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基于多层膜沉积的循迹式线宽标准样片 被引量:1
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作者 赵琳 韩志国 +3 位作者 张晓东 许晓青 李锁印 吴爱华 《计量学报》 CSCD 北大核心 2022年第12期1549-1553,共5页
为了实现半导体行业内关键尺寸测量仪器的校准问题,展开了纳米尺寸线宽标准样片的研究工作。采用多层膜沉积技术研制了尺寸为20 nm和50 nm的纳米级线宽标准样片。针对标准样板整体尺寸小、仪器测量视场小所引起的校准时不便寻找的问题,... 为了实现半导体行业内关键尺寸测量仪器的校准问题,展开了纳米尺寸线宽标准样片的研究工作。采用多层膜沉积技术研制了尺寸为20 nm和50 nm的纳米级线宽标准样片。针对标准样板整体尺寸小、仪器测量视场小所引起的校准时不便寻找的问题,以及由于样板线边缘质量问题导致每次测量不同位置结果相差太大的困扰,设计了定位循迹标志。共设计9组标志,每组标志9个标记格,每个标记格的宽度尺寸为0.5μm,标记格的间隔为2.5μm,每组标志之间的距离为100μm。采用半导体工艺进行加工,可以快速准确地寻找到标准的测量位置,保证了每次测量结果的重复性,有效提高了测量速度及准确性。 展开更多
关键词 计量学 线宽标准 关键尺寸 多层沉积 循迹标记
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用于激光淀积多层膜的超高真空自动化装置
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作者 李蓉芳 《光机电信息》 1996年第5期27-31,共5页
目前在X射线光学中的重要进步同用于X射线辐射的多层膜的出现有关.多层膜应当包含40—300个0.5—10nm厚的层,层间的表面粗糙度<0.3nm,在整个多层膜面积上中间层的厚度不均匀性≤1%,层的相互交界厚度≤0.3nm.
关键词 激光 沉积多层膜 超高真空 自动化装置
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纵向磁场沉积态(F/SiO_2)_3/Ag/(SiO_2/F)_3多层复合结构膜的巨磁阻抗效应 被引量:1
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作者 陈卫平 邵先亦 +2 位作者 冯尚申 萧淑琴 刘宜华 《中国科学:技术科学》 EI CSCD 北大核心 2010年第3期306-310,共5页
采用射频溅射法分别在零磁场和72kA/m的纵向静磁场下,制备了结构为(F/SiO2)3/Ag/(SiO2/F)3(F=Fe71.5Cu1Cr2.5V4Si12B9)的多层复合膜.研究了沉积态样品的软磁特性和巨磁阻抗(GMI)效应.结果表明,在无磁场沉积态样品中未探测到GMI效应.在... 采用射频溅射法分别在零磁场和72kA/m的纵向静磁场下,制备了结构为(F/SiO2)3/Ag/(SiO2/F)3(F=Fe71.5Cu1Cr2.5V4Si12B9)的多层复合膜.研究了沉积态样品的软磁特性和巨磁阻抗(GMI)效应.结果表明,在无磁场沉积态样品中未探测到GMI效应.在沉积过程中加纵向磁场明显优化了材料的软磁性能,从而获得显著的GMI效应.在6.81MHz的频率下,最大纵向和横向GMI比分别高达45%和44%.同时还分析了磁阻抗比、磁电阻比、磁电抗比和有效磁导率比随频率变化的行为,发现磁场沉积态样品的纵向和横向GMI效应随频率变化的频谱曲线几乎重合.阻抗在低频下主要是巨磁电感效应.当频率f>9MHz时,磁电抗比变为负值,即电抗的性质从电感性变成了电容性. 展开更多
关键词 铁基软磁合金 沉积多层 巨磁阻抗效应 有效磁导率 各向异性
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自溯源光栅标准物质及其应用 被引量:5
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作者 邓晓 李同保 程鑫彬 《光学精密工程》 EI CAS CSCD 北大核心 2022年第21期2608-2625,共18页
纳米计量技术是纳米尺度上的精密测量技术,是先进纳米制造技术的基础。其中,溯源性是纳米计量的基础问题,而研制纳米计量标准物质是实现纳米测量溯源性传递、保证纳米几何量值测试的统一性和准确性的关键环节。为适应纳米计量扁平化量... 纳米计量技术是纳米尺度上的精密测量技术,是先进纳米制造技术的基础。其中,溯源性是纳米计量的基础问题,而研制纳米计量标准物质是实现纳米测量溯源性传递、保证纳米几何量值测试的统一性和准确性的关键环节。为适应纳米计量扁平化量值传递溯源的要求,基于铬跃迁频率,采用原子光刻技术和软X射线干涉技术制备了1D 212.8 nm,2D 212.8 nm,1D 106.4 nm 3种自溯源光栅标准物质;在多层膜沉积技术研制硅纳米线宽结构的基础上,探索了基于硅晶格常数的硅纳米线宽自溯源型测量方法。在应用领域,开展了自溯源光栅对扫描探针显微镜、扫描电子显微镜等高精密测量仪器的校准研究。研究结果表明,自溯源型标准物质及其测量方法缩短了精密仪器和加工技术过程中的纳米长度计量溯源链,是先进纳米制造和新一代信息技术的有力支撑。 展开更多
关键词 纳米科技 纳米计量 自溯源标准物质 原子光刻技术 软X射线干涉光刻技术 多层沉积技术
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Electrodeposition of multi-layer Pd-Ni coatings on 316L stainless steel and their corrosion resistance in hot sulfuric acid solution 被引量:2
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作者 Hui-zhong ZHANG Yang LI +2 位作者 Yu ZUO Xu-hui ZHAO Yu-ming TANG 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2017年第7期1543-1550,共8页
Pd-Ni coating shows good corrosion resistance in strong corrosion environments.However,in complex aggressiveenvironments,the performance of the coatings is limited and further improvement is necessary.The effects of t... Pd-Ni coating shows good corrosion resistance in strong corrosion environments.However,in complex aggressiveenvironments,the performance of the coatings is limited and further improvement is necessary.The effects of the applied platingcurrent density on the composition,structure and properties of Pd-Ni coatings were studied.By changing the current density in thesame bath,multi-layer Pd-Ni coatings were prepared on316L stainless steel.Scanning electronic microscopy,weight loss tests,adhesion strength,porosity and electrochemical methods were used to study the corrosion resistance of the films prepared bydifferent coating methods.Compared with the single layer Pd-Ni coating,the multi-layer coatings showed higher microhardness,lower internal stress,lower porosity and higher adhesive strength.The multi-layer Pd-Ni coating showed obviously better corrosionresistance in hot sulfuric acid solution containing Cl-. 展开更多
关键词 Pd-Ni film stainless steel multi-layer film ELECTROPLATING current density corrosion resistance
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Residual stress of physical vapor-deposited polycrystalline multilayers 被引量:1
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作者 ZHANG Song ZHANG Hui ZHENG LiLi 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2015年第2期55-63,共9页
An extended one-dimensional stress model for the deposition of multilayer films is built based on the existing stress model by considering the influence of deposition conditions. Both thermal stress and intrinsic stre... An extended one-dimensional stress model for the deposition of multilayer films is built based on the existing stress model by considering the influence of deposition conditions. Both thermal stress and intrinsic stress are considered to constitute the final residual stress in the model. The deposition process conditions such as deposition temperature, oxygen pressure, and film growth rate are correlated to the full stress model to analyze the final residual stress distribution, and thus the deformation of the deposited multilayer system under different process conditions. Also, the model is numerically realized with in-house built code. A deposition of Ag-Cu multilayer system is simulated with the as-built extended stress model, and the final residual stresses under different deposition conditions are discussed with part of the results compared with experiment from other literature. 展开更多
关键词 growth models stresses physical vapor deposition processes polycrystalline deposition METALS
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Photonic bandgap amorphous chalcogenide thin films with multilayered structure grown by pulsed laser deposition method
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作者 张绍骞 Petre Němec +1 位作者 Virginie Nazabal 金玉奇 《Optoelectronics Letters》 EI 2016年第3期199-202,共4页
Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication waveleng... Amorphous chalcogenide thin films were fabricated by the pulsed laser deposition technique. Thereafter, the stacks of multilayered thin films for reflectors and microcavity were designed for telecommunication wavelength. The prepared multilayered thin films for reflectors show good compatibility. The microcavity structure consists of Ge_(25)Ga)5Sb_(10)S_(65)(doped with Er^(3+)) spacer layer surrounded by two 5-layer As_(40)Se_(60)/Ge_(25)Sb_(5)S_(70) reflectors. Scanning/transmission electron microscopy results show good periodicity, great adherence and smooth interfaces between the alternating dielectric layers, which confirms a suitable compatibility between different materials. The results demonstrate that the chalcogenides can be used for preparing vertical Bragg reflectors and microcavity with high quality. 展开更多
关键词 多层 脉冲激光沉积 多层结构 光子带隙 硫系 非晶 布拉格反射镜 脉冲激光沉积技术
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