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从氯气处理工艺分析氯冷器自燃爆炸原因
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作者 龙荣 《氯碱工业》 CAS 1998年第7期13-14,共2页
从氯气处理工艺分析氯冷器自燃爆炸原因龙荣(四川国营西昌氯碱电化厂615013)1概况该氯气液化工艺采用氨-氯化钙盐水间接冷冻制取液氯。由于氯气处理工艺和设备上的原因,造成干燥氯气质量不能保证氯气液化工艺要求。该设备自... 从氯气处理工艺分析氯冷器自燃爆炸原因龙荣(四川国营西昌氯碱电化厂615013)1概况该氯气液化工艺采用氨-氯化钙盐水间接冷冻制取液氯。由于氯气处理工艺和设备上的原因,造成干燥氯气质量不能保证氯气液化工艺要求。该设备自1992年10月投入运行,期间未对... 展开更多
关键词 气处理 工艺 氯冷器 冷却器 液化 爆炸原因
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Detailed kinetics of methylphenyldichlorosilane synthesis from methyldichlorosilane and chlorobenzene by gas phase condensation
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作者 刘彤 王铁峰 +2 位作者 黄云龙 汪超 王金福 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2015年第6期954-961,共8页
Methylphenyldichlorosilane(MPDS, CH3C6H5 SiC l2) is an important silicone monomer for the synthesis of highperformance polymethylphenylsiloxane polymers. In this work, the mechanism of the synthesis of MPDS from methy... Methylphenyldichlorosilane(MPDS, CH3C6H5 SiC l2) is an important silicone monomer for the synthesis of highperformance polymethylphenylsiloxane polymers. In this work, the mechanism of the synthesis of MPDS from methyldichlorosilane and chlorobenzene by gas phase condensation was studied, and a kinetic model with 35 species and 58 elementary reactions was established. Experiments were carried out in a tubular reactor under a wide range of reaction conditions. The calculated mole fractions of the reactants and products were in a good agreement with the experimental results. A mechanism of the insertion of chloromethylsilylene into the C\Cl bond of chlorobenzene was proposed, which was proved to be the main pathway of MPDS production. The established kinetic model can be used in design and optimization of the industrial reactor for MPDS synthesis. 展开更多
关键词 Detailed kinetics METHYLPHENYLDICHLOROSILANE Chloromethylsilylene Gas phase condensation
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Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane
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作者 孙帅帅 黄国强 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2014年第3期287-293,共7页
The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results ... The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results could be given when the chemical kinetics was taken into account in the equilibrium stage model. A single column process was used for the verification of previous studies. The results showed that 99.9% purity monosilane could be achieved in the reactive distillation. A pumparound block was employed to reduce the condenser duty with inexpen-sive coolant. The effects of operating pressure, feed stage location, liquid holdup per stage and pumparound location were also investigated. The energy consumption was limited, but the refrigerant temperature was too low, which is the fatal disadvantage. Therefore, a double columns process was developed to increase the condenser tem-perature. The simulation results demonstrated that a reasonable temperature could be achieved by varying the recycle stream location. 展开更多
关键词 reactive distillation reaction kinetics trichlorosilane redistribution pumparound monosilane
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Effect of chloralkanes on the phenyltrichlorosilane synthesis by gas phase condensation
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作者 刘彤 黄云龙 +2 位作者 汪超 唐强 王金福 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2015年第1期71-75,共5页
To enhance the process of phenyltrichlorosilane synthesis using gas phase condensation, a series of chloralkanes were introduced. The influence of temperature and chloralkane amount on the synthesis was studied based ... To enhance the process of phenyltrichlorosilane synthesis using gas phase condensation, a series of chloralkanes were introduced. The influence of temperature and chloralkane amount on the synthesis was studied based on the product distribution from a tubular reactor. The promoting effect of chloralkane addition was mainly caused by the chloralkane radicals generated by the dissociation of C–Cl bond. The promoting effect of the chloromethane with more chlorine atoms was better than those with less chlorine atoms. Intermediates detected from the reactions with isoprene and bromobenzene demonstrated that both trichlorosilyl radical and dichlorosilylene existed in the reaction system in the presence of chloralkanes. A detailed reaction scheme was proposed. 展开更多
关键词 Phenyltrichlorosilane Gas phase condensation Chloralkane Reaction mechanism RADICAL SYNTHESIS
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