The crystalline structure and surface morphology of TiO2 semiconductor coating play an important role in the conversion efficiency of dye-sensitized solar cells. In order to obtain TiO2 coating with controllable morph...The crystalline structure and surface morphology of TiO2 semiconductor coating play an important role in the conversion efficiency of dye-sensitized solar cells. In order to obtain TiO2 coating with controllable morphology and high porosity, nanoporous TiO2 films were fabricated on conducting glass （FTO） substrates, Ti thin films （1.5-2 gin） were deposited on conducting glass （FTO） substrates via the DC sputtering method, and then electrochemically anodized in NH4F/ethylene glycol solution. The crystalline structure and surface morphology of the samples were characterized by X-ray diffraction （XRD） and field emission scanning electron microscopy （FESEM）, respectively. The influences of anodizing potential, electrolyte composition, and pH value on the surface morphology of nanoporous TiO2 films were extensively studied. The growth mechanism of nanoporous TiO2 films was discussed by current density variations with anodizing time. The results demonstrate that nanoporous TiO2 films with high porosity and three-dimensional （3D） networks are observed at 30 V, when the NH4F concentration in ethylene glycol solution is 0.3% （mass fraction） and the electrolyte pH value is 5.0.展开更多
Tin oxide thin films were deposited by direct current （DC） reactive sputtering at gas pressures of 0.015 mbar - 0.15 mbar. The crystalline structure and surface morphology of the prepared SnO2 films were introduced ...Tin oxide thin films were deposited by direct current （DC） reactive sputtering at gas pressures of 0.015 mbar - 0.15 mbar. The crystalline structure and surface morphology of the prepared SnO2 films were introduced by X-ray diffraction （XRD） and atomic force microscopy （AFM）. These films showed preferred orientation in the （110） plane. Due to AFM micrographs, the grain size increased non-uniformly as the working gas pressure increased.展开更多
基金Projects(21171027,50872014) supported by the National Natural Science Foundation of ChinaProject(K1001020-11)supported by the Science and Technology Key Project of Changsha City,China
文摘The crystalline structure and surface morphology of TiO2 semiconductor coating play an important role in the conversion efficiency of dye-sensitized solar cells. In order to obtain TiO2 coating with controllable morphology and high porosity, nanoporous TiO2 films were fabricated on conducting glass （FTO） substrates, Ti thin films （1.5-2 gin） were deposited on conducting glass （FTO） substrates via the DC sputtering method, and then electrochemically anodized in NH4F/ethylene glycol solution. The crystalline structure and surface morphology of the samples were characterized by X-ray diffraction （XRD） and field emission scanning electron microscopy （FESEM）, respectively. The influences of anodizing potential, electrolyte composition, and pH value on the surface morphology of nanoporous TiO2 films were extensively studied. The growth mechanism of nanoporous TiO2 films was discussed by current density variations with anodizing time. The results demonstrate that nanoporous TiO2 films with high porosity and three-dimensional （3D） networks are observed at 30 V, when the NH4F concentration in ethylene glycol solution is 0.3% （mass fraction） and the electrolyte pH value is 5.0.
文摘Tin oxide thin films were deposited by direct current （DC） reactive sputtering at gas pressures of 0.015 mbar - 0.15 mbar. The crystalline structure and surface morphology of the prepared SnO2 films were introduced by X-ray diffraction （XRD） and atomic force microscopy （AFM）. These films showed preferred orientation in the （110） plane. Due to AFM micrographs, the grain size increased non-uniformly as the working gas pressure increased.
