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大直径CZSi单晶中微缺陷与间隙氧之间的关系 被引量:5
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作者 任丙彦 郝秋艳 +2 位作者 刘彩池 王海云 张颖怀 《半导体技术》 CAS CSCD 北大核心 2002年第3期21-24,共4页
通过实验分析了大直径直拉硅片中间隙氧含量对原生新微缺陷的影响,并对具有不同间隙氧含量的硅片进行热处理实验。结果发现间隙氧含量影响到晶体中新微缺陷的密度,通过高温退火可显著降低微缺陷的密度。
关键词 CZSi单晶 生微缺陷 间隙氧 集成电路 硅片 大直径 直拉硅单晶
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Site occupation evolution of alloying elements in Ni_3 V phase during phase transformation in Ni_(75)Al_(4.2)V_(20.8)
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作者 张明义 李志刚 +3 位作者 张金玲 张会占 陈铮 张嘉振 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2015年第5期1599-1604,共6页
Based on the microscopic phase-field model, the correlation between site occupation evolution of alloying elements in Ni3V-DO22 phase and growth of Ni3Al-L12 phase was studied during the phase transformation of Ni75Al... Based on the microscopic phase-field model, the correlation between site occupation evolution of alloying elements in Ni3V-DO22 phase and growth of Ni3Al-L12 phase was studied during the phase transformation of Ni75Al4.2V20.8. The results demonstrate that the growth of L12 phase can be divided into two stages: at the early stage, the composition of alloying elements in DO22 phase almost remains unchanged; at the late stage, the compositions of Ni and Al decrease while V increases in DO22 phase. Part of alloying elements for L12 phase growth are supplied from the site occupation evolution of alloying elements on three kinds of sublattices in DO22 phase. Ni is mainly supplied from V sublattice, and part of Al is supplied from NiⅠ and V sites at the centre of DO22 phase. The excessive V from the decreasing DO22 phase migrates into the centre of DO22 phase and mainly occupies V and NiII sites. It is the site occupation evolution of antisite atoms and ternary additions in DO22 phase that controls the growth rate of L12 phase at the late stage. 展开更多
关键词 Ni75Al4.2V20.8 alloy grain growth phase transformation microscopic phase-field antisite defect
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Site occupation evolution of alloying elements in L1_2 phase during phase transformation in Ni_(75)Al_(7.5)V_(17.5)
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作者 张明义 刘富 +3 位作者 陈铮 郭红军 岳广全 杨坤 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2012年第10期2439-2443,共5页
Correlation between site occupation evolution of alloying elements in L12 phase and growth of DO22 phase in Ni75Al7.5V17.5 was studied using microscopic phase field model. The results demonstrate that the growing proc... Correlation between site occupation evolution of alloying elements in L12 phase and growth of DO22 phase in Ni75Al7.5V17.5 was studied using microscopic phase field model. The results demonstrate that the growing process of DO22 phase can be divided into two stages. At the early stage, composition in the centre part of L12 phase almost remains unchanged, and the nucleation and growth of DO22 phase is controlled by the decrease of interface between L12 phases. At the late stage, part of V for growth of DO22 phase is supplied from the centre part of L12 phase and mainly comes from Al sublattice, the excess Ni spared from the decreasing L12 phase migrates into the centre part of L12 phase and occupies the Ni sublattices exclusively, while the excess Al mainly occupies the Al sublattice. At the late stage, the growth of DO22 phase is controlled by the evolution of antisite atoms and ternary additions in the centre part of L12 phase. 展开更多
关键词 nickel based superalloys Ni75Al7.5V17.5 alloy phase transformation micro-phase field grain growth antisite defect
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Blue LED growth from 2 inch to 8 inch 被引量:5
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作者 Frank LU Dong LEE Dan BYRNES 《Science China(Technological Sciences)》 SCIE EI CAS 2011年第1期33-37,共5页
Growth of blue InGaN based LED structures on sapphire wafers from 2 inch to 8 inch in diameter was investigated using the Veeco K465 MOCVD platform. Our results indicate that the same pressure,rotation rate and hydrid... Growth of blue InGaN based LED structures on sapphire wafers from 2 inch to 8 inch in diameter was investigated using the Veeco K465 MOCVD platform. Our results indicate that the same pressure,rotation rate and hydride flows can be used for all wafer sizes. AFM and X-ray studies reveal that all wafer sizes have comparable high-quality crystallinity and defect levels for GaN and InGaN/GaN MQW growth. Although the larger diameter wafers exhibit larger wafer bow due to lattice and thermal mismatch,with proper wafer pocket design,good wavelength and thickness uniformity can be obtained for all wafer sizes. 展开更多
关键词 GAN INGAN blue LED MOCVD
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