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410~355nm内四甲基硅的多光子解离和电离研究
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作者 施德恒 刘玉芳 《原子与分子物理学报》 CAS CSCD 北大核心 2002年第2期126-132,共7页
利用平行板电极装置研究了四甲基硅在 410~ 378nm内的MPI光谱 ;利用TOF质谱仪研究了该分子在 40 2~ 371nm内若干个波长点处的TOF质谱 ;利用四极质谱装置研究了它在 35 5nm处的MPI质谱。测得了 35 5nm下Si(CH3 ) + n(n =1,2 ,3,4)及Si+... 利用平行板电极装置研究了四甲基硅在 410~ 378nm内的MPI光谱 ;利用TOF质谱仪研究了该分子在 40 2~ 371nm内若干个波长点处的TOF质谱 ;利用四极质谱装置研究了它在 35 5nm处的MPI质谱。测得了 35 5nm下Si(CH3 ) + n(n =1,2 ,3,4)及Si+ 的激光光强指数 ,以及其信号强度占总信号强度的分支比随光强的变化关系。据此 ,讨论了该分子MPI过程的可能通道 ,得出了Si+ 主要来自于母体分子的多光子解离 硅原子的电离、Si(CH3 ) + n(n =1,2 ,3)主要来自于Si(CH3 ) n(n =1,2 ,3)的自电离、Si(CH3 ) + 4来自于母体分子的(3+1)电离的结论。 展开更多
关键词 甲四基硅 多光子解离 多光子电离 反应动力学 质谱 分子物理
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Cationic Ring Opening Polymerization of Octamethylcyclotetrasiloxane Initiated by Acid Treated Bentonite 被引量:5
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作者 陈碧 詹晓力 +1 位作者 易玲敏 陈丰秋 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2007年第5期661-665,共5页
Cationic ring opening polymerization of octamethylcyclotetrasiloxane (Da) initiated by acid treated bentonite was investigated. The experimental conditions were chosen on the basis of preliminary experiments.Higher ... Cationic ring opening polymerization of octamethylcyclotetrasiloxane (Da) initiated by acid treated bentonite was investigated. The experimental conditions were chosen on the basis of preliminary experiments.Higher temperature was found beneficial for the reaction process while stirring intensity beyond a certain level showed no obvious effect on the reaction rate. Polymers were characterized by Fourier transform infrared, proton nuclear magnetic resonance (IH-NMR) and gel perneation chromotography. The width of molecular mass distribution was found ranging between 1.2 and 1.4, which is extraordinarlly narrow compared with that of cationic polymerizations reported elsewhere (〉 1.9). The results were believed due to the absence of free proton and counter ion which simplifies the polymerization process and the huge steric hindrance provided by bentonite particles which keeps the propagation of polysiloxane onto the surface of bentonite particles in a much more regular way. A feasible mechanism is proposed and seems to be supported well by experiments. Additionally, from the results of α, ω-dihydrogen terminated polysiloxanes prepared, the possibility of applying this potential environmentally friendly heterogeneous catalyst in industrial polymerization of cyclosiloxanes is anticipated. 展开更多
关键词 OCTAMETHYLCYCLOTETRASILOXANE cationic polymerization POLYSILOXANE
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Preparation and properties of organic-inorganic modified SiO_2 thin films 被引量:1
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作者 赵贤辉 李长虹 王海 《Journal of Central South University》 SCIE EI CAS 2013年第3期608-614,共7页
Polydimethylsiloxane (PDMS), tetraethoxysilane (TEOS), ethyl alcohol (EtOH) and deionized water were main raw materials to prepare silicone-modified hybrid thin films using sol-gel method. The effect of the cont... Polydimethylsiloxane (PDMS), tetraethoxysilane (TEOS), ethyl alcohol (EtOH) and deionized water were main raw materials to prepare silicone-modified hybrid thin films using sol-gel method. The effect of the contents of H2O and PDMS on thin films was studied. When the volume ratio of H20 to TEOS is 0.5, the optimum quality of thin films is obtained. And the gelation time is affected slightly by H20 content. Uniform thin films are obtained when the volume ratio of PDMS to TEOS is 0.2. Yet, the sol would be inactive in 6 d. Various properties of thin films were studied, including hardness, adhesive quality, hydrophobic property, corrosion protection property, and abrasion resistance. Test results show that the pencil hardness is generally 3-6 H, and adhesive quality achieves the highest standard of 0. When the sintering temperature is below 400℃, the contact angle is about 95° and hydrophobic films are obtained. The abrasion resistance of thin films is better than that of aluminum alloy when the sintering temperature is higher than 300℃. And the excellent corrosion protective effect is obtained by single-layer coating when the sintering temperature is higher than 400℃. 展开更多
关键词 sol-gel method hybrid thin film HARDNESS adhesive quality hydrophobic property CORROSION
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Kinetics of Bulk Polymerization of Octamethylcyclote- trasiloxane
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作者 方欣 陈志荣 +1 位作者 尹红 苏科峰 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2004年第1期156-158,共3页
The kinetics of bulk polymerization of octamethylcyclotetrasiloxane under acid circumstance is studied. A kinetic model is put forward and kinetic parameters are obtained through optimization.
关键词 OCTAMETHYLCYCLOTETRASILOXANE polymerization kinetics mathematical model OPTIMIZATION
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An Improvement on Si-etching Tetramethyl Ammonium Hydroxide Solution
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作者 杨笛 余金中 +2 位作者 陈少武 樊中朝 李运涛 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2005年第1期48-50,共3页
An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates o... An optimal concentration of the etching solution for deep etching of silicon, including 3% tetramethyl ammonium hydroxide and 0.3% (NH4)2S2O8, was achieved in this paper. For this etching solution, the etching rates of silicon and silicon dioxide were about 1.1μm·min-1 and 0.5nm·min-1, respectively. The etching ratio between (100) and (111) planes was about 34:1, and the etched surface was very smooth. 展开更多
关键词 SILICON silicon dioxide tetramethyl ammonium hydroxide etching rate
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