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多晶MAPbBr_(3)薄膜中束缚载流子热发射复合过程
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作者 陶婷婷 舒京婷 +3 位作者 冯博浩 薛原 吴峰 党伟 《光电子.激光》 CAS CSCD 北大核心 2023年第9期967-975,共9页
有机-无机卤化铅钙钛矿(organic inorganic lead halide perovskite,OLHP)半导体材料内部的陷阱是影响OLHP的光电性能的重要因素。为了理解多晶的甲胺溴基钙钛矿((Methylammonium)PbBr_(3),MAPbBr_(3))薄膜中陷阱对光生载流子复合的影响... 有机-无机卤化铅钙钛矿(organic inorganic lead halide perovskite,OLHP)半导体材料内部的陷阱是影响OLHP的光电性能的重要因素。为了理解多晶的甲胺溴基钙钛矿((Methylammonium)PbBr_(3),MAPbBr_(3))薄膜中陷阱对光生载流子复合的影响,本文采用了时间分辨微波光电导(time resolved microwave conductivity,TRMC)技术探究了多晶MAPbBr_(3)薄膜的光生载流子复合动力学过程。实验测量结果表明多晶MAPbBr_(3)薄膜的载流子复合过程包括自由载流子复合与束缚载流子的热发射复合两部分。其中,与束缚载流子热发射复合相关的能级远离连续带,且对应的能级深度约为0.6 eV,分布宽度约为89.2 meV。本文同时利用变激发波长TRMC对比实验,分析浅束缚光生电子与导带光生电子复合过程的差异。相比于导带上的电子,实验结果表明浅束缚电子跃迁到深束缚能级的概率更大。 展开更多
关键词 多晶MAPbBr_(3)薄膜 束缚载流子 热发射复合 陷阱
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Ultraviolet-emitting ZnO thick layer grown by thermal oxidation with gallium
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作者 YANG Qing ZHOU Xiao Hong +5 位作者 NUKUI Takao SAEKI Yu IZUMI Sotaro TACKEUCHI Atsushi TATSUOKA Hirokazu LIANG Shu Hua 《Science China(Technological Sciences)》 SCIE EI CAS 2014年第12期2500-2503,共4页
The ZnO layer with thickness of 1.6 jim in ZnO/ZnGa2O4 composite structure was grown by the thermal oxidation of ZnS sub- strate with gallium. The optical property of the ZnO thick layer was investigated by time-resol... The ZnO layer with thickness of 1.6 jim in ZnO/ZnGa2O4 composite structure was grown by the thermal oxidation of ZnS sub- strate with gallium. The optical property of the ZnO thick layer was investigated by time-resolved photoluminescence. A single UV emission around 375 nm with short lifetime was observed at room temperature while the visible emission was absolutely quenched. The UV emission band was composed of the neutral donor bound exciton (D^0X) and donor-acceptor pair (DAP) emission peaks with large full-width at half-maximums (FWHMs) at 3.367 and 3.318 eV, respectively, at 10 K. However, the intensity of the D^0X emission was stronger than that of the DAP emission at measuring temperatures of 10-300 K. 展开更多
关键词 ZnO layer thermal oxidation GALLIUM ULTRAVIOLET PHOTOLUMINESCENCE
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