Electrical properties of high quality ultra thin nitride/oxynitride(N/O)stack dielectrics pMOS capacitor with refractory metal gate electrode are investigated,and ultra thin (<2 nm) N/O stack gate dielectrics with ...Electrical properties of high quality ultra thin nitride/oxynitride(N/O)stack dielectrics pMOS capacitor with refractory metal gate electrode are investigated,and ultra thin (<2 nm) N/O stack gate dielectrics with significant low leakage current and high resistance to boron penetration are fabricated.Experiment results show that the stack gate dielectric of nitride/oxynitride combined with improved sputtered tungsten/titanium nitride (W/TiN) gate electrode is one of the candidates for deep sub-micron metal gate CMOS devices.展开更多
The photocatalytic activity of cobalt octakis（butylthio） porphyrazine（CoPz（BuS）8） was assessed through photodegradation of the dye rhodamine B（RhB） in water under irradiation with a Xe lamp and aerated conditi...The photocatalytic activity of cobalt octakis（butylthio） porphyrazine（CoPz（BuS）8） was assessed through photodegradation of the dye rhodamine B（RhB） in water under irradiation with a Xe lamp and aerated conditions.The photocatalytic activity of CoPz（BuS）8 loaded on Al2O3 or SiO2@Fe3O4nanoparticles or coordinated with an axial azide ligand was also investigated.The results demonstrated that the photocatalytic activity of CoPz（BuS）8 loaded on Al2O3 was higher than that loaded on SiO2@Fe3O4.The kinetic curves of RhB degradation in aqueous solutions at different pH indicated the pseudo first-order kinetics of the reaction.The highest degradation rate for CoPz（BuS）8 loaded Al2O3 at pH = 4 after 160 min was 84.6%.However,the advantages of easier separation and recycling as well as the ability to terminate the reaction at any time for the CoPz（BuS）8 loaded SiO2@Fe3O4 cannot be ignored.When electron-rich NaN3 was coordinated with CoPz（BuS）8 as an axial ligand and loaded on Al2O3,the resulting catalyst produced more active oxygen species such as O2^- and HO· to promote the quicker degradation of RhB than that by the other catalysts.For the N3-coordinated CoPz（BuS）8 loaded on Al2O3,the reactions at pH = 4 and 7 distinctly deviated from first-order kinetics,and the degradation rate reached 77.6%after 80 min at pH = 4.展开更多
文摘Electrical properties of high quality ultra thin nitride/oxynitride(N/O)stack dielectrics pMOS capacitor with refractory metal gate electrode are investigated,and ultra thin (<2 nm) N/O stack gate dielectrics with significant low leakage current and high resistance to boron penetration are fabricated.Experiment results show that the stack gate dielectric of nitride/oxynitride combined with improved sputtered tungsten/titanium nitride (W/TiN) gate electrode is one of the candidates for deep sub-micron metal gate CMOS devices.
基金supported by National Natural Science Foundation of China (20977115, 21272281)Natural Science Foundation of Hubei Province (2014CFB919)the Science and Technology Plan Innovation Team of Wuhan City (2015070504020220)~~
文摘The photocatalytic activity of cobalt octakis（butylthio） porphyrazine（CoPz（BuS）8） was assessed through photodegradation of the dye rhodamine B（RhB） in water under irradiation with a Xe lamp and aerated conditions.The photocatalytic activity of CoPz（BuS）8 loaded on Al2O3 or SiO2@Fe3O4nanoparticles or coordinated with an axial azide ligand was also investigated.The results demonstrated that the photocatalytic activity of CoPz（BuS）8 loaded on Al2O3 was higher than that loaded on SiO2@Fe3O4.The kinetic curves of RhB degradation in aqueous solutions at different pH indicated the pseudo first-order kinetics of the reaction.The highest degradation rate for CoPz（BuS）8 loaded Al2O3 at pH = 4 after 160 min was 84.6%.However,the advantages of easier separation and recycling as well as the ability to terminate the reaction at any time for the CoPz（BuS）8 loaded SiO2@Fe3O4 cannot be ignored.When electron-rich NaN3 was coordinated with CoPz（BuS）8 as an axial ligand and loaded on Al2O3,the resulting catalyst produced more active oxygen species such as O2^- and HO· to promote the quicker degradation of RhB than that by the other catalysts.For the N3-coordinated CoPz（BuS）8 loaded on Al2O3,the reactions at pH = 4 and 7 distinctly deviated from first-order kinetics,and the degradation rate reached 77.6%after 80 min at pH = 4.
