期刊文献+

二次检索

题名
关键词
文摘
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息

学科

共找到4篇文章
< 1 >
每页显示 20 50 100
低温等离子体处理技术在印刷电路板上的应用 被引量:6
1
作者 毛志勇 《电子工业专用设备》 2003年第2期75-76,共2页
关键词 低温等离子体处理技术 印刷电路板 显微刻蚀 表面清洁 沉积作用
下载PDF
Effect of ammonia gas etching on growth of vertically aligned carbon nanotubes/nanofibers
2
作者 Sang-Gook KIM Sooh-Yung KIM Hyung-Woo LEE 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2011年第A01期130-134,共5页
The etching effect of ammonia (NH3) on the growth of vertically aligned nanotubes/nanofibers (CNTs) was investigated by direct-current plasma enhanced chemical vapor deposition (DC-PECVD). NH3 gas etches Ni cata... The etching effect of ammonia (NH3) on the growth of vertically aligned nanotubes/nanofibers (CNTs) was investigated by direct-current plasma enhanced chemical vapor deposition (DC-PECVD). NH3 gas etches Ni catalyst layer to form nanoscale islands while NH3 plasma etches the deposited amorphous carbon. Based on the etching effect of NH3 gas on Ni catalyst, the differences of growing bundles of CNTs and single strand CNTs were discussed; specifically, the amount of optimal NH3 gas etching is different between bundles of CNTs and single strand CNTs. In contrast to the CNT carpet growth, the single strand CNT growth requires shorter etching time (5 min) than large catalytic patterns (10 rain) since nano dots already form catalyst islands for CNT growth. Through removing the plasma pretreatment process, the damage from being exposed at high temperature substrate occurring during the plasma generation time is minimized. High resolution transmission electron microscopy (HTEM) shows fishbone structure of CNTs grown by PECVD. 展开更多
关键词 carbon nanotube ammonia etching nickel catalyst plasma enhanced chemical vapor deposition (PECVD)
下载PDF
Atomic process of oxidative etching in monolayer molybdenum disulfide 被引量:8
3
作者 Danhui Lv Hulian Wang +5 位作者 Dancheng Zhu Jie Lin Guoli Yin Fang Lin Ze Zhang ChuanhongJin 《Science Bulletin》 SCIE EI CAS CSCD 2017年第12期846-851,共6页
The microscopic process of oxidative etching of two-dimensional molybdenum disulfide(2D MoS_2) at an atomic scale is investigated using a correlative transmission electron microscope(TEM)-etching study.MoS_2 flakes on... The microscopic process of oxidative etching of two-dimensional molybdenum disulfide(2D MoS_2) at an atomic scale is investigated using a correlative transmission electron microscope(TEM)-etching study.MoS_2 flakes on graphene TEM grids are precisely tracked and characterized by TEM before and after the oxidative etching. This allows us to determine the structural change with an atomic resolution on the edges of the domains, of well-oriented triangular pits and along the grain boundaries. We observe that the etching mostly starts from the open edges, grain boundaries and pre-existing atomic defects.A zigzag Mo edge is assigned as the dominant termination of the triangular pits, and profound terraces and grooves are observed on the etched edges. Based on the statistical TEM analysis, we reveal possible routes for the kinetics of the oxidative etching in 2D MoS_2, which should also be applicable for other 2D transition metal dichalcogenide materials like MoSe_2 and WS_2. 展开更多
关键词 Molybdenum disulfideOxidative etchingTransmission electron microscopyAtomic process
原文传递
Impact of the CoFe microstructure etched surface oxidation on Co spin and orbital moment
4
作者 GUO YuXian ZHANG ZiJun +2 位作者 WANG Jie FU ShaoJun XU PengShou 《Science China Chemistry》 SCIE EI CAS 2013年第3期588-592,共5页
Patterned ferromagnetic thin film shows promising applications in ultra-high density magnetic storage,magnetoresistive transducer,magnetic random access memory and many other devices.Since the performance of these dev... Patterned ferromagnetic thin film shows promising applications in ultra-high density magnetic storage,magnetoresistive transducer,magnetic random access memory and many other devices.Since the performance of these devices is closely associated with the magnetic properties of the etched patterns,it is necessary to study the effects of freshly etched surface oxidation on the magnetic properties of the patterned microstructures.In the current work,were carried out an X-ray Magnetic Circular Dichroism(XMCD) study on a 50 nm Co 0.9 Fe 0.1 continuous thin film and a related patterned Co 0.9 Fe 0.1 grating structure etched with a 2 μm period.Based on the sum rules,the spin and orbital moments were calculated for these two samples,respectively.The results indicated that the spin and orbital moments of grating structure(1.34μ B and 0.24μ B,respectively) decreased 17.3% compared with the corresponding continuous film(1.62μ B and 0.29μ B,respectively).We proposed that the moment decreasing of the patterned grating structure was mainly caused by the etched surface oxidation during the pattern manufacture process.The oxidation ratio of Co element in the patterned grating structure is 14.4% calculated from X-ray absorption spectroscopy(XAS) measurement.Considering the oxidation ratio,we amend the spin and orbital moment of Co and the amended result is basically in accordance with that of continuous film,demonstrating that the difference of the spin and orbital moments between the sub-micron grating unit and the continuous film is really caused by the oxidation. 展开更多
关键词 magnetic grating structure X-ray Magnetic Circular Dichroism (XMCD) spin moment orbital moment absorptionspectrum fitting
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部