电解工艺参数对铟微粉纯度和粒度的影响

研究了电解工艺制备铟微粉时,铟离子浓度、电流密度和连续电解时间对粉体纯度和粒度的影响。结果表明:当电解工艺参数为NaCl浓度80 g/L,极距5 cm,硫脲浓度0.3 g/L,明胶浓度0.5 g/L,pH=2.5,添加剂聚乙烯吡咯烷酮用量为0.2 g/L时,连续电解时间越长,所得粉体粒度越大;电流密度为130 A/m^2时,所得粉体粒度最小,纯度最高;In^(3+)浓度对粉体粒度的影响最小,但对纯度影响最大;在此工艺参数和In^(3+)浓度为30 g/L,电流密度为130 A/cm^2的条件下电解1 h,可得到粒度小于100μm的铟微粉,其中粒度小于30μm的占75%,粉体纯度为99.9809%。

镁合金在抑弧状态下阳极氧化研究

采用有机胺、NH4H2PO4、NaF和成膜添加剂组成碱性电解液,对AZ91D镁合金进行了高压阳极氧化研究。结果表明,在抑制阳极发生弧光放电的状态下,镁合金表面可以沉积一层致密的氧化厚膜层,该膜层具有较高的硬度和优良的耐蚀性能。就电解液中各组分在成膜过程中的作用以及电解工艺参数对成膜过程和膜层性能的影响进行了研究探讨。

Corrosion Resistance of Titanium Bipolar Plate Enhanced by TiN Film

To improve the corrosion resistance of titanium(Ti)bipolar plate,titanium nitride(TiN)film was prepared on the surface of commercial TA1 pure titanium by magnetron reactive sputtering and pulse laser deposition(PLD)techniques,and the film prepared under different process parameters were evaluated.Results show that dense and complete TiN film can be obtained on TA1 surface under different preparation processes,and the corrosion current density of Ti substrate significantly increases.However,the composition of the film prepared by magnetron reactive sputtering is affected by the oxygen competition reaction,and its homogeneity is inferior to that of the film prepared by PLD.The comprehensive performance of the PLD-prepared film shows excellent characteristics in the terms of low corrosion current density(0.025μA·cm^(−2)),moderate corrosion overpotential(−0.106 V),and good hydrophobicity.