期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
压力容器密封垫片接触应力均匀化的措施 被引量:1
1
作者 刘涛 房本勇 +2 位作者 邱亚越 汤心仪 黄模佳 《南昌大学学报(工科版)》 CAS 2021年第1期36-42,共7页
平面法兰与密封垫的接触应力分布极不均匀,接触应力较小处易发生漏油现象。微锥法兰取代替平面法兰可大幅提升密封垫接触应力均匀性。通过建立压力容器两螺栓间的抗弯刚度与简支梁的抗弯刚度等效模型,给出使接触应力均匀化的微锥法兰倾... 平面法兰与密封垫的接触应力分布极不均匀,接触应力较小处易发生漏油现象。微锥法兰取代替平面法兰可大幅提升密封垫接触应力均匀性。通过建立压力容器两螺栓间的抗弯刚度与简支梁的抗弯刚度等效模型,给出使接触应力均匀化的微锥法兰倾斜角工程确定方法。实验测量和有限元数值仿真结果均表明采用微锥法兰倾斜角的工程确定方法,能有效改善密封垫接触应力的均匀性,研究成果和措施对压力容器微锥法兰的加工、提高液体油压力容器密封性具有参考价值。 展开更多
关键词 微锥法兰倾斜角 弯曲刚度等效 接触应力均匀化
下载PDF
Contact stress non-uniformity of wafer surface for multi-zone chemical mechanical polishing process 被引量:3
2
作者 WANG TongQing LU XinChun +1 位作者 ZHAO DeWen HE YongYong 《Science China(Technological Sciences)》 SCIE EI CAS 2013年第8期1974-1979,共6页
A finite element analysis(FEA)model is developed for the chemical-mechanical polishing(CMP)process on the basis of a 12-in five-zone polishing head.The proposed FEA model shows that the contact stress non-uniformity i... A finite element analysis(FEA)model is developed for the chemical-mechanical polishing(CMP)process on the basis of a 12-in five-zone polishing head.The proposed FEA model shows that the contact stress non-uniformity is less dependent on the material property of the membrane and the geometry of the retaining ring.The larger the elastic modulus of the pad,the larger contact stress non-uniformity of the wafer.The applied loads on retaining ring and zone of the polishing head significantly affect the contact stress distribution.The stress adjustment ability of a zone depends on its position.In particular,the inner-side zone has a high stress adjustment ability,whereas the outer-side zone has a low stress adjustment ability.The predicted results by the model are shown to be consistent with the experimental data.Analysis results have revealed some insights regarding the performance of the multi-zone CMP. 展开更多
关键词 chemical mechanical polishing contact stress NON-UNIFORMITY multi-zone polishing head retaining ring
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部