基于射频磁控溅射法制备了以非晶铟镓锌氧化物(a-IGZO)作为有源层的底栅顶接触式薄膜场效应晶体管(Thin Film Transistor,TFT),其长/宽比为300μm/100μm。研究了该器件在无激光和在三种不同波长激光照射下的光敏特性。实验表明,器件在...基于射频磁控溅射法制备了以非晶铟镓锌氧化物(a-IGZO)作为有源层的底栅顶接触式薄膜场效应晶体管(Thin Film Transistor,TFT),其长/宽比为300μm/100μm。研究了该器件在无激光和在三种不同波长激光照射下的光敏特性。实验表明,器件在波长分别为660、450和405nm三种激光照射下的阈值电压Vth分别为4.2、2.5和0V,均低于无激光时的4.3V,且器件的阈值电压随激光波长减小单调降低,此外,随着激光波长的下降,'明/暗'电流比K由0.54上升到8.06(在VGS=6V且VDS=5V条件下),光敏响应度R由0.33μA/mW上升到4.88μA/mW,可见激光波长越短,可获得更强的光电效应,光灵敏度也更高,该效应表明该器件在光电探测等领域具有广阔的应用前景。展开更多
随着信息技术进步,显示技术正朝高分辨率、大柔韧性和低能耗发展。ZnO TFT因高透明度、良好环境稳定性和潜在高迁移率,被视为下一代显示技术关键材料,但应力稳定性问题限制了其应用。本研究针对ZnO TFT的应力稳定性与电学性能优化展开,...随着信息技术进步,显示技术正朝高分辨率、大柔韧性和低能耗发展。ZnO TFT因高透明度、良好环境稳定性和潜在高迁移率,被视为下一代显示技术关键材料,但应力稳定性问题限制了其应用。本研究针对ZnO TFT的应力稳定性与电学性能优化展开,旨在通过材料设计、制备工艺及表征技术揭示关键影响因素,并提出改善策略。同时,探索In掺杂对ZnO TFT电学性能的调控机制,以获得高性能TFT器件。这不仅有助于理解ZnO TFT物理机制,也为推动其在柔性显示等领域的应用提供理论支撑和实验依据。本研究综述了ZnO TFT的研究背景,阐述了TFT结构、机制及性能指标,采用磁控溅射、光刻图案化等技术制备了ZnO和InZnO TFT器件,并利用多种表征手段全面分析了薄膜及器件性能。重点研究了氧含量、钝化层及In掺杂量对稳定性和电学性能的影响,揭示了相关机制,并成功制备了高性能TFT器件。最后,总结了研究成果,展望了ZnO TFT的未来发展方向,为相关领域研究提供参考。With the progress of information technology, display technology is developing towards high resolution, great flexibility and low energy consumption. ZnO TFT Due to high transparency, good environmental stability and potentially high mobility, but stress stability problems limit its application. This study aims to optimize the stress stability and electrical performance of ZnO TFT, and aims to reveal the key influencing factors through material design, preparation process and characterization technology, and propose improvement strategies. Meanwhile, the regulation mechanism of ZnO TFT electrical performance was explored to obtain high-performance TFT devices. This is not only helpful to understand the physical mechanism of ZnO TFT, but also provides theoretical support and experimental basis for promoting its application in flexible display and other fields. In this study, we summarized the research background of ZnO TFT, expounded the structure, mechanism and performance indexes of TFT, prepared ZnO and InZnO TFT devices by magnetron sputtering and lithography, and comprehensively analyzed the performance of thin film and device by various characterization methods. The effects of oxygen content, passivation layer and in doping on the stability and electrical properties are mainly studied, and the relevant mechanisms are revealed, and the high-performance TFT devices were successfully prepared. Finally, the research results are summarized and the future development direction of ZnO TFT is discussed, providing reference for research in related fields.展开更多
文摘基于射频磁控溅射法制备了以非晶铟镓锌氧化物(a-IGZO)作为有源层的底栅顶接触式薄膜场效应晶体管(Thin Film Transistor,TFT),其长/宽比为300μm/100μm。研究了该器件在无激光和在三种不同波长激光照射下的光敏特性。实验表明,器件在波长分别为660、450和405nm三种激光照射下的阈值电压Vth分别为4.2、2.5和0V,均低于无激光时的4.3V,且器件的阈值电压随激光波长减小单调降低,此外,随着激光波长的下降,'明/暗'电流比K由0.54上升到8.06(在VGS=6V且VDS=5V条件下),光敏响应度R由0.33μA/mW上升到4.88μA/mW,可见激光波长越短,可获得更强的光电效应,光灵敏度也更高,该效应表明该器件在光电探测等领域具有广阔的应用前景。
文摘随着信息技术进步,显示技术正朝高分辨率、大柔韧性和低能耗发展。ZnO TFT因高透明度、良好环境稳定性和潜在高迁移率,被视为下一代显示技术关键材料,但应力稳定性问题限制了其应用。本研究针对ZnO TFT的应力稳定性与电学性能优化展开,旨在通过材料设计、制备工艺及表征技术揭示关键影响因素,并提出改善策略。同时,探索In掺杂对ZnO TFT电学性能的调控机制,以获得高性能TFT器件。这不仅有助于理解ZnO TFT物理机制,也为推动其在柔性显示等领域的应用提供理论支撑和实验依据。本研究综述了ZnO TFT的研究背景,阐述了TFT结构、机制及性能指标,采用磁控溅射、光刻图案化等技术制备了ZnO和InZnO TFT器件,并利用多种表征手段全面分析了薄膜及器件性能。重点研究了氧含量、钝化层及In掺杂量对稳定性和电学性能的影响,揭示了相关机制,并成功制备了高性能TFT器件。最后,总结了研究成果,展望了ZnO TFT的未来发展方向,为相关领域研究提供参考。With the progress of information technology, display technology is developing towards high resolution, great flexibility and low energy consumption. ZnO TFT Due to high transparency, good environmental stability and potentially high mobility, but stress stability problems limit its application. This study aims to optimize the stress stability and electrical performance of ZnO TFT, and aims to reveal the key influencing factors through material design, preparation process and characterization technology, and propose improvement strategies. Meanwhile, the regulation mechanism of ZnO TFT electrical performance was explored to obtain high-performance TFT devices. This is not only helpful to understand the physical mechanism of ZnO TFT, but also provides theoretical support and experimental basis for promoting its application in flexible display and other fields. In this study, we summarized the research background of ZnO TFT, expounded the structure, mechanism and performance indexes of TFT, prepared ZnO and InZnO TFT devices by magnetron sputtering and lithography, and comprehensively analyzed the performance of thin film and device by various characterization methods. The effects of oxygen content, passivation layer and in doping on the stability and electrical properties are mainly studied, and the relevant mechanisms are revealed, and the high-performance TFT devices were successfully prepared. Finally, the research results are summarized and the future development direction of ZnO TFT is discussed, providing reference for research in related fields.
基金NCET(No.05-0326,NSFC (No.60576054,60576043,60576056)Jilin Univresity In-novation Foundation+2 种基金project of Chang chun science and technology plans with contract number of 2006303projects of Ministry of ConstructionChina and Department of Education of Jilin province