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柱状多晶Mg-Gd-Y合金形变组织演变及形变硬化机制
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作者 柴涛 耿传刚 +3 位作者 房大然 赵圣诗 林小娉 董允 《材料导报》 EI CAS CSCD 北大核心 2023年第10期175-180,共6页
利用定向凝固技术制备了生长取向集中于[2243]、基面〈a〉滑移取向因子(Schmid factor,SF)大于0.4的柱状多晶Mg-6.38Gd-0.45Y合金,并研究了实验合金室温拉伸形变行为。结果表明,形变初期,软取向柱状晶内首先启动{1012}拉伸孪生协调应变... 利用定向凝固技术制备了生长取向集中于[2243]、基面〈a〉滑移取向因子(Schmid factor,SF)大于0.4的柱状多晶Mg-6.38Gd-0.45Y合金,并研究了实验合金室温拉伸形变行为。结果表明,形变初期,软取向柱状晶内首先启动{1012}拉伸孪生协调应变。形变过程中,{1012}拉伸孪晶界快速、大范围扩展,吞噬基体并使基体取向逐渐转为[1210](SF<0.15),于是启动{1011}压缩孪生和{1011}-{1012}双孪生协调应变。压缩孪晶和双孪晶易形成压缩孪晶带群,并贯穿整个晶粒,滑移或扩展的位错及拉伸孪晶界与压缩孪晶带群交织在一起,产生形变硬化,提高合金强度的同时也形成应力高度集中分布区域,成为微裂纹形成之地。 展开更多
关键词 晶体生长取向 MG-GD-Y合金 拉伸孪生 压缩孪晶带群
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Growth Front Evolution of GaN Thin Films on Sapphire Substrate During HVPE 被引量:1
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作者 LU Dian-qing LI Xin-hua LIU Xue-dong 《Semiconductor Photonics and Technology》 CAS 2005年第4期221-224,共4页
The growth front evolution of GaN thin films deposited on sapphire substrate by hydride vapor phase epitaxity has been studied with atomic force microscope. The evolution of the surface morphology presents four featur... The growth front evolution of GaN thin films deposited on sapphire substrate by hydride vapor phase epitaxity has been studied with atomic force microscope. The evolution of the surface morphology presents four features of stage with the growth process. In initial growth stage, the surface is granular, and the typical grain diameter is about 250 nm for t =0.1 min. 3D growth plays a key role before the films come up to full coalescence, which causes a rough surface. After 0. 1 min the growth dimension decreases with the increase of lateral over growth, the surface roughness obviously decreases. From 0.4 min to 3 rain, the growth front roughness increases gradually, and the evolution of the surface roughness exhibits the characteristics of self-affined fractal. Beyond 3 min, the root-mean-square decreases gradually, which means the deposition behavior from hyper-2D growth gradually turns into layer growth mode with the increase of growth time. 展开更多
关键词 GAN Hydride vapor phase epitaxy Growth front evolution
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Strain Relaxation Related Photoluminescence Bands in Ge/Si Short Period Superlattices 被引量:1
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作者 JIZhenguo NoritakaUsami 《Semiconductor Photonics and Technology》 CAS 1998年第2期89-93,共5页
Pure-Ge/Si short period superlattice (SPS) grown by gas source MBE (GSMBE) is studied by photoluminescence spectroscopy and Raman scattering spectroscopy. An abnormal band in photoluminescence is found in an intermedi... Pure-Ge/Si short period superlattice (SPS) grown by gas source MBE (GSMBE) is studied by photoluminescence spectroscopy and Raman scattering spectroscopy. An abnormal band in photoluminescence is found in an intermediate range of Lsi between 1.9 nm-2.9 nm for samples with LGe fixed at 1.5 ml. In contrast to a pure-Ge/Si quantum well, the energy of the band shows red-shift as Lsi increases. Raman scattering shows that Si-Si vibration related Raman shift reaches a minimum for samples with strongest PL intensity of the abnormal band. It is therefore concluded that the abnormal band is related with strain relaxation process. 展开更多
关键词 PHOTOLUMINESCENCE Quantum Well Raman Scattering Strain Relaxation SUPERLATTICE
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Relationship between solid/liquid interface and crystal orientation for pure magnesium solidified in fashion of cellular crystal 被引量:2
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作者 常国威 陈淑英 +2 位作者 周聪 岳旭东 齐义辉 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2010年第2期289-293,共5页
The relationship between the solid/liquid interface and the crystal orientation for pure magnesium,which grows in fashion of cellular crystal in unidirectional solidification,was investigated.The results show that the... The relationship between the solid/liquid interface and the crystal orientation for pure magnesium,which grows in fashion of cellular crystal in unidirectional solidification,was investigated.The results show that the energy of the solid/liquid interface is the lowest during cellular crystal growth of pure magnesium;and the solid/liquid interface is covered by the basal face{0001}and by the crystal face made up of three atoms located at the orientation{0001}0100and two atoms located at the inner of magnesium crystal cell.The strongest bond is formed in the direction of 61.9°viating from the growth direction,and the second strong bond is formed in the directions of 8.5°d 47.7°espectively,deviating from the growth direction.The angle between the basal face{0001} and the growth direction is 61.9°he theoretical analysis results are basically consistent with the experimental results from SUSUMU et al. 展开更多
关键词 magnesium solidification process crystal growth crystal orientation
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