Optical flow method is one of the most important methods of analyzing motion images. Optical flow field is used to analyze characteristics of motion objects. According to motion features of micro-electronic mechani-ca...Optical flow method is one of the most important methods of analyzing motion images. Optical flow field is used to analyze characteristics of motion objects. According to motion features of micro-electronic mechani-cal system (MEMS) micro-structure, the optical algorithm based on label field and neighborhood optimization is presented to analyze the in-plane micro-motion of micro-structure. Firstly, high speed motion states for each fre-quency segment of micro-structure in cyclic motion are frozen based on stroboscopic principle. Thus a series of dynamic images of micro-structure are obtained. Secondly, the presented optical algorithm is used to analyze the image sequences, and can obtain reliable and precise optical field and reduce computing time. As micro-resonator of testing object, the phase-amplitude curve of micro-structure is derived. Experimental results indicate that the meas-urement precision of the presented algorithm is high, and measurement repeatability reaches 40 nm under the same experiment condition.展开更多
This paper compares Ceramic Decal design and traditional printing design through computer; show the innovation advantages of computer Ceramic Decal design prominent, such as computer color advantage, computer design s...This paper compares Ceramic Decal design and traditional printing design through computer; show the innovation advantages of computer Ceramic Decal design prominent, such as computer color advantage, computer design software brings innovation advantage. The computer brings to the thinking innovation advantage and computer Ceramic Decal design than the traditional ceramic decal in the design process. Through the design advantage that computer has very important influence and significance of ceramic decal.展开更多
Electro-deposition, electrical activation, thermal oxidation, and reactive ion sputtering are the four primary methods to fabricate iridium oxide film. Among these methods, reactive ion sputtering is a commonly used m...Electro-deposition, electrical activation, thermal oxidation, and reactive ion sputtering are the four primary methods to fabricate iridium oxide film. Among these methods, reactive ion sputtering is a commonly used method in standard micro-fabrication processes. In different sputtering conditions, the component, texture, and electrochemistry character of iridium oxide varies considerably. To fabricate the iridium oxide film compatible with the wafer-level processing of neural electrodes, the quality of iridium oxide film must be able to withstand the mechanical and chemical impact of post-processing, and simultaneously achieve good performance as a neural electrode. In this study, parameters of sputtering were researched and developed to achieve a balance between mechanical stability and good electrochemical characteristics of iridium oxide film on electrode. Iridium oxide fabricating process combined with fabrication flow of silicon electrodes, at wafer-level, is introduced to produce silicon based planar iridium oxide neural electrodes. Compared with bare gold electrodes, iridium oxide electrodes fabricated with this method exhibit particularly good electrochemical stability, low impedance of 386 kW at 1 kH z, high safe charge storage capacity of 3.2 m C/cm^2, and good impedance consistency of less than 25% fluctuation.展开更多
基金Supported by Youth Natural Science Foundation of Beijing University of Chemical Technology (No.QN0734).
文摘Optical flow method is one of the most important methods of analyzing motion images. Optical flow field is used to analyze characteristics of motion objects. According to motion features of micro-electronic mechani-cal system (MEMS) micro-structure, the optical algorithm based on label field and neighborhood optimization is presented to analyze the in-plane micro-motion of micro-structure. Firstly, high speed motion states for each fre-quency segment of micro-structure in cyclic motion are frozen based on stroboscopic principle. Thus a series of dynamic images of micro-structure are obtained. Secondly, the presented optical algorithm is used to analyze the image sequences, and can obtain reliable and precise optical field and reduce computing time. As micro-resonator of testing object, the phase-amplitude curve of micro-structure is derived. Experimental results indicate that the meas-urement precision of the presented algorithm is high, and measurement repeatability reaches 40 nm under the same experiment condition.
文摘This paper compares Ceramic Decal design and traditional printing design through computer; show the innovation advantages of computer Ceramic Decal design prominent, such as computer color advantage, computer design software brings innovation advantage. The computer brings to the thinking innovation advantage and computer Ceramic Decal design than the traditional ceramic decal in the design process. Through the design advantage that computer has very important influence and significance of ceramic decal.
基金supported by the National Natural Science Foundation of China(Grant Nos.61335010,61275145,61275200&61275145)the National Hi-Tech Research and Development Program of China("863"Project)(Grant No.2013AA032204)+1 种基金the Brain Vanguard Technology Crossover Cooperation Projects of Chinese Academy of Sciences(GrantNo.KJZD-EW-L11-01)the Recruitment Program for Young Professionals
文摘Electro-deposition, electrical activation, thermal oxidation, and reactive ion sputtering are the four primary methods to fabricate iridium oxide film. Among these methods, reactive ion sputtering is a commonly used method in standard micro-fabrication processes. In different sputtering conditions, the component, texture, and electrochemistry character of iridium oxide varies considerably. To fabricate the iridium oxide film compatible with the wafer-level processing of neural electrodes, the quality of iridium oxide film must be able to withstand the mechanical and chemical impact of post-processing, and simultaneously achieve good performance as a neural electrode. In this study, parameters of sputtering were researched and developed to achieve a balance between mechanical stability and good electrochemical characteristics of iridium oxide film on electrode. Iridium oxide fabricating process combined with fabrication flow of silicon electrodes, at wafer-level, is introduced to produce silicon based planar iridium oxide neural electrodes. Compared with bare gold electrodes, iridium oxide electrodes fabricated with this method exhibit particularly good electrochemical stability, low impedance of 386 kW at 1 kH z, high safe charge storage capacity of 3.2 m C/cm^2, and good impedance consistency of less than 25% fluctuation.
