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Influence of intermittently etching on quality of CVD diamond thin films 被引量:1
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作者 杨侃诚 夏义本 +5 位作者 王林军 刘建敏 苏青峰 徐闰 彭鸿雁 史伟民 《中国有色金属学会会刊:英文版》 CSCD 2006年第B01期321-323,共3页
A new method, called growing-etching repetitional process based on hot filament chemical vapor deposition, was proposed to improve the quality of diamond film. During the deposition carbon source was intermittently cl... A new method, called growing-etching repetitional process based on hot filament chemical vapor deposition, was proposed to improve the quality of diamond film. During the deposition carbon source was intermittently closed letting hydrogen etch the surface of the diamond film from time to time. In order to find whether it is helpful to the films’ quality, a series of experiments were done. The results show that the new method can enhance the orientation of the chemical vapor deposition diamond films, reduce the graphite phase and increase the film’s surface resistivity. 展开更多
关键词 金刚石薄膜 HFCVD法 断续蚀刻 质量
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