A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by...A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by EPMA,XRD,XPS,nano-indentation,SEM and HRTEM.The effect of Al content on the microstructure and oxidation resistance of W1?xAlxN films was investigated.The results show that WN film has a face-centered cubic structure.The preferred orientation changes from(111)to(200).The W1?xAlxN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases.The hardness of the W1?xAlxN films first increases and then decreases with the Al content increasing.The maximum hardness is36GPa,which is obtained at32.4%Al(mole fraction).Compared with WN film,the W1-xAlxN composite films show much better oxidation resistance because of the formation of dense Al2O3oxide layer on the surface.展开更多
文摘A series of W1?xAlxN films(0<x<38.6%,mole fraction)were deposited by reactive magnetron sputtering.The composition,microstructure,mechanical properties and oxidation resistance of the films were characterized by EPMA,XRD,XPS,nano-indentation,SEM and HRTEM.The effect of Al content on the microstructure and oxidation resistance of W1?xAlxN films was investigated.The results show that WN film has a face-centered cubic structure.The preferred orientation changes from(111)to(200).The W1?xAlxN films consist of a mixture of face-centered cubic W(Al)N and hexagonal wurtzite structure AlN phases.The hardness of the W1?xAlxN films first increases and then decreases with the Al content increasing.The maximum hardness is36GPa,which is obtained at32.4%Al(mole fraction).Compared with WN film,the W1-xAlxN composite films show much better oxidation resistance because of the formation of dense Al2O3oxide layer on the surface.