A novel nano-scale alignment technique based on Moiré signal for room-temperature imprint lithography in the submicron realm is proposed. The Moiré signals generated by a pair of quadruple gratings on two te...A novel nano-scale alignment technique based on Moiré signal for room-temperature imprint lithography in the submicron realm is proposed. The Moiré signals generated by a pair of quadruple gratings on two templates respectively are optically projected onto a photodetector array, then the detected Moiré signals are used to estimate the alignment errors in x and y directions. The experiment result indicates that complex differential Moiré signal is sensitive to relative displacement of the pair of marks than each single Moiré signal, and the alignment resolutions obtained in x and y directions are ±20nm(3σ) and ±24nm(3σ). They can meet the requirement of alignment accuracy for submicron imprint lithography.展开更多
文摘A novel nano-scale alignment technique based on Moiré signal for room-temperature imprint lithography in the submicron realm is proposed. The Moiré signals generated by a pair of quadruple gratings on two templates respectively are optically projected onto a photodetector array, then the detected Moiré signals are used to estimate the alignment errors in x and y directions. The experiment result indicates that complex differential Moiré signal is sensitive to relative displacement of the pair of marks than each single Moiré signal, and the alignment resolutions obtained in x and y directions are ±20nm(3σ) and ±24nm(3σ). They can meet the requirement of alignment accuracy for submicron imprint lithography.
