A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phas...A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup.展开更多
An unique mask moving method is developed for forming effective micro-optical structures with continuous profile. The mechanism for forming different micro-optical profiles is disclosed, and the designed approach for ...An unique mask moving method is developed for forming effective micro-optical structures with continuous profile. The mechanism for forming different micro-optical profiles is disclosed, and the designed approach for binary moving mask is described. Finally some concrete micro-optical components with typical microstructures are presented for demonstrating the validity of the method.展开更多
文摘A new partitioning methodology is presented to accelerate 130nm and beyond large scale alternating phase shift mask(Alt PSM) design flow.This method deals with granularity self adaptively.Phase conflicts resolution approaches are described and strategies guaranteeing phase compatible during layout compaction are also discussed.An efficient CAD prototype for dark field Alt PSM based on these algorithms is implemented.The experimental results on several industry layouts show that the tool can successfully cope with the rapid growth of phase conflicts with good quality and satisfy lower resource consumption with different requirements of precision and speedup.
文摘An unique mask moving method is developed for forming effective micro-optical structures with continuous profile. The mechanism for forming different micro-optical profiles is disclosed, and the designed approach for binary moving mask is described. Finally some concrete micro-optical components with typical microstructures are presented for demonstrating the validity of the method.
