为了提高高速钢微细钻头的钻削质量,研究了物理气相沉积(PVD)涂层高速钢微细钻头在高速干式环境下钻削铝合金时的钻削性能。应用PVD离子镀技术在直径0.2 mm的高速钢微细钻头上制备Ti Al Si N、DLC、Ti N和Al Ti N 4种涂层,并通过同时沉...为了提高高速钢微细钻头的钻削质量,研究了物理气相沉积(PVD)涂层高速钢微细钻头在高速干式环境下钻削铝合金时的钻削性能。应用PVD离子镀技术在直径0.2 mm的高速钢微细钻头上制备Ti Al Si N、DLC、Ti N和Al Ti N 4种涂层,并通过同时沉积涂层的高速钢圆盘间接测量得到涂层的显微硬度、厚度和平均摩擦系数。以6061铝合金为被加工零件对涂层的实际加工性能进行了试验测试,得到了已钻取孔的表面形貌、直径和角磨损量。通过VHM-I04显微硬度计在0.49 N下测定,DLC涂层微钻的显微硬度为2 800,摩擦系数为0.05,钻削效果在所有涂层微钻和未涂层微钻中最好。因与高速钢基体结合差,导致Ti Al Si N涂层容易脱落、微钻磨损快,故Ti Al Si N涂层不适合沉积在微钻表面。展开更多
We have successfully employed metal-organic chemical vapor deposition （MOCVD） technique to simultaneously deposit double-sided YBa2Cu3O7-δ （YBCO） films on both sides of YzO3/yttria-stabilized zirconia （YSZ）/Ce...We have successfully employed metal-organic chemical vapor deposition （MOCVD） technique to simultaneously deposit double-sided YBa2Cu3O7-δ （YBCO） films on both sides of YzO3/yttria-stabilized zirconia （YSZ）/CeO2 （YYC） buffered biaxially textured Ni-5 at.% W substrates, which is of great prospect to cut the production cost of YBCO coated conductors. X-ray diffraction analysis revealed that both sides of YBCO film were purely c-axis oriented and highly textured. The co-scan of （005） YBCO and Ф-scan of （103） YBCO yielded full width at half maximum （FWHM） values of 4.9° and 6.6° for one side of double-sided YBCO film, respectively, as well as 4.4° and 6.4° for the other side. The current transportation measurements performed on such double-sided 500 nm-thickness YBCO films showed the self-field critical current density （Jc） at 77 K of 0.6 MA/cm^2 and 1.2 MA/cm^2, respectively. Further research is in the process of exploring new solution to improve the Jc in practice.展开更多
文摘为了提高高速钢微细钻头的钻削质量,研究了物理气相沉积(PVD)涂层高速钢微细钻头在高速干式环境下钻削铝合金时的钻削性能。应用PVD离子镀技术在直径0.2 mm的高速钢微细钻头上制备Ti Al Si N、DLC、Ti N和Al Ti N 4种涂层,并通过同时沉积涂层的高速钢圆盘间接测量得到涂层的显微硬度、厚度和平均摩擦系数。以6061铝合金为被加工零件对涂层的实际加工性能进行了试验测试,得到了已钻取孔的表面形貌、直径和角磨损量。通过VHM-I04显微硬度计在0.49 N下测定,DLC涂层微钻的显微硬度为2 800,摩擦系数为0.05,钻削效果在所有涂层微钻和未涂层微钻中最好。因与高速钢基体结合差,导致Ti Al Si N涂层容易脱落、微钻磨损快,故Ti Al Si N涂层不适合沉积在微钻表面。
基金supported by the National Natural Science Foundation of China(Grant No.51002024)Sichuan Youth Science and Technology Innovation Research Team Funding(Grant No.2011JTD0006)Fundamental Research Funds for the Central Universities(Grant Nos.ZYGX2012J039 and ZYGX2011Z002)
文摘We have successfully employed metal-organic chemical vapor deposition （MOCVD） technique to simultaneously deposit double-sided YBa2Cu3O7-δ （YBCO） films on both sides of YzO3/yttria-stabilized zirconia （YSZ）/CeO2 （YYC） buffered biaxially textured Ni-5 at.% W substrates, which is of great prospect to cut the production cost of YBCO coated conductors. X-ray diffraction analysis revealed that both sides of YBCO film were purely c-axis oriented and highly textured. The co-scan of （005） YBCO and Ф-scan of （103） YBCO yielded full width at half maximum （FWHM） values of 4.9° and 6.6° for one side of double-sided YBCO film, respectively, as well as 4.4° and 6.4° for the other side. The current transportation measurements performed on such double-sided 500 nm-thickness YBCO films showed the self-field critical current density （Jc） at 77 K of 0.6 MA/cm^2 and 1.2 MA/cm^2, respectively. Further research is in the process of exploring new solution to improve the Jc in practice.
