Effect of substrate temperature and oxygen plasma treatment on the properties of magnetron-sputtered CdS for solar cell applications

Cadmium sulfide(CdS)is an n-type semiconductor with excellent electrical conductivity that is widely used as an electron transport material(ETM)in solar cells.At present,numerous methods for preparing CdS thin films have emerged,among which magnetron sputtering(MS)is one of the most commonly used vacuum techniques.For this type of technique,the substrate temperature is one of the key deposition parameters that affects the interfacial properties between the target film and substrate,determining the specific growth habits of the films.Herein,the effect of substrate temperature on the microstructure and electrical properties of magnetron-sputtered CdS(MS-CdS)films was studied and applied for the first time in hydrothermally deposited antimony selenosulfide(Sb_(2)(S,Se)_(3))solar cells.Adjusting the substrate temperature not only results in the design of the flat and dense film with enhanced crystallinity but also leads to the formation of an energy level arrangement with a Sb_(2)(S,Se)_(3)layer that is more favorable for electron transfer.In addition,we developed an oxygen plasma treatment for CdS,reducing the parasitic absorption of the device and resulting in an increase in the short-circuit current density of the solar cell.This study demonstrates the feasibility of MS-CdS in the fabrication of hydrothermal Sb_(2)(S,Se)_(3)solar cells and provides interface optimization strategies to improve device performance.

铀表面Al-Zn镀层的结构和保护性能

利用扫描电镜(SEM),俄歇能谱分析(AES),X射线衍射分析(XRD)和电化学等技术,研究了磁控溅射沉积Al-Zn镀层的结构及其对铀的保护性能。结果表明施加偏压显著地影响Al-Zn镀层的结构和保护性能。在–100V偏压下沉积的Al-Zn镀层,其组织更致密,成分有择优重溅射现象并伴有合金相生成,更有利于铀的防腐保护。

Si含量对CrAlSiN薄膜抗氧化性能的影响

采用磁控溅射方法在高速钢上制备CrAlSiN薄膜,通过控制Si靶的功率来改变薄膜中Si元素含量;然后将样品在800℃和1000℃下,分别进行高温热处理1h。当Si含量为11.2at%时,CrAlSiN薄膜硬度值较高,随着Si靶功率和Si含量升高,薄膜硬度开始下降,高比例的非晶氮化硅相是薄膜硬度降低的原因。CrAlSiN薄膜在800℃大气热处理下,薄膜保持面心立方结构,当热处理温度升到1000℃时,出现了Cr、Al、Fe的氧化峰,表明薄膜面心立方结构发生改变,氧化现象加重,抗氧化效果显著降低。

Synthesis of One-Dimensional ZnO Na norods by Oxidating Zinc Films Deposited with Magnetron Sputtering

One-dimensional ZnO nanorods are synthesized by ox idating thin metal zinc films deposited on Si(111) substrates with radio frequen cy magnetron sputtering.The crystal structure,surface morphology,and optical pro perties of nanorods are investigated.X-ray diffraction(XRD) pattern,scanning el ectron microscopy(SEM),and transmission electron microscopy(TEM) analyses show t hat the synthesized single-crystal ZnO nanorods develop like hairpins along dif ferent radials,with a hexagonal wurtzite structure.The diameters of nanorods ran ge between 30 and 60nm and lengths up to micrometers.Photoluminescence(PL) analy sis shows that,under 280nm light excitation,a strong and sharp near band-edge U V light emission band at 372nm and a relatively weak green deep-level light emi ssion band at 516nm are observed from the ZnO nanorods,which indicates excellent crystallization and optical quality of the fabricated ZnO nanorods.

Effects of Annealing on Atomic Interdiffusion and Microstructures in Fe/Si Systems

Pure metal Fe films with thickness of about 100nm were deposited on Si （100） substrates by DC magnetron sputtering. Annealing was subsequently performed in a vacuum furnace in the temperature range of 600-1000℃ for 2h. The samples were characterized by means of Rutherford backscattering （RBS） with 3MeV carbon ions. The RBS data were fitted with SIMNRA 6.0, and the results show the atomic interdiffusion in Fe/Si systems. The microstructures and crystal structures were characterized by scanning electron microscope and X-ray diffrac- tion. The effects of annealing on atomic interdiffusion, silicide formation, and microstructures in Fe/Si systems were analyzed.

Improvement of adhesion properties of TiB_2 films on 316L stainless steel by Ti interlayer films

The periodic [Ti/TiB2]n （n=l, 2, 3） multilayered films were prepared on the substrate of AISI 316L stainless steel by magnetron sputtering to enhance the adhesion of TiB2 films based on the remarkable mechanical performance of layered films. The influence of periods on microstructure, adhesion and hardness of [Ti/TiB2]n multilayered films was studied. X-ray diffraction （XRD） analysis shows that the monolayer TiB2 films exhibit （001） preferred orientation, and the preferred orientation of [Ti/TiB2], multilayered films transfers from （001） to （100） with the increase of periods. The cross-sectional morphology of each film displays homogeneity by field emission scanning electron microscopy （FESEM）. The hardness of the films measured via nanoindention changes from 20 to 26 GPa with the increase of periods. These values of hardness are a bit lower than that of the monolayer TiB2 films which is up to 33 GPa. However, the [Ti/TiB2]n multilayered films present a considerably good adhesion, which reaches a maximum of 24 N, in comparison with the monolayer TiB2 films according to the experimental results.

Structural and optoelectronic properties of AZO thin films prepared by RF magnetron sputtering at room temperature

Al-doped ZnO thin films were prepared on glass substrate using an ultra-high density target by RF magnetron sputtering at room temperature. The microstructure, surface morphology, optical and electrical properties of AZO thin films were investigated by X-ray diffractometer, scanning electron microscope, UV-visible spectrophotometer, four-point probe method, and Hall-effect measurement system. The results showed that all the films obtained were polycrystalline with a hexagonal structure and average optical transmittance of AZO thin films was over 85 % at different sputtering powers. The sputtering power had a great effect on optoelectronic properties of the AZO thin films, especially on the resistivity. The lowest resistivity of 4.5×10^-4 Ω·cm combined with the transmittance of 87.1% was obtained at sputtering power of 200 W. The optical band gap varied between 3.48 and 3.68 eV.

Properties of W/DLC/W-S-C composite films fabricated by magnetron sputtering

A kind of W/DLC/W-S-C composite film was fabricated by magnetron sputtering method.Effects of WSx content on the structure and the adhesion of the composite films were investigated.In addition,tribological behavior of the composite films was studied in the conditions of the ambient air and N2 gas atmosphere by ball-on-disk tester.The results indicate that the composite films show dense and amorphous microstructure.The WCx and WSx compounds are found in amorphous diamond like carbon matrix in the top layers of W-S-C.A proper WSx content is beneficial for improving the adhesion of the composite films.In air atmosphere,the composite films with high C content have better wear resistance and the friction coefficients range from 0.15 to 0.25.In N2 condition,high WSx content is benefit for the wear resistance and the friction coefficients of the composite films range from 0.03 to 0.1.

Effects of sputtering pressure on nanostructure and nanomechanical properties of AlN films prepared by RF reactive sputtering

Wurtzite aluminum nitride（AlN） films were deposited on Si（100） wafers under various sputtering pressures by radio-frequency（RF） reactive magnetron sputtering. The film properties were investigated by XRD, SEM, AFM, XPS and nanoindenter techniques. It is suggested from the XRD patterns that highly c-axis oriented films grow preferentially at low pressures and the growth of（100） planes are preferred at higher pressures. The SEM and AFM images both reveal that the deposition rate and the surface roughness decrease while the average grain size increases with increasing the sputtering pressure. XPS results show that lowering the sputtering pressure is a useful way to minimize the incorporation of oxygen atoms into the AlN films and hence a film with closer stoichiometric composition is obtained. From the measurement of nanomechanical properties of AlN thin films, the largest hardness and elastic modulus are obtained at 0.30 Pa.

Effect of Zn and Ti mole ratio on microstructure and photocatalytic properties of magnetron sputtered TiO_2-ZnO heterogeneous composite film

Series of TiO 2-ZnO heterojunction composite films with different n（Zn）/n（Ti） ratios were prepared by UDP450 magnetron sputter ion plating equipment, and the mole ratio of Zn to Ti was controlled by adjusting the current values of sputtering target. The effects of n（Zn）/n（Ti） on the microstructures of TiO2-ZnO films were investigated by SEM, AFM, Raman and XPS, and their photocatalytic decomposition of methyl orange solutions was evaluated. The results show that an increase in n（Zn）/n（Ti） typically results in a decrease in the grain size of composite films firstly and then an increase of grain size, while an increase in n（Zn）/n（Ti） leads to an increase in film roughness firstly and then a decrease in film roughness. Both grain size and roughness of TiO2-ZnO films reach the maximum and minimum at n（Zn）/n（Ti） of 1/9.3, respectively. The n（Zn）/n（Ti） shows little effect on the valences of Zn and Ti elements, which mainly exist in the form of TiO2 and ZnO phases. The n（Zn）/n（Ti） has influence on the amount of anatase/rutile TiO2 heterojunction in the film. With increase of the n（Zn）/n（Ti）, the absorption intensity of the composite film increases and the absorption region extends to 450 nm, which is redshifted as much as 150 nm in comparison with the pure TiO2 films. However, the photocatalytic abilities of heterogeneous composite films do not depend on the n（Zn）/n（Ti） but rather on the microstructures of the TiO2-ZnO composite films. Degradation rate of the film reaches the maximum and the photocatalytic decomposition of pollutants works best when n（Zn）/n（Ti）=1：9.3.

Effect of bias voltage on compositional, mechanical and corrosion property of ZrNbAlN multilayer films by unbalanced magnetron sputtering

Nano-scaled ZrNbAlN films with different negative bias voltages（Vb） were deposited on bronze substrate and Si（100） wafers by a reactive unbalanced magnetron sputtering technique. Composition and structure properties were characterized by X-ray photoelectron spectroscopy and X-ray diffraction. It is found that mole concentrations of Zr and Nb are affected by Vb, which leads to the increase of binding energy of N 1s and Al 2p and decrease of binding energy of Zr 3d5/2 and Nb 3d5/2. Surface morphologies evolution controlled by Vb could be observed. Furthermore, X-ray diffraction patterns reveal that these films show a（111） preferred orientation. Moreover, mechanical property and corrosion behavior of ZrNbAlN films were characterized by nanoindentation test and corrosion test, respectively. A maximum value of 21.85 GPa at-70 V occurs in the ZrNbAlN- bronze system, which outperforms uncoated bronze. Corrosion experiments in 0.5 mol/L NaCl and 0.5 mol/L HCl solution show that corrosion potential and corrosion current are dependent on Vb, and better anti-corrosion property could be obtained at-90 V.

Preparation of Al_2O_3/Au nano-laminated composite coatings and their oxidation resistance on stainless steel

Al2O3/Au nano-laminated composite coatings were prepared by means of magnetron sputtering. The coating was compact and comprised of nano-laminated Al2O3 and Au layers. High temperature cyclic oxidation test was employed to investigate the oxidation resistance of the composite coatings. The results revealed that the applied Al2O3/Au nano-laminated composite coatings improved the oxidation and spallation resistance of the stainless steel substrate significantly. The mechanism accounting for oxidation resistance was related with the suppression of inward oxygen diffusion and selective oxidation of Cr in the substrate. The mechanism accounting for spallation resistance was attributed to the relaxation of thermal stress by the nano-laminated structure.

衬底温度调制生长GZO薄膜的性能研究

利用射频磁控溅射法在石英玻璃衬底上制备ZnO∶Ga透明导电氧化物薄膜,主要研究了一种类调制掺杂工艺对GZO薄膜的薄膜形貌结构和光电性能的影响。通过X射线衍射仪(XRD)、扫描电子显微镜(SEM)、紫外-可见-近红外分光光度计(UV-VIS-NIR)和四探针测试仪对GZO薄膜进行表征。结果表明:不同的衬底温度调制下生长的GZO薄膜都具有明显的c轴择优取向,对于衬底温度调制条件下,在150℃/RT条件下的薄膜结晶最好,且在可见近红外波段(480~1600 nm)平均透过率达到85.4%左右,薄膜最低方阻达到60Ω/□。

Physical and Electrochemical Characterization of LiCo0.8M0.2O2 （M=Ni,Zr） Cathode Films for All-solid-state Rechargeable Thin-film Lithium Batteries

LiCo0.8M0.2O2 （M=Ni,Zr） films were fabricated by radio frequency sputtering deposition combined with conventional annealing methods. The strtuctures of the films were characterized with X-ray diffraction （XRD）, Raman spectroscopy and scarming electron microscopy （SEM） techniques. It was shown that the 700 ℃- annealed LiCo0.8M0.2O2 has an α-NaFeO2 like layered structure. All-solid-state thin-film batteries （TFBs） were fabrieated with these films as the cathode and their eleetroctemical performances were evaluated. It was found that doping of electrochemically active Ni and inactive Zr has different effects on the structural and elcctrochemical properties of the LiCoO2 cathode films. Ni doping increases the discharge capacity of the film while Zr doping improves its cycling stability.

Effect of sputtering conditions on growth and properties of ZnO :Al films

Al-doped zinc oxide（AZO） films were deposited on glass substrates by mid-frequency magnetron sputtering. The effects of substrate rotation speed and target-substrate distance on the electrical, optical properties and microstructure and crystal structures of the resulting films were investigated by scanning electron microscopy（SEM）, atomic force microscopy（AFM）, X-ray diffraction（XRD）, spectrophotometer and Hall-effect measurement system, respectively. XRD results show that all AZO films exhibit a strong preferred c-axis orientation. However, the crystallinity of films decreases with the increase of substrate rotation speed, accompanying with the unbalanced grains grows. For the films prepared at different target-substrate distances, the uniform microstructure and morphology are observed. The highest carrier concentration of 5.9×1020 cm-3 and Hall mobility of 13.1 cm^2/（V·s） are obtained at substrate rotation speed of 0 and target-substrate distance of 7 cm. The results indicate that the structure and performances of the AZO films are strongly affected by substrate rotation speed.

High temperature oxidation behavior of magnetically sputtered Ni-0.5Y micro-crystal coating

The isothermal and cyclic oxidation behaviors of bulk pure nickel and its magnetically sputtered Ni 0 5Y micro crystal coating were studied at 1?000?℃ in air. Scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine structures of the coating and the NiO oxide films. Laser Raman spectrum was also used to measure the stress level in NiO films formed on bulk nickel and the coating. It was found that Ni 0 5Y micro crystal coating had lower oxidation rate, and the grain size of NiO formed on Ni 0 5Y coating was also relatively smaller than that formed on bulk nickel. Meanwhile, the compressive stress level of oxide film formed on Ni 0 5Y coating was lower than that formed on bulk nickel, and the oxide film’s high temperature plasticity was improved in the coating case. The improvements of anti oxidation properties of the sputtered Ni 0 5Y coating were due to the micro crystal structure and the rare earth element Y.

Microstructure and Nonlinear Optical Properties of Very Small Size GaAs Nanogranulae Embedded in SiO_2 Matrix by Magnetron Co-Sputtering

Microstructure of GaAs/SiO 2 nanogranular thin films fabricated by radio frequency magnetron co sputtering technique and postannealing are investigated via atomic force microscope,X ray diffraction,and Rutherford backscattering spectroscopy.The results show that GaAs nanocrystals with average diameters from 1 5nm to 3 2nm (depending on the annealing temperature) are uniformly dispersed in the SiO 2 matrices.GaAs and SiO 2 are found in normal stoichiometry in the films.The nonlinear optical refraction and nonlinear optical absorption are studied by Z scan technique using a single Gaussian beam of pulse laser.The third order nonlinear optical refractive index and nonlinear absorption coefficient are enhanced due to the quantum confinement effects and estimated to be 4×10 -12 m 2/W and 2×10 -5 m/W respectively in nonresonant condition,while 2×10 -11 m 2/W and -1×10 -4 m/W respectively in quasi resonant condition.

Effects of Al coating on corrosion resistance of sintered NdFeB magnet

Pure Al coating was deposited on sintered NdFeB magnet by direct current（DC） magnetron sputtering to improve the corrosion resistance of magnet. The influences of coating thickness and sputtering power on microstructure and corrosion resistance of Al coating were investigated. The surface morphology of Al coating was characterized by scanning electron microscopy（SEM）. The corrosion properties were investigated by potentiodynamic polarization curves and neutral salt spray（NSS） test. The formation of the uniform and compact Al coating is a necessary condition to achieve excellent corrosion resistance. And the optimal corrosion resistance can be obtained in the sample with 6.69 μm thick Al coating deposited at 51-82 W.

Electrochemical Intercalation of Sodium into Silicon Thin Film

In order to investigate the possibility of Si thin film as an anode for Na battery,we studied the electrochemical intercalation of sodium into the Si film.Amorphous Si thin film electrode was prepared using DC magnetron sputtering.Sodium ion could intercalate into Si thin film upto Na0.52Si,i.e.530mAh·g-1-Si.The first discharge capacity was 80mAh·g-1-Si,which meant reversible amount of sodium intercalation.The discharge capacity slightly decreased to 70mAh·g-1-Si after 10 cycles.