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铸锭炉热场对坩埚可靠性影响的机理研究——硅液对于石英坩埚的侵蚀及其与温度、坩埚材质和热场的关系分析 被引量:5
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作者 史珺 宗卫峰 《太阳能学报》 EI CAS CSCD 北大核心 2014年第3期502-507,共6页
对于多晶硅铸锭过程中的石英坩埚与硅液的高温反应进行化学动力学分析,根据试验数据分别计算出注浆工艺与注凝工艺所形成的石英陶瓷与硅液反应的活化能和指前因子,并由此计算坩埚的侵蚀速率与温度、坩埚材料、铸锭炉热场的关系,提出多... 对于多晶硅铸锭过程中的石英坩埚与硅液的高温反应进行化学动力学分析,根据试验数据分别计算出注浆工艺与注凝工艺所形成的石英陶瓷与硅液反应的活化能和指前因子,并由此计算坩埚的侵蚀速率与温度、坩埚材料、铸锭炉热场的关系,提出多晶硅铸锭的最佳温度曲线、最佳坩埚结构和最佳热场结构。 展开更多
关键词 石英坩埚 热场 活化能 指前因子 坩埚侵蚀 漏硅
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阴离子交换树脂床“钠离子放大”原因、影响及应对措施 被引量:1
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作者 孙鸿飞 《当代化工》 CAS 2014年第9期1932-1934,共3页
离子交换树脂法制化学除盐水,阴床"钠离子放大"会降低阴床及后继混床除盐效率,同时会造成已被吸着的阴离子,从阴离子交换树脂中解吸出来,造成除盐水不合格。
关键词 阴离子交换树脂床 钠离子放大 漏硅 除盐水不合格
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应变PMOS二维阈值电压解析模型
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作者 苏丽娜 周东 顾晓峰 《微电子学》 CAS CSCD 北大核心 2012年第3期415-419,共5页
利用准二维方法求解二维泊松方程,建立了锗硅源漏单轴应变PMOS阈值电压的二维解析模型,理论计算结果和实验报道的结果能很好吻合。研究了不同沟道长度和漏压情况下的沟道表面势,分析了沟道长度、漏压及锗硅源漏中锗摩尔组分等参数对阈... 利用准二维方法求解二维泊松方程,建立了锗硅源漏单轴应变PMOS阈值电压的二维解析模型,理论计算结果和实验报道的结果能很好吻合。研究了不同沟道长度和漏压情况下的沟道表面势,分析了沟道长度、漏压及锗硅源漏中锗摩尔组分等参数对阈值电压的影响。利用TCAD工具进行仿真模拟,结果表明,沟道长度和漏压是单轴应变PMOS阈值电压漂移的主要影响因素,而锗摩尔组分在一定成分范围内影响较小。 展开更多
关键词 PMOS 应变 阈值电压 二维解析模型
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A Novel Insulator and Its Characteristics 被引量:2
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作者 李晓峰 J.M.K.MacAlpine +3 位作者 陈俊武 王燕 张国胜 李正瀛 《Journal of Southeast University(English Edition)》 EI CAS 2001年第2期47-51,共5页
Both the ceramic and the composite insulators have their own advantages and disadvantages when compared with each other. It is a reasonable idea to combine their merits together to design a novel insulator. The key me... Both the ceramic and the composite insulators have their own advantages and disadvantages when compared with each other. It is a reasonable idea to combine their merits together to design a novel insulator. The key measure of the novel insulator suggested in this paper is to add an annular metal sheet coated with high temperature vulcanisation (HTV) silicone rubber (SIR) at the base of the traditional ceramic insulator cap. The HTVSIR covering on the exterior of the metal sheet can lengthen the creepage distance. The metal sheet can uniform the electric stress, reduce its maximum value and modify its direction on one insulator unit and acts as equalizing ring on an insulator string. The factors stated above are the main reasons why the novel insulator has better insulating performance, including lower leakage current and flashover voltage, especially under polluted conditions. Simultaneously, the novel insulator can overcome the disadvantages of the ordinary remedies which have been widely used to improve the performance of ceramic insulators against pollution. The experimental results obtained in the laboratory were in good agreement with the theoretical analysis and demonstrated the novel insulator's effectiveness. 展开更多
关键词 novel insulator leakage current pollution flashover HTVSIR
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GeSi Source/Drain Structure for Suppression of Short Channel Effect in SOI p-MOSFET's
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作者 黄如 卜伟海 王阳元 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第2期121-125,共5页
GeSi source/drain structure is purposefully adopted in SOI p MOSFET's to suppress the short channel effect (SCE).The impact of GeSi material (as source only,drain only or both source and drain) on the threshold v... GeSi source/drain structure is purposefully adopted in SOI p MOSFET's to suppress the short channel effect (SCE).The impact of GeSi material (as source only,drain only or both source and drain) on the threshold voltage rolling off and DIBL effect is thoroughly investigated,as well as the influence of the Ge concentration and silicon film thickness.The Ge concentration should be carefully chosen as a tradeoff between the driving current and SCE improvement.The detailed physics is explained. 展开更多
关键词 short channel effect MOSFET SOI
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Design Guideline of Ultra Thin Body MOSFET
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作者 王文平 黄如 张国艳 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第10期1227-1232,共6页
Simulation method is used to provide a guideline f or ultra thin body(UTB) MOSFET designs.Three important parameters of the UTB MOS FE T,i.e.the raised S/D height,Ge mole fraction of the Ge xSi 1-x gate,and the ... Simulation method is used to provide a guideline f or ultra thin body(UTB) MOSFET designs.Three important parameters of the UTB MOS FE T,i.e.the raised S/D height,Ge mole fraction of the Ge xSi 1-x gate,and the silic on body thickness,are comprehensively analyzed and optimized.The optimal region of feasible Ge mole fraction and the silicon body thickness for low operating po wer device are given.As the simulation results show that through changing Ge mole fraction coupl ed with the silicon body thickness tuning,UTB device with good performance can b e obtained. 展开更多
关键词 ultra thin body MOSFET raised S/D height Ge mole fraction silicon body thicknessEEACC:4250 128 0
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Investigations on Tracking and Erosion Resistance of Nano Silicone Composite for High Voltage Outdoor Insulation
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作者 S. Chandrasekar 《Journal of Energy and Power Engineering》 2010年第9期32-40,共9页
In recent times, silicone rubber insulating material is used for power transmission line and substation insulation applications. In the present work, tracking and erosion resistance of the micro size filled and nano s... In recent times, silicone rubber insulating material is used for power transmission line and substation insulation applications. In the present work, tracking and erosion resistance of the micro size filled and nano size filled silicone rubber material has been studied under the AC voltage, with ammonium chloride as a contaminant, as per IEC 60587 test procedures. The characteristic changes in the tracking resistance of the micro size and nano size filled specimens are analyzed through leakage current measurement. Comparative Tracking Index (CTI) is also evaluated in order to understand the relative behavior of solid electrical insulating material with regard to their susceptibility to surface tracking. Trend followed by the fundamental, third harmonic and fifth harmonic components of the leakage current during the tracking study are analyzed using moving average current technique. It is observed that the harmonic components of leakage current show good correlation with the tracking and erosion resistance of the material. It is noticed that 5 % wt ofnano size filler gives similar performance to that of 30 % wt of micro size filler in silicone composites. 展开更多
关键词 Outdoor insulator silicone rubber tracking resistance leakage current nano filler third harmonic
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Low-leakage diode-triggered silicon controlled rectifier for electrostatic discharge protection in 0.18-μm CMOS process
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作者 Xiao-yang DU Shu-rong DONG +2 位作者 Yan HAN Ming-xu HUO Da-hai HUANG 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2009年第7期1060-1066,共7页
A diode-triggered silicon controlled rectifier (DTSCR) is being developed as an electrostatic discharge (ESD) pro- tection device for low voltage applications. However, DTSCR leaks high current during normal operation... A diode-triggered silicon controlled rectifier (DTSCR) is being developed as an electrostatic discharge (ESD) pro- tection device for low voltage applications. However, DTSCR leaks high current during normal operation due to the Darlington effect of the triggering-assist diode string. In this study, two types of diode string triggered SCRs are designed for low leakage consideration; the modified diode string and composite polysilicon diode string triggered SCRs (MDTSCR & PDTSCR). Com- pared with the conventional DTSCR (CDTSCR), the MDTSCR has a much lower substrate leakage current with a relatively large silicon cost, and the PDTSCR has a much lower substrate leakage current with similar area and shows good leakage performance at a high temperature. Other DTSCR ESD properties are also investigated, especially regarding their layout, triggering voltage and failure current. 展开更多
关键词 Electrostatic discharge (ESD) protection Diode-triggered silicon controlled rectifier (DTSCR) Leakage current
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