Sputtering deposition coatings offer significant advantages on electron beam (EB) deposition, including high packing density, environmental stability and extremely low losses. But the inherent high compressive stress ...Sputtering deposition coatings offer significant advantages on electron beam (EB) deposition, including high packing density, environmental stability and extremely low losses. But the inherent high compressive stress affects its application in high power laser system. This paper describes the technical feasibility of high damage threshold laser mirrors deposited by a novel remote plasma sputtering technique. This technique is based on generating intensive plasma remotely from the target and then magnetically steering the plasma to the target to realize the full uniform sputtering. The pseudo-independence between target voltage and target current provides us very flexible parameters tuning, especially for the films stress control. Deposition conditions are optimized to yield fully oxidized and low compressive stress single layer HfO2 and SiO2. The high damage threshold of 43.8 J/cm2 for HfO2/ SiO2 laser mirrors at 1064 nm is obtained. For the first time the remote plasma sputtering is successfully applied in depositing laser mirrors with high performance.展开更多
This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laser- induced damage threshold. The mirror is constructed by three materials of HfO/TiO2/SiO2 base...This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laser- induced damage threshold. The mirror is constructed by three materials of HfO/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO/SiO2 stacks act as the high reflector （HR） and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO/ TiO/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm^2 （1064 nm, 12 ns）. The possible laser damage mechanism of the mirror is discussed.展开更多
基金supported by the National Natural Science Foundation of China (No. 50802080)the Natural Science Foundation of Fujian Province of China (No.2010Jo1349)
文摘Sputtering deposition coatings offer significant advantages on electron beam (EB) deposition, including high packing density, environmental stability and extremely low losses. But the inherent high compressive stress affects its application in high power laser system. This paper describes the technical feasibility of high damage threshold laser mirrors deposited by a novel remote plasma sputtering technique. This technique is based on generating intensive plasma remotely from the target and then magnetically steering the plasma to the target to realize the full uniform sputtering. The pseudo-independence between target voltage and target current provides us very flexible parameters tuning, especially for the films stress control. Deposition conditions are optimized to yield fully oxidized and low compressive stress single layer HfO2 and SiO2. The high damage threshold of 43.8 J/cm2 for HfO2/ SiO2 laser mirrors at 1064 nm is obtained. For the first time the remote plasma sputtering is successfully applied in depositing laser mirrors with high performance.
基金supported by the National Natural Science Foundation of China (No.50802080)the Natural Science Foundation of Fujian Province of China (No.2010J01349)
文摘This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laser- induced damage threshold. The mirror is constructed by three materials of HfO/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO/SiO2 stacks act as the high reflector （HR） and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO/ TiO/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm^2 （1064 nm, 12 ns）. The possible laser damage mechanism of the mirror is discussed.
