A potassium dihydrogen phosphate(KDP) optical crystal was machined to an ultra-precision surface with water-in-oil(W/O) micro emulsion polishing fluid. The micro water dissolution principle utilized in the machining p...A potassium dihydrogen phosphate(KDP) optical crystal was machined to an ultra-precision surface with water-in-oil(W/O) micro emulsion polishing fluid. The micro water dissolution principle utilized in the machining process is discussed, its planarization mechanism is illustrated, and an ultra-precision polished surface with 2.205 nm RMS roughness is obtained. However, a substantial quantity of residual contamination remained on the polished surface after machining. This can seriously impact the optical performance of the crystal, and so it must be removed. Fourier transform infrared(FTIR) spectroscopy was used to conduct an investigation into the composition of the surface residue, and the results showed that the residue was comprised of organic chemicals with hydrocarbon chains and aromatic ether, i.e., mostly the polishing fluid. The cleaning method and the principle on which the KDP ultra precision surface investigation is based are discussed in detail, and the cleaning experiments with selected KDP-compatible organic solvents were then performed. FTIR transmittance spectra measurement and microscopic observations were employed to assess the effects of the cleaning process on the surface of the KDP crystal. The results showed that toluene cleaning achieved the most desirable results. This cleaning method produced a surface roughness of 1.826 nm RMS, which allows the KDP crystal to be applied to subsequent engineering applications.展开更多
基金supported by the National Natural Science Foundation of China(Grant No.51135002)the Specialized Research Fund for the Doctoral Program of Higher Education(Grant No.51321004)
文摘A potassium dihydrogen phosphate(KDP) optical crystal was machined to an ultra-precision surface with water-in-oil(W/O) micro emulsion polishing fluid. The micro water dissolution principle utilized in the machining process is discussed, its planarization mechanism is illustrated, and an ultra-precision polished surface with 2.205 nm RMS roughness is obtained. However, a substantial quantity of residual contamination remained on the polished surface after machining. This can seriously impact the optical performance of the crystal, and so it must be removed. Fourier transform infrared(FTIR) spectroscopy was used to conduct an investigation into the composition of the surface residue, and the results showed that the residue was comprised of organic chemicals with hydrocarbon chains and aromatic ether, i.e., mostly the polishing fluid. The cleaning method and the principle on which the KDP ultra precision surface investigation is based are discussed in detail, and the cleaning experiments with selected KDP-compatible organic solvents were then performed. FTIR transmittance spectra measurement and microscopic observations were employed to assess the effects of the cleaning process on the surface of the KDP crystal. The results showed that toluene cleaning achieved the most desirable results. This cleaning method produced a surface roughness of 1.826 nm RMS, which allows the KDP crystal to be applied to subsequent engineering applications.
