Encapsulation of water-soluble nitrogen fertilizers by membranes can be used to control the release of nutrients to maximize the fertilization ef fect and reduce environmental pollution.In this research,we formulated ...Encapsulation of water-soluble nitrogen fertilizers by membranes can be used to control the release of nutrients to maximize the fertilization ef fect and reduce environmental pollution.In this research,we formulated a new double-coated controlled-release fertilizer(CRF)by using food-grade microcrystalline wax(MW)and marine polysaccharide derivatives(calcium alginate and chitosan-glutaraldehyde copolymer).The pellets of water-soluble nitrogen fertilizer were coated with the marine polysaccharide derivatives and MW.A convenient and eco-friendly method was used to prepare the CRF.Scanning electron microscopy(SEM)and Fourier transform infrared spectroscopy(FTIR)were used to characterize the morphology and composition of the products.The nitrogen-release properties were determined in water using UV-Vis spectrophotometry.The controlled-release properties of the fertilizer were improved dramatically after coating with MW and the marine polysaccharide derivatives.The results show that the double-coated CRFs can release nitrogen in a controlled manner,have excellent controlled-release features,and meet the European Standard for CRFs.展开更多
Stress controllable silicon nitride(Si Nx) films deposited by plasma enhanced chemical vapor deposition(PECVD) are reported. Low stress Si Nx films were deposited in both high frequency(HF) mode and dual frequency(HF/...Stress controllable silicon nitride(Si Nx) films deposited by plasma enhanced chemical vapor deposition(PECVD) are reported. Low stress Si Nx films were deposited in both high frequency(HF) mode and dual frequency(HF/LF) mode. By optimizing process parameters, stress free(-0.27 MPa) Si Nx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited Si Nx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit(IC), micro-electro-mechanical systems(MEMS) and bio-MEMS.展开更多
基金Supported by the National Natural Science Foundation of China(No.41306071)the CAS STS Program(No.KFJ-SW-STS-143)+1 种基金the NSFC-Shandong Union Project(No.U1406402-5)the Public Science and Technology Research Funds Projects of Ocean(Nos.201405038-2,201305016-2)
文摘Encapsulation of water-soluble nitrogen fertilizers by membranes can be used to control the release of nutrients to maximize the fertilization ef fect and reduce environmental pollution.In this research,we formulated a new double-coated controlled-release fertilizer(CRF)by using food-grade microcrystalline wax(MW)and marine polysaccharide derivatives(calcium alginate and chitosan-glutaraldehyde copolymer).The pellets of water-soluble nitrogen fertilizer were coated with the marine polysaccharide derivatives and MW.A convenient and eco-friendly method was used to prepare the CRF.Scanning electron microscopy(SEM)and Fourier transform infrared spectroscopy(FTIR)were used to characterize the morphology and composition of the products.The nitrogen-release properties were determined in water using UV-Vis spectrophotometry.The controlled-release properties of the fertilizer were improved dramatically after coating with MW and the marine polysaccharide derivatives.The results show that the double-coated CRFs can release nitrogen in a controlled manner,have excellent controlled-release features,and meet the European Standard for CRFs.
基金supported by the National High Technology Research and Development Program of China(No.2015AA042603)the Fundamental Research Funds for the Central Universities of China(No.106112014CDJZR160001)
文摘Stress controllable silicon nitride(Si Nx) films deposited by plasma enhanced chemical vapor deposition(PECVD) are reported. Low stress Si Nx films were deposited in both high frequency(HF) mode and dual frequency(HF/LF) mode. By optimizing process parameters, stress free(-0.27 MPa) Si Nx films were obtained with the deposition rate of 45.5 nm/min and the refractive index of 2.06. Furthermore, at HF/LF mode, the stress is significantly influenced by LF ratio and LF power, and can be controlled to be 10 MPa with the LF ratio of 17% and LF power of 150 W. However, LF power has a little effect on the deposition rate due to the interaction between HF power and LF power. The deposited Si Nx films have good mechanical and optical properties, low deposition temperature and controllable stress, and can be widely used in integrated circuit(IC), micro-electro-mechanical systems(MEMS) and bio-MEMS.
