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裂解酞菁铁和乙烯制备取向碳纳米管阵列 被引量:2
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作者 彭爱平 张浩 +4 位作者 王志永 施祖进 顾镇南 曹高萍 高立军 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2007年第12期2229-2233,共5页
采用热化学气相沉积(TCVD)法裂解酞菁铁(FePc)和乙烯(C2H4)制备出高210μm的取向碳纳米管阵列(ACNTA).用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、拉曼光谱和X射线光电子能谱(XPS)对制备的样品进行了表征,系统研究了反应温度、反应... 采用热化学气相沉积(TCVD)法裂解酞菁铁(FePc)和乙烯(C2H4)制备出高210μm的取向碳纳米管阵列(ACNTA).用扫描电子显微镜(SEM)、透射电子显微镜(TEM)、拉曼光谱和X射线光电子能谱(XPS)对制备的样品进行了表征,系统研究了反应温度、反应时间、C2H4流量对ACNTA生长的影响.结果表明,样品具有高取向性且纯度高.800℃是裂解FePc和C2H4制备ACNTA的最优温度,催化剂的活性可以保持较长时间(60 min),通入C2H4促进了ACNTA的快速生长,最适合流量为50 cm3/min. 展开更多
关键词 取向碳纳米管阵列 酞菁铁 热化学气相沉积法
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Microstructures and formation mechanism of headstand pyrocarbon cones developed by electromagnetic-field-assisted CVD 被引量:3
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作者 涂川俊 黄启忠 +2 位作者 张明瑜 赵新奇 陈江华 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2012年第10期2569-2577,共9页
Novel headstand pyrocarbon cones (HPCs) with hollow structure were developed on the surfaces of pyrocarbon layers of the carbon/carbon (C/C) composites at 650-750 °C by the electromagnetic-field-assisted chem... Novel headstand pyrocarbon cones (HPCs) with hollow structure were developed on the surfaces of pyrocarbon layers of the carbon/carbon (C/C) composites at 650-750 °C by the electromagnetic-field-assisted chemical vapor deposition in the absence of catalysts. The fine microstructures of the HPCs were characterized by high-resolution transmission electron microscopy. The results show that the textural features of the HPCs directly transfer from turbostratic structure in roots to a well-ordered high texture in stems. And the degree of high texture ordering decreases gradually from the stem to the tail of the HPCs. The formation mechanism of the HPCs was inferred as the comprehensive effect of polarization induction on electromagnetic fields and particle-filler property under disruptive discharge. 展开更多
关键词 headstand pyrocarbon cones chemical vapor deposition electromagnetic-field-assisted method fine microstructure formation mechanism
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用碳纳米管作阴极的平板光源
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作者 梁锡辉 陈军 +1 位作者 邓少芝 许宁生 《中山大学研究生学刊(自然科学与医学版)》 2003年第4期49-55,共7页
我们研制了用碳纳米管为阴极的二极结构的平板光源,碳纳米管阴极是用热化学气相沉积法生长在Si片村底上的。SEM和TEM显示所生长的碳纳米管是无序排列的多壁碳纳米管。我们测试了光源的Ⅰ-Ⅴ特性、均匀性和亮度。结果显示用碳纳米管为阴... 我们研制了用碳纳米管为阴极的二极结构的平板光源,碳纳米管阴极是用热化学气相沉积法生长在Si片村底上的。SEM和TEM显示所生长的碳纳米管是无序排列的多壁碳纳米管。我们测试了光源的Ⅰ-Ⅴ特性、均匀性和亮度。结果显示用碳纳米管为阴极的二极结构的平板光源是很有应用潜力的。 展开更多
关键词 阴极 平板光源 热化学气相沉积法 衬底 多壁碳纳米管 碳纳米管薄膜 发射电流 光源效率
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EFFECT OF GRID BIAS ON DEPOSITION OF NANOCRYSTALLINE DIAMOND FILMS
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作者 徐锋 左敦稳 +1 位作者 卢文壮 王珉 《Transactions of Nanjing University of Aeronautics and Astronautics》 EI 2007年第4期317-322,共6页
A positive grid bias and a negative substrate bias voltages are applied to the self-made hot filament chemical vapor deposited (HFCVD) system. The high quality nanocrystalline diamond (NCD) film is successfully de... A positive grid bias and a negative substrate bias voltages are applied to the self-made hot filament chemical vapor deposited (HFCVD) system. The high quality nanocrystalline diamond (NCD) film is successfully deposited by double bias voltage nucleation and grid bias voltage growth. The Micro-Raman XRD SEM and AFM are used to investigate the diamond grain size, microstructure, surface morphology, and nucleation density. Results show that the obtained NCD has grain size of about 20 nm. The effect of grid bias voltage on the nucleation and the diamond growth is studied. Experimental results and theoretical analysis show that the positive grid bias increases the plasma density near the hot filaments, enhances the diamond nucleation, keeps the nanometer size of the diamond grains, and improves the quality of diamond film. 展开更多
关键词 nanocrystalline diamond film hot filament CVD substrate bias voltage grid bias voltage NUCLEATION
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Amorphous SiO_2 interlayers for deposition of adherent diamond films onto WC-Co inserts 被引量:1
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作者 崔雨潇 赵天奇 +1 位作者 孙方宏 沈彬 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第9期3012-3022,共11页
Amorphous Si O2(a-Si O2) films were synthesized on WC-Co substrates with H2 and tetraethoxysilane(TEOS) via pyrolysis of molecular precursor.X-ray diffraction(XRD) pattern shows that silicon-cobalt compounds for... Amorphous Si O2(a-Si O2) films were synthesized on WC-Co substrates with H2 and tetraethoxysilane(TEOS) via pyrolysis of molecular precursor.X-ray diffraction(XRD) pattern shows that silicon-cobalt compounds form at the interface between a-Si O2 films and WC-Co substrates.Moreover,it is observed by transmission electron microscope(TEM) that the a-Si O2 films are composed of hollow mirco-spheroid a-Si O2 particles.Subsequently,the a-Si O2 films are used as intermediate films and chemical vapor deposition(CVD) diamond films are deposited on them.Indentation tests were performed to evaluate the adhesion of bi-layer(a-Si O2 + diamond) films on cemented carbide substrates.And the cutting performance of bi-layer(a-Si O2 + diamond) coated inserts was evaluated by machining the glass fiber reinforced plastic(GFRP).The results show that a-Si O2 interlayers can greatly improve the adhesive strength of diamond films on cemented carbide inserts;furthermore,thickness of the a-Si O2 interlayers plays a significant role in their effectiveness on adhesion enhancement of diamond films. 展开更多
关键词 hot filament chemical vapor deposition(HFCVD) diamond film WC-Co substrate INTERLAYER ADHESION
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Si-doped diamond films prepared by chemical vapour deposition 被引量:1
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作者 崔雨潇 张建国 +1 位作者 孙方宏 张志明 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2013年第10期2962-2970,共9页
The effects of Si doping on morphology, components and structure characteristics of CVD diamond films were studied. Si-doped CVD diamond films were deposited on Si substrate by adding tetraethoxysilane (TEOS) into a... The effects of Si doping on morphology, components and structure characteristics of CVD diamond films were studied. Si-doped CVD diamond films were deposited on Si substrate by adding tetraethoxysilane (TEOS) into acetone as source of reactant gas. The morphology and microstructure of diamond films were characterized by scanning electron microcopy (SEM). The crystalline quality of diamond films was studied by Raman spectroscopy and X-ray diffractometry (XRD). The surface roughness of the films was evaluated with surface profilometer. The results suggest that Si doping tends to reduce the crystallite size, enhance grain refinement and inhibit the appearance of (11 I) facets. Raman spectra indicate that Si doping can enhance the formation of sp2 phase in diamond films. Moreover, Raman signal of SiC was detected, which suggests the existence of Si in the diamond films. Smooth fine-grained diamond (SFGD) film was synthesized at Si to C ratio of 1%. 展开更多
关键词 Si doping hot filament chemical vapor deposition (HFCVD) diamond films
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