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可在线检测漏电电能的漏电记录仪 被引量:1
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作者 刘金龙 徐寿先 《农村电气化》 北大核心 2002年第7期35-35,共1页
关键词 在线检测 漏电电能 漏电记录仪 配电变压器
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Model of Current Threshold for Perception in Testing Electrical Safety Performance 被引量:1
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作者 王晓飞 张朝晖 +2 位作者 李东 刘国忠 赵旭 《Transactions of Tianjin University》 EI CAS 2010年第1期11-16,共6页
A generalized mathematical model of human body current threshold for perception was established and the current flowing through human body could be arbitrary cyclical waveforms.The relationship between human body curr... A generalized mathematical model of human body current threshold for perception was established and the current flowing through human body could be arbitrary cyclical waveforms.The relationship between human body current threshold for perception and current frequency, true root mean square(RMS) value and influence factor was described.A test system was established based on electroencephalogram(EEG) to study the relationship between human body current threshold for perception and current waveform, frequency ... 展开更多
关键词 electrical safety performance leakage current current threshold for perception current waveform electroencephalogram(EEG)
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Effects of annealing temperature on microstructure and ferroelectric properties of Bi_(0.5)(Na_(0.85)K_(0.15))_(0.5)TiO_3 thin films 被引量:1
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作者 龚跃球 郑学军 +4 位作者 龚伦军 马颖 张大志 戴顺洪 李旭军 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2010年第10期1906-1910,共5页
Bi0.5(Na0.85K0.15)0.5TiO3(BNKT15) thin films were synthesized by metal-organic decomposition(MOD) at annealing temperatures of 650,680,710 and 740℃,and the effects of annealing temperature on the microstructure,diele... Bi0.5(Na0.85K0.15)0.5TiO3(BNKT15) thin films were synthesized by metal-organic decomposition(MOD) at annealing temperatures of 650,680,710 and 740℃,and the effects of annealing temperature on the microstructure,dielectric properties,remnant polarization(2Pr) and leakage current density were studied with X-ray diffractometer,atomic force microscope,precision impedance analyzer,ferroelectric analysis station and semiconductor parameter tester.The results show that the thin film annealed at 710℃ exhibits a typical perovskite structure without predominant orientation and a smooth surface with evenly distributed grains.2Pr value(67.4 μC/cm2 under 830 kV/cm) and the leakage current density(1.6×10-6 A/cm2 at 170 kV/cm) for BNKT15 thin film annealed at 710℃ are better than those for thin films annealed at other temperatures. 展开更多
关键词 BNKT 15 thin film metal-organic decomposition annealing temperature remnant polarization leakage current density
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Fabrication of 150-nm Al_(0.48)In_(0.52)As/Ga_(0.47)In_(0.53)As mHEMTs on GaAs substrates 被引量:3
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作者 WU XiaoFeng LIU HongXia +4 位作者 LI HaiOu LI Qi HU ShiGang XI ZaiFang ZHAO Jin 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2012年第12期2389-2391,共3页
High performance 150-nm gate-length metamorphic Al0.48In0.52As/Ga0.47In0.53 As high electron mobility transistors(mHEMTs) with very good device performance have been successfully fabricated.A T-shaped gate is fabricat... High performance 150-nm gate-length metamorphic Al0.48In0.52As/Ga0.47In0.53 As high electron mobility transistors(mHEMTs) with very good device performance have been successfully fabricated.A T-shaped gate is fabricated by using a combined technique of optical and e-beam photolithography,which is beneficial to decreasing parasitic capacitance and parasitic resistance of the gate.The ohmic contact resistance R c is as low as 0.03 mm when using a novel ohmic contact metal system(Ni/Ge/Ti/Au).The devices exhibit excellent DC and RF performance.A peak extrinsic transconductance of 775 mS/mm and a maximum drain current density of 720 mA/mm are achieved.The unity current gain cut-off frequency(fT) and the maximum oscillation frequency(f max) are 188.4 and 250 GHz,respectively. 展开更多
关键词 AlInAs/GaInAs mHEMTs GaAs substrate T-GATE
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