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LCoS芯片p-n结光生电流理论分析
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作者 欧毅 李大勇 刘明 《液晶与显示》 CAS CSCD 北大核心 2006年第1期24-28,共5页
LCoS中像素有源驱动电路受到光照后会在p-n结上产生光生漏电流,而光生漏电流的产生会引起LCoS的图像对比度退化,直接影响其成像质量。从光学和半导体器件物理两方面出发,分析了光生漏电流的产生机理,指出了影响漏电流大小的主要因素是... LCoS中像素有源驱动电路受到光照后会在p-n结上产生光生漏电流,而光生漏电流的产生会引起LCoS的图像对比度退化,直接影响其成像质量。从光学和半导体器件物理两方面出发,分析了光生漏电流的产生机理,指出了影响漏电流大小的主要因素是入射光功率和挡光层的厚度。以Al膜作为挡光层材料,实际测量了不同厚度Al膜在可见光范围内的反射率,并在测量数据的基础上分别计算了不同情况下的光生电流的大小。当Al膜厚度为50nm时,光生电流最大仅为5.15×10-10A,可以抑制光生漏电流的产生,满足了LCoS的实际使用时的要求。 展开更多
关键词 LCOS P-N结 光生漏电流 挡光层
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Interface Reaction of SiO_2/Ta and Its Influence on Cu Diffusion 被引量:1
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作者 龙世兵 马纪东 +4 位作者 于广华 赵洪辰 朱逢吾 张国海 夏洋 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2002年第10期1046-1050,共5页
Ta/NiFe film is deposited on Si substrate precoated with SiO_2 by magnetron sputtering.SiO_2/Ta interface and Ta_5Si_3 standard sample are investigated by using X-ray photoelectron spectroscopy (XPS) and peak decompos... Ta/NiFe film is deposited on Si substrate precoated with SiO_2 by magnetron sputtering.SiO_2/Ta interface and Ta_5Si_3 standard sample are investigated by using X-ray photoelectron spectroscopy (XPS) and peak decomposition technique.The results show that there is a thermodynamically favorable reaction at the SiO_2/Ta interface:37Ta+15SiO_2=5Ta_5Si_3+6Ta_2O_5.The more stable products Ta_5Si_3 and Ta_2O_5 may be beneficial to stop the diffusion of Cu into SiO_2. 展开更多
关键词 copper interconnection in ULSI diffusion barrier interface reaction X-ray photoelectron spectroscopy
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An air-stable inverted photovoltaic device using ZnO as the electron selective layer and MoO_3 as the blocking layer 被引量:5
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作者 宋朋飞 秦文静 +3 位作者 丁国静 闫齐齐 杨利营 印寿根 《Optoelectronics Letters》 EI 2011年第5期330-333,共4页
An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (P... An air-stable photovoltaic device based on znic oxide nanoparticles (ZNP) in an inverted structure of indium tin oxide (ITO)/ZnO/poly (3-hexylthiophene) (P3HT): [6,6]-phenyl C61-butyric acid methyl ester (PCBM)/MoO3/Ag is studied. We fm.d that the optimum thickness of the MoO3 layer is 2 nm. When the MoO3 blocking layer is introduced, the fill factor of the devices is increased from 29% to 40%, the power conversion efficiency is directly promoted from 0.35% to 1.27%.The stability under ambient conditions of this inverted structure device much is better due to the improved stability at the polymer/Ag interface. The enhancement is attributed to the high carriers mobility and suitable band gap of MoO3 layer. 展开更多
关键词 Butyric acid Conversion efficiency Fatty acids Indium compounds Photovoltaic effects Silver Tin Tin oxides Zinc oxide
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Experimental study of GaN based blue light emitting diodes with a thin AlInN layer in front of the electron blocking layer 被引量:1
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作者 路纲 王波 葛运旺 《Optoelectronics Letters》 EI 2015年第4期248-251,共4页
The Ga N based blue light emitting diodes(LEDs) with a thin Al In N layer inserted in front of the electron blocking layer(EBL) are experimentally studied.It is found that inserting a thin EBL can improve the light ou... The Ga N based blue light emitting diodes(LEDs) with a thin Al In N layer inserted in front of the electron blocking layer(EBL) are experimentally studied.It is found that inserting a thin EBL can improve the light output power and reduce the efficiency droop compared with the conventional Al Ga N counterparts.Based on numerical simulation and analysis,the improvement on the electrical and optical characteristics is mainly attributed to the reduction of the electron leakage current,which increases the concentration of carriers in the quantum well(QW) when the thin Al In N layer is used. 展开更多
关键词 blocking inserted inserting attributed leakage thick crystalline nucleation lifetime Heidelberg
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