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常压烧结Sialon材料高温性能的研究 被引量:2
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作者 傅博 颜丰 王永兰 《耐火材料》 EI CAS 北大核心 1998年第2期66-69,73,共5页
研究了添加剂为Y2O3、Al2O3、AlN的Sialon材料的高温性能。晶化处理后,其断裂韧性由4MPa·m1/2提高到6MPa·m1/2;高温强度到1100℃仍不明显降低;抗热震临界温差达△Tth=473℃。其高温断裂为蠕变机制,符合裂纹准静态扩展... 研究了添加剂为Y2O3、Al2O3、AlN的Sialon材料的高温性能。晶化处理后,其断裂韧性由4MPa·m1/2提高到6MPa·m1/2;高温强度到1100℃仍不明显降低;抗热震临界温差达△Tth=473℃。其高温断裂为蠕变机制,符合裂纹准静态扩展机理。裂纹准静态扩展是热震损伤的控制因素。 展开更多
关键词 高温 性能 晶化 蠕变 烧结 耐火材料 氨化硅
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陶瓷材料的微波烧结工艺研究 被引量:2
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作者 陈利祥 张宏图 《青岛大学学报(自然科学版)》 CAS 1997年第3期94-96,共3页
关键词 陶瓷 微波 烧结 氧化铝 氧化锆 氨化硅
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可调心滑动轴承在潜水多级电泵中的应用
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作者 阳益贵 《企业技术开发(下半月)》 2009年第6期62-62,共1页
文章针对潜水多级电泵中滑动轴承易出现的质量问题,简要介绍了一种能适应潜水电泵工作环境,耐磨性能好、使用寿命长、装配维修方便。
关键词 潜水电泵 氨化硅 可调心滑动轴承 应用
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卧式PECVD在太阳能行业的应用
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作者 郑建宇 盛金龙 张上华 《电子工业专用设备》 2007年第9期16-19,38,共5页
介绍了一种用于太阳能行业淀积氮化硅薄膜的等离子增强化学气相淀积设备,叙述了该设备的结构组成,并重点阐述了工艺原理及关键技术的改进。
关键词 PECVD 氨化硅薄膜 工艺 改进
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AmmAmmoximation of Cyclohexanone to Cyclohexanone Oxime Catalyzed by Titanium Silicalite-1 Zeolite in Three-phase System 被引量:7
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作者 刘国清 吴剑 罗和安 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2012年第5期889-894,共6页
An innovative green process of producing ε-caprolactam was proposed by integrating ammoximation and Beckmann rearrangement effectively. As a first part of the new process, TS-1 molecular sieve-catalyzed synthesis of ... An innovative green process of producing ε-caprolactam was proposed by integrating ammoximation and Beckmann rearrangement effectively. As a first part of the new process, TS-1 molecular sieve-catalyzed synthesis of cyclohexanone oxime from cyclohexanone, ammonia and hydrogen peroxide was carried out in a batch plant. Cyclohexane was used as the solvent in the three-phase reaction system. The influences of essential process parameters on ammoximation were investigated. Under the reaction conditions as catalyst content of 2.5% (by mass); H 2 O 2 /yclohexanone molar ratio of 1.10; NH 3 /cyclohexanone molar ratio of 2.20; reaction temperature of 343 K; reaction time of 5 h, high conversion of cyclohexanone and selectivity to oxime (both>99%) were obtained. Thus, the three-phase ammoximation process showed equal catalytic activity as TS-1 but much more convenient and simpler for the separation of catalyst in comparison to the industrial two-phase system with t-butanol used as solvent. 展开更多
关键词 AMMOXIMATION molecular sieve TS-1 cyclohexanone oxime CYCLOHEXANE three-phase system
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Growth of Cu/SSZ-13 on SiC for selective catalytic reduction of NO with NH_3 被引量:3
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作者 Tiaoyun Zhou Qing Yuan +1 位作者 Xiulian Pan Xinhe Bao 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 北大核心 2018年第1期71-78,共8页
Silicon carbide(SiC)was used as a support for SSZ‐13zeolite in an attempt to improve the high‐temperature stability and activity of Cu/SSZ‐13in the selective catalytic reduction(SCR)of NO with NH3.SSZ‐13was grown ... Silicon carbide(SiC)was used as a support for SSZ‐13zeolite in an attempt to improve the high‐temperature stability and activity of Cu/SSZ‐13in the selective catalytic reduction(SCR)of NO with NH3.SSZ‐13was grown via a hydrothermal method using the silicon and silica contained in SiC as the source of silicon,which led to the formation of a chemically bonded SSZ‐13layer on SiC.Characterization using X‐ray diffraction,scanning electron microscopy,and N2adsorption‐desorption isotherms revealed that the alkali content strongly affected the purity of zeolite and the crystallization time affected the coverage and crystallinity of the zeolite layer.Upon ion exchange,the resulting Cu/SSZ‐13@SiC catalyst exhibited enhanced activity in NH3‐SCR in the high‐temperature region compared with the unsupported Cu/SSZ‐13.Thus,the application temperature was extended with the use of SiC as the support.?2018,Dalian Institute of Chemical Physics,Chinese Academy of Sciences.Published by Elsevier B.V.All rights reserved. 展开更多
关键词 ZEOLITE SSZ‐13 Silicon carbide Selective catalytic reduction by AMMONIA
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Deposition of Silicon Nitride Films by Silane Hydrazine Process
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作者 ZHONG Bo-qiang (Shanghai Institute of Ceramics, Chinese Academy of Science, Shanghai 200050,CHN) 《Semiconductor Photonics and Technology》 CAS 1999年第2期109-113,共5页
A new catalytic chemical vapor process for depositing silicon nitride films using silane hydrazine gaseous mixture is described. This system can be useful at a temperature of lower than 400 ℃. The catalytic process ... A new catalytic chemical vapor process for depositing silicon nitride films using silane hydrazine gaseous mixture is described. This system can be useful at a temperature of lower than 400 ℃. The catalytic process gives more rapid deposition rate than 10 nm/min. The atomic composition ratio, N/Si, which is evaluated by Rutherfold backscattering method is about 1.4 under a given experimental conditions more than the stoichiometric value of 1.33 in Si 3N 4. The infrared transmission spectra show a large dip at 850 cm -1 due to Si-N bonds and no clear dip due to Si-O bonds. High N-H bond density is the evidence that the deposition mechanism is limited by N-N bond breaking of the hydrazine. The H contents, evaluated from Si-H and N-H bonds in the infrared absorption spectra, and the deposition rate are measured as a function of the substrate temperature. In addition some film properties such as the resistivity and the breakdown electric field are presented. 展开更多
关键词 CVD Deposition Rate Silane Hydrazine Silicon Nitride Films CLC number:TN304.055 Document code:A
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Surface modification of magnesium hydroxide by γ-aminopropyltriethoxysilane
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作者 罗伟 冯其明 +1 位作者 欧乐明 刘琨 《Journal of Central South University of Technology》 EI 2008年第3期318-323,共6页
Magnesium hydroxide(MH),which is commonly used as a halogen-free flame retardant filler in composite materials,was modified by silanization reaction with γ-aminopropyltriethoxysilane (γ-APS) in aqueous solution at d... Magnesium hydroxide(MH),which is commonly used as a halogen-free flame retardant filler in composite materials,was modified by silanization reaction with γ-aminopropyltriethoxysilane (γ-APS) in aqueous solution at different pH values (pH range from 8.0 to 12.0). The surface properties of grafted γ-APS on MH surface as a function of solution pH value were studied using elemental analysis,Fourier transform infrared spectroscopy and zeta potential measurement. The results show that hydrolysis and condensation of γ-APS are activated in alkaline solution and lead to multilayer adsorption of γ-APS molecules on the surface of MH. The type of adsorption orientation of γ-APS on MH surface is a function of coverage density that is altered by changing solution pH value. At low coverage density (e.g. 55 nm-2),γ-APS molecules are preferentially adsorbed to the surface with the silicon moiety towards the surface,and increasing coverage density (e.g. 90 nm-2) leads to parallel orientation. At an even higher coverage density (e.g. 115 nm-2),γ-APS molecules bond to the surface with the amino moiety towards the surface. 展开更多
关键词 magnesium hydroxide γ-aminopropyltriethoxysilane surface modification ORIENTATION
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PREPARATION OF CHITOSAN COATED METAL AFFINITY CHROMATOGRAPHY ADSORBENT
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作者 Tan Tianwei Xu Weijiang Zhang Shurong 《Chinese Journal of Reactive Polymers》 1998年第1期61-66,共6页
A new and an inexpensive adsorbent of chitosan coated silica for immobilized metal affinity chromatography (IMIC) was studied. After a double coating, the chitosan coated on silica beads could be up to 53. 4 mg/g sili... A new and an inexpensive adsorbent of chitosan coated silica for immobilized metal affinity chromatography (IMIC) was studied. After a double coating, the chitosan coated on silica beads could be up to 53. 4 mg/g silica beads.When pH>3. 8, the metal ligand Cu2+ was chelated on the coated chitosan witha bound capacity of 14. 6 mg/g chitosan without introducing iminodiacetic acid(IDA). 展开更多
关键词 Immobilized metal affinity chromatography CHITOSAN
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