Chlorine-implantation of silicon has a number of applications, for example, possible effects due to introduction of chlorine by plasma etching of silicon wafer as a procedure of device techniques, or chlorine implanta...Chlorine-implantation of silicon has a number of applications, for example, possible effects due to introduction of chlorine by plasma etching of silicon wafer as a procedure of device techniques, or chlorine implantation as a proposed efficient n-type doping method. However, the microstructural evolution in chlorine-ion implanted silicon has not been systematically studied.Un the present work we carried out some study with emphasis on the dose dependence of microstructures. P-type silicon specimens were展开更多
基金Projects(2017YFB0306000,2017YFB0305600)supported by the National Key Research and Development Program of ChinaProjects(51774035,51604025,51574031,51574030,51574029,51604240)supported by the National Natural Science Foundation of China+2 种基金Project(2019JZZY010327)supported by the Shandong Key Research and Development Plan Project,ChinaProjects(2174079,2162027)supported by the Natural Science Foundation Program of Beijing,ChinaProjects(FRF-IDRY-19-025,FRF-TP-17-034A2,FRF-TP-19-015A3,FRF-IDRY-19-003C2)supported by the Fundamental Research Funds for the Central Universities of China。
文摘Chlorine-implantation of silicon has a number of applications, for example, possible effects due to introduction of chlorine by plasma etching of silicon wafer as a procedure of device techniques, or chlorine implantation as a proposed efficient n-type doping method. However, the microstructural evolution in chlorine-ion implanted silicon has not been systematically studied.Un the present work we carried out some study with emphasis on the dose dependence of microstructures. P-type silicon specimens were
