering deposition of Ta<sub>2</sub>O<sub>5</sub> optical thin film[刊,中]/刘洪祥（中科院光电技术研究所.四川,成都（610209））,熊胜明…∥光电工程.—2004,31（3）.—41-43,55 根据择优溅射的理论,在不同的通氧方式下,详细分析了离子辅助对离子束溅射沉积Ta<sub>2</sub>O<sub>5</sub>展开更多
Using collection film technique combined with Auger electron spectroscopy is analysis, the preferential sputtering of the ternary alloy Cu76Ni15Sn9 bombarded with 27 keV Ar+ at normal incidence is studied. After bomba...Using collection film technique combined with Auger electron spectroscopy is analysis, the preferential sputtering of the ternary alloy Cu76Ni15Sn9 bombarded with 27 keV Ar+ at normal incidence is studied. After bombardment, the target surfaCe is examined with SEM, and the surface composition of different topographical feature areas is measured with electron probe micrthanalyser (EPMA). The experiment results show that Cu atoms are preferentially ejected compared with Ni atoms, and Sn atoms come third within the ejection angle range from 0° to 60°. The results are discussed from the viewpoint of sputtering from a very rough surface.展开更多
Polycrystalline ZnO films were prepared on glass wafer using Zn targets by radio frequency(RF)reactive sputtering technique under different deposition conditions.X-ray diffraction (XRD) and optical transmittance spect...Polycrystalline ZnO films were prepared on glass wafer using Zn targets by radio frequency(RF)reactive sputtering technique under different deposition conditions.X-ray diffraction (XRD) and optical transmittance spectrum were employed to analyze the structure and optical character of the films.The strain and stress in films, as well as the packing density are calculated in terms of refractive index of films measured with an elliptic polarization analyzer.It is the deposition conditions that have great effects on the structural and optical properties of ZnO films.Under the optimal conditions,the only evident peak in XRD spectrum was (002) peak with the full width at half maximum (FWHM) of 0.20° showing the grain size of 42.8 nm.The packing density,the stress in (002) plane and the average optical transmittance in the visible region were about 97%,-1.06×10~9 N/m^2 and 92%, respectively.展开更多
基金Project(21271188)supported by the National Natural Science Foundation of ChinaProject(2012M521541)supported by the China Postdoctoral Science Foundation+2 种基金Project(2012QNZT002)supported by the Fundamental Research Funds for the Central South Universities,ChinaProject(20110933K)supported by the State Key Laboratory of Powder Metallurgy,ChinaProject(CSU2012024)supported by the Open-End Fund for Valuable and Precision Instruments of Central South University,China
文摘Wurtzite aluminum nitride（AlN） films were deposited on Si（100） wafers under various sputtering pressures by radio-frequency（RF） reactive magnetron sputtering. The film properties were investigated by XRD, SEM, AFM, XPS and nanoindenter techniques. It is suggested from the XRD patterns that highly c-axis oriented films grow preferentially at low pressures and the growth of（100） planes are preferred at higher pressures. The SEM and AFM images both reveal that the deposition rate and the surface roughness decrease while the average grain size increases with increasing the sputtering pressure. XPS results show that lowering the sputtering pressure is a useful way to minimize the incorporation of oxygen atoms into the AlN films and hence a film with closer stoichiometric composition is obtained. From the measurement of nanomechanical properties of AlN thin films, the largest hardness and elastic modulus are obtained at 0.30 Pa.
文摘TB43 2004064364 离子束溅射沉积Ta<sub>2</sub>O<sub>5</sub>光学薄膜的实验研究=Experimental study of ion beam sputtering deposition of Ta<sub>2</sub>O<sub>5</sub> optical thin film[刊,中]/刘洪祥（中科院光电技术研究所.四川,成都（610209））,熊胜明…∥光电工程.—2004,31（3）.—41-43,55 根据择优溅射的理论,在不同的通氧方式下,详细分析了离子辅助对离子束溅射沉积Ta<sub>2</sub>O<sub>5</sub>
文摘Using collection film technique combined with Auger electron spectroscopy is analysis, the preferential sputtering of the ternary alloy Cu76Ni15Sn9 bombarded with 27 keV Ar+ at normal incidence is studied. After bombardment, the target surfaCe is examined with SEM, and the surface composition of different topographical feature areas is measured with electron probe micrthanalyser (EPMA). The experiment results show that Cu atoms are preferentially ejected compared with Ni atoms, and Sn atoms come third within the ejection angle range from 0° to 60°. The results are discussed from the viewpoint of sputtering from a very rough surface.
文摘Polycrystalline ZnO films were prepared on glass wafer using Zn targets by radio frequency(RF)reactive sputtering technique under different deposition conditions.X-ray diffraction (XRD) and optical transmittance spectrum were employed to analyze the structure and optical character of the films.The strain and stress in films, as well as the packing density are calculated in terms of refractive index of films measured with an elliptic polarization analyzer.It is the deposition conditions that have great effects on the structural and optical properties of ZnO films.Under the optimal conditions,the only evident peak in XRD spectrum was (002) peak with the full width at half maximum (FWHM) of 0.20° showing the grain size of 42.8 nm.The packing density,the stress in (002) plane and the average optical transmittance in the visible region were about 97%,-1.06×10~9 N/m^2 and 92%, respectively.
