利用双光纤准直器研制出一种基于微电机械系统(M icro E lectron ic M echan ica l System,M EM S)技术的连续可调光衰减器,利用双光纤准直器光纤头(P igta il)的楔角面对C-L ens准直透镜产生的色散进行了补偿,使得该衰减器工作在C-B an...利用双光纤准直器研制出一种基于微电机械系统(M icro E lectron ic M echan ica l System,M EM S)技术的连续可调光衰减器,利用双光纤准直器光纤头(P igta il)的楔角面对C-L ens准直透镜产生的色散进行了补偿,使得该衰减器工作在C-B and及衰减范围内具有极低的波长相关损耗(W ave lengthD ependen t Loss,W DL)值.分析了影响该衰减器的其它光学性能的各个因素.对所试制样品进行测试结果表明:该衰减器具有良好的光学性能,插损(Insertion Loss,IL),回损(R eturn Loss,RL)等指标达到理想的结果,特别是W DL指标性能优于同类产品.展开更多
A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The...A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.展开更多
文摘利用双光纤准直器研制出一种基于微电机械系统(M icro E lectron ic M echan ica l System,M EM S)技术的连续可调光衰减器,利用双光纤准直器光纤头(P igta il)的楔角面对C-L ens准直透镜产生的色散进行了补偿,使得该衰减器工作在C-B and及衰减范围内具有极低的波长相关损耗(W ave lengthD ependen t Loss,W DL)值.分析了影响该衰减器的其它光学性能的各个因素.对所试制样品进行测试结果表明:该衰减器具有良好的光学性能,插损(Insertion Loss,IL),回损(R eturn Loss,RL)等指标达到理想的结果,特别是W DL指标性能优于同类产品.
文摘A new technology for fabrication of silica on silicon arrayed waveguide grating (AWG) based on deep etching and thermal oxidation is presented.Using this method,a silicon layer is remained at the side of waveguide.The stress distribution and effective refractive index of waveguide fabricated by this approach are calculated using finite element and finite difference beam propagation method,respectively.The results of these studies indicate that the stress of silica on silicon optical waveguide can be matched in parallel and vertical direction and AWG polarization dependent wavelength (PDλ) can be reduced effectively due to side-silicon layer.
