TiN films were deposited on 2A12 aluminum alloy by arc ion plating (AIP). The Vickers hardness of the films deposited at different bias voltages and different nitrogen gas pressures, and that of the substrate were mea...TiN films were deposited on 2A12 aluminum alloy by arc ion plating (AIP). The Vickers hardness of the films deposited at different bias voltages and different nitrogen gas pressures, and that of the substrate were measured. The surface roughness of the TiN films diposited at –30 V and –80 V respectively and at different nitrogen gas pressure was measured also. The mass loss of TiN films deposited at 0 V, –30 V and –80 V respectively were analyzed in dry sand rubber wheel abrasive wear tests and wet ones in comparison with uncoated Al alloy and austenitic stainless steel (AISI 316L). It is revealed that the highest hardness of the TiN film is obtained at a bias voltage of –30 V and a N2 gas pressure of 0.5 Pa. The surface roughness of the film is larger at –80 V than that at –30 V and reduces as the increase of the N2 gas pressure. The mass loss of TiN-film coated 2A12 aluminum alloy is remarkably less than that of uncoated Al alloy and also that of AISI 316L, which indicates that the abrasive wear rate is greatly reduced by the application of TiN coating. TiN coating deposited by arc ion plating (AIP) technique on aluminum alloy can be a potential coating for machine parts requiring preciseness and lightness.展开更多
Optimal parameters for depositing Titanium nitride （TIN） thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si （100） substrates by DC reactive magnetron sputtering, at...Optimal parameters for depositing Titanium nitride （TIN） thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si （100） substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction （XRD）; surface morphology of the thin films was characterized using an atomic force microscope （AFM）. The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500℃, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred （200） orientation, resistance is small enough for its use as bottom electrodes.展开更多
Objective:To study the characteristics of the intraocular lens using ion beam sputtering depositing titanium nitride thin film on the intraocular lens(IOLs).Methods:To deposite titanium nitride thin film on the top of...Objective:To study the characteristics of the intraocular lens using ion beam sputtering depositing titanium nitride thin film on the intraocular lens(IOLs).Methods:To deposite titanium nitride thin film on the top of intraocular lens by ion beam sputtering depositing.We analyzed the surface morphology of intraocular lens through SEM and AFM.We detected intraocular lens resolution through the measurement of intraocular lens.Biocompatibility of intraocular lens is preliminary evaluated in this test.Results:The surface morphology of intraocular lens material was not changed,and was in line with the requirements of smoothness.Resolution was in line with national requirements.Unmodified and modified IOLs's cytotoxicity were 1 and 0.6 grade respectively.Hemolytic rates of modified and unmodified were both less than 5%.Conclusion:Ion beam sputtering deposition of objects didn't only affect the surface morphology and the basic optical performance,but also can enhance the biocompatibility of intraocular lens.Ion beam sputtering deposition technique has provided new methods for the surface modification of IOLs and PMMA materials.展开更多
Bell-metal, mainly an alloy of copper and tin has been in different uses since many years in the history of human civilization. This work provides an efficient and eco-friendly method to protect bell-metal from oxidat...Bell-metal, mainly an alloy of copper and tin has been in different uses since many years in the history of human civilization. This work provides an efficient and eco-friendly method to protect bell-metal from oxidation when left in the atmosphere for a long duration which enables the bell-metal to retain its bright golden yellow colour. Titanium nitride thin film deposition by reactive cylindrical magnetron sputtering method is done for this purpose. Besides retaining the bright golden colour of the bell-metal, the deposited titanium nitride film also provides hardness and corrosion resistance to the bell-metal surface thereby providing durability to the material.展开更多
The titanium nitride (TiNx) thin film with a controllable surface structure was fabricated by the dc-reactive magnetron sputtering technique, and the variation of microstructure in the surface layer with the energy of...The titanium nitride (TiNx) thin film with a controllable surface structure was fabricated by the dc-reactive magnetron sputtering technique, and the variation of microstructure in the surface layer with the energy of condensed adatom was investigated through X-ray diffraction (XRD) pattern and transmission electron microscope(TEM). It was found that the lattice parameters and the full width at half maximum (fwhm) of XRD peak on the top layers in the preferred orientation of (111) and (002) were closely correlated to the impacting induced phase composition, compressive strain, crystallite size and the fault density of the thin films. In the theory, a new means was used to model the atomistic process of per condensed adatom. The average energy at least in the minimum energy state of the incorporate adatom on TiN surface layer was statistically formulized through a careful consideration of dynamical process, which properly interpreted the experimental observations.展开更多
文摘TiN films were deposited on 2A12 aluminum alloy by arc ion plating (AIP). The Vickers hardness of the films deposited at different bias voltages and different nitrogen gas pressures, and that of the substrate were measured. The surface roughness of the TiN films diposited at –30 V and –80 V respectively and at different nitrogen gas pressure was measured also. The mass loss of TiN films deposited at 0 V, –30 V and –80 V respectively were analyzed in dry sand rubber wheel abrasive wear tests and wet ones in comparison with uncoated Al alloy and austenitic stainless steel (AISI 316L). It is revealed that the highest hardness of the TiN film is obtained at a bias voltage of –30 V and a N2 gas pressure of 0.5 Pa. The surface roughness of the film is larger at –80 V than that at –30 V and reduces as the increase of the N2 gas pressure. The mass loss of TiN-film coated 2A12 aluminum alloy is remarkably less than that of uncoated Al alloy and also that of AISI 316L, which indicates that the abrasive wear rate is greatly reduced by the application of TiN coating. TiN coating deposited by arc ion plating (AIP) technique on aluminum alloy can be a potential coating for machine parts requiring preciseness and lightness.
基金Project supported by the National Natural Science Foundation of China (No. 60478039) and the Natural Science Foundation of Zheji-ang Province (No. X405002), China
文摘Optimal parameters for depositing Titanium nitride （TIN） thin films by DC reactive magnetron sputtering were determined. TiN thin films were deposited on Si （100） substrates by DC reactive magnetron sputtering, at different temperatures, different electrical current values, and different N2/Ar ratios. Structural characteristics of TiN thin films were measured by X-ray diffraction （XRD）; surface morphology of the thin films was characterized using an atomic force microscope （AFM）. The electric resistivity of the TiN films was measured by a four-point probe. In the result, temperature is 500℃, electrical current value is 1.6 A, pure N2 is the reacting gas, TiN thin film has the preferred （200） orientation, resistance is small enough for its use as bottom electrodes.
文摘Objective:To study the characteristics of the intraocular lens using ion beam sputtering depositing titanium nitride thin film on the intraocular lens(IOLs).Methods:To deposite titanium nitride thin film on the top of intraocular lens by ion beam sputtering depositing.We analyzed the surface morphology of intraocular lens through SEM and AFM.We detected intraocular lens resolution through the measurement of intraocular lens.Biocompatibility of intraocular lens is preliminary evaluated in this test.Results:The surface morphology of intraocular lens material was not changed,and was in line with the requirements of smoothness.Resolution was in line with national requirements.Unmodified and modified IOLs's cytotoxicity were 1 and 0.6 grade respectively.Hemolytic rates of modified and unmodified were both less than 5%.Conclusion:Ion beam sputtering deposition of objects didn't only affect the surface morphology and the basic optical performance,but also can enhance the biocompatibility of intraocular lens.Ion beam sputtering deposition technique has provided new methods for the surface modification of IOLs and PMMA materials.
文摘Bell-metal, mainly an alloy of copper and tin has been in different uses since many years in the history of human civilization. This work provides an efficient and eco-friendly method to protect bell-metal from oxidation when left in the atmosphere for a long duration which enables the bell-metal to retain its bright golden yellow colour. Titanium nitride thin film deposition by reactive cylindrical magnetron sputtering method is done for this purpose. Besides retaining the bright golden colour of the bell-metal, the deposited titanium nitride film also provides hardness and corrosion resistance to the bell-metal surface thereby providing durability to the material.
文摘The titanium nitride (TiNx) thin film with a controllable surface structure was fabricated by the dc-reactive magnetron sputtering technique, and the variation of microstructure in the surface layer with the energy of condensed adatom was investigated through X-ray diffraction (XRD) pattern and transmission electron microscope(TEM). It was found that the lattice parameters and the full width at half maximum (fwhm) of XRD peak on the top layers in the preferred orientation of (111) and (002) were closely correlated to the impacting induced phase composition, compressive strain, crystallite size and the fault density of the thin films. In the theory, a new means was used to model the atomistic process of per condensed adatom. The average energy at least in the minimum energy state of the incorporate adatom on TiN surface layer was statistically formulized through a careful consideration of dynamical process, which properly interpreted the experimental observations.
