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Measurement of the Waveguide Near-field Optical Spot
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作者 XIA You-xin,PEI Xian-deng,HUANG Hao,XIE Chang-sheng,WANG Hai-wei(National Storage System Lab.,Huazhong University of Sci.& Technol.,Wuhan 430074,CHN) 《Semiconductor Photonics and Technology》 CAS 2003年第2期123-127,共5页
The characteristic of near-field spots is analyzed.The size of the near field and the heat response time of the hybrid record medium to overcome super paramagnetic effect are calculated based on the heat transfer theo... The characteristic of near-field spots is analyzed.The size of the near field and the heat response time of the hybrid record medium to overcome super paramagnetic effect are calculated based on the heat transfer theory. A novel measuring method for the diameter of near-field recording spot is also presented. Since the grain of the recording media is tiny enough,near-field optical lithography can be accomplished with the aid of atomic force microscope (AFM).The diameter of near-field recording spot can be obtained by specifically designed computer.So the relationship between the near-field recording spot diameter and the probe size of near-field recording system, the near field recording distance coupling between head and disc can be got. 展开更多
关键词 evanescent energy AFM near―field recording spot near―field opticallithography
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