The carbon ion implantation with energy of 4.0 MeV and a dose of 4.0×10^(14) ions/cm^2 is employed for fabricating the optical waveguide in fluoride lead silicate glasses. The optical modes as well as the effecti...The carbon ion implantation with energy of 4.0 MeV and a dose of 4.0×10^(14) ions/cm^2 is employed for fabricating the optical waveguide in fluoride lead silicate glasses. The optical modes as well as the effective refractive indices are measured by the prism coupling method. The refractive index distribution in the fluoride lead silicate glass waveguide is simulated by the reflectivity calculation method(RCM). The light intensity profile and the energy losses are calculated by the finite-difference beam propagation method(FD-BPM) and the program of stopping and range of ions in matter(SRIM), respectively. The propagation properties indicate that the C^(2+) ion-implanted fluoride lead silicate glass waveguide is a candidate for fabricating optical devices.展开更多
基金supported by the National Natural Science Foundation of China(No.11405041)the Natural Science Foundation of Jiangsu Province(No.BK2014042609)+1 种基金the Postgraduate Research&Practice Innovation Program of Jiangsu Province(No.SJCX17_0232)the NUPTSF(No.NY214159)
文摘The carbon ion implantation with energy of 4.0 MeV and a dose of 4.0×10^(14) ions/cm^2 is employed for fabricating the optical waveguide in fluoride lead silicate glasses. The optical modes as well as the effective refractive indices are measured by the prism coupling method. The refractive index distribution in the fluoride lead silicate glass waveguide is simulated by the reflectivity calculation method(RCM). The light intensity profile and the energy losses are calculated by the finite-difference beam propagation method(FD-BPM) and the program of stopping and range of ions in matter(SRIM), respectively. The propagation properties indicate that the C^(2+) ion-implanted fluoride lead silicate glass waveguide is a candidate for fabricating optical devices.
